The photoluminescence properties of doped phosphors under 147, 168, 185, 222, and 262 nm excitation were studied in this paper. The sensitization luminescence of by was demonstrated and a useful concentration scope, which is , for doped into as candidate of plasma display panel red phosphor was optimized. The relative emission intensity of ions occupying sites in crystal increases gradually with concentration increasing, while the emission of occupying sites decreases because of energy transfer from sites to sites. The peak of emission band changes from 295 to 320 nm as concentration increases from 0.1 to . Therefore, is the critical concentration for ions to transfer their absorption energy between different sites at room temperature. As a result, the luminescence of , decreases as concentration increases further.
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1 January 2009
Research Article|
January 07 2009
Photoluminescence properties of and in host under vacuum ultraviolet/ultraviolet excitation
Lei Chen;
Lei Chen
1School of Materials Science and Engineering,
Hefei University of Technology
, Hefei 230009, China
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Guangtao Yang;
Guangtao Yang
2National Synchrotron Radiation Laboratory,
University of Science and Technology of China
, Hefei 230029, China
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Jiaqin Liu;
Jiaqin Liu
1School of Materials Science and Engineering,
Hefei University of Technology
, Hefei 230009, China
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Xia Shu;
Xia Shu
1School of Materials Science and Engineering,
Hefei University of Technology
, Hefei 230009, China
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Guobin Zhang;
Guobin Zhang
2National Synchrotron Radiation Laboratory,
University of Science and Technology of China
, Hefei 230029, China
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Yang Jiang
Yang Jiang
a)
1School of Materials Science and Engineering,
Hefei University of Technology
, Hefei 230009, China
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a)
Author to whom correspondence should be addressed. Electronic mail: apjiang@hfut.edu.cn.
J. Appl. Phys. 105, 013513 (2009)
Article history
Received:
August 07 2008
Accepted:
November 09 2008
Citation
Lei Chen, Guangtao Yang, Jiaqin Liu, Xia Shu, Guobin Zhang, Yang Jiang; Photoluminescence properties of and in host under vacuum ultraviolet/ultraviolet excitation. J. Appl. Phys. 1 January 2009; 105 (1): 013513. https://doi.org/10.1063/1.3053689
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