Lanthanum doped zirconium oxide films, with La contents, up to , were studied. Films were annealed at to crystallize them into phases with higher -values. Increasing the La content suppressed the monoclinic phase and stabilized the tetragonal or cubic phase. The highest dielectric constant was obtained for a lightly doped film with a La content of , for which a -value of 40 was obtained. This was accompanied by a significant dielectric relaxation, following a single Curie–von Schweidler power-law dependency with frequency, changing to a mixed Curie–von Schweidler and Kohlrausch–Williams–Watts relationships after annealing. The dielectric relaxation was most severe for lightly doped films, which had the highest -values. The dielectric relaxation appears to be related to the size of crystal grains formed during annealing, which was dependent on the doping level.
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15 February 2009
Research Article|
February 18 2009
Dielectric relaxation of lanthanum doped zirconium oxide
C. Z. Zhao;
C. Z. Zhao
a)
1Department of Electrical Engineering and Electronics,
University of Liverpool
, Liverpool L69 3GJ, United Kingdom
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S. Taylor;
S. Taylor
b)
1Department of Electrical Engineering and Electronics,
University of Liverpool
, Liverpool L69 3GJ, United Kingdom
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M. Werner;
M. Werner
2Department of Engineering, Materials Science and Engineering,
University of Liverpool
, Liverpool L69 3GH, United Kingdom
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P. R. Chalker;
P. R. Chalker
2Department of Engineering, Materials Science and Engineering,
University of Liverpool
, Liverpool L69 3GH, United Kingdom
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R. T. Murray;
R. T. Murray
2Department of Engineering, Materials Science and Engineering,
University of Liverpool
, Liverpool L69 3GH, United Kingdom
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J. M. Gaskell;
J. M. Gaskell
3Department of Chemistry,
University of Liverpool
, Liverpool L69 3ZD, United Kingdom
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A. C. Jones
A. C. Jones
3Department of Chemistry,
University of Liverpool
, Liverpool L69 3ZD, United Kingdom
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a)
Also at Department of Electrical and Electronic Engineering, Xi’an Jiaotong-Liverpool University, 111 Ren Ai Road, Suzhou, Jiangsu 215123, China. Electronic mail: [email protected].
b)
Author to whom correspondence should be addressed. Electronic mail: [email protected].
J. Appl. Phys. 105, 044102 (2009)
Article history
Received:
August 07 2008
Accepted:
January 02 2009
Citation
C. Z. Zhao, S. Taylor, M. Werner, P. R. Chalker, R. T. Murray, J. M. Gaskell, A. C. Jones; Dielectric relaxation of lanthanum doped zirconium oxide. J. Appl. Phys. 15 February 2009; 105 (4): 044102. https://doi.org/10.1063/1.3078038
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