We have investigated the effects of the current density, film thickness, temperature, and additive agent on the internal stress in electrodeposited nickel thin films using a bent strip measurement. The internal stress is found to obey a scaling law expressed in terms of the current density and film thickness. The additive agent is shown to behave as a noise leading to different exponents in the dynamic scaling theory. In addition, the Arrhenius temperature dependence of the internal stress indicates the presence of thermal activation related to grain growth.
REFERENCES
1.
2.
M. F.
Doerner
and W. D.
Nix
, CRC Crit. Rev. Solid State Mater. Sci.
14
, 225
(1988
).3.
H.
Windischmann
, Crit. Rev. Solid State Mater. Sci.
17
, 547
(1992
).4.
I. C.
Noyan
, T. C.
Huang
, and B. R.
York
, Crit. Rev. Solid State Mater. Sci.
20
, 125
(1995
).5.
F.
Spaepen
, Acta Mater.
48
, 31
(2000
).6.
G. C. A. M.
Janssen
, Thin Solid Films
515
, 6654
(2007
).7.
R. W.
Hoffman
, Thin Solid Films
34
, 185
(1976
).8.
R. W.
Hoffman
, Surf. Interface Anal.
3
, 62
(1981
).9.
W. D.
Nix
and B. M.
Clemens
, J. Mater. Res.
14
, 3467
(1999
).10.
I.
Petrov
, P. B.
Barna
, L.
Hultman
, and J. E.
Greene
, J. Vac. Sci. Technol. A
21
, S117
(2003
).11.
J. M.
Thijssen
, Phys. Rev. B
51
, 1985
(1995
).12.
C.
Tang
, S.
Alexander
, and R.
Bruinsma
, Phys. Rev. Lett.
64
, 772
(1990
).13.
S. G.
Mayr
and K.
Samwer
, Phys. Rev. Lett.
87
, 036105
(2001
).14.
D. J.
Paritosh
, C. C.
Srolovitz
, X. L.
Battaile
, and J. L.
Butler
, Acta Mater.
47
, 2269
(1999
).15.
M.
Saitou
, Phys. Rev. B
66
, 073416
(2002
).16.
P. H.
Townsend
, D. M.
Barnett
, and T. A.
Brunner
, J. Appl. Phys.
62
, 4438
(1987
).17.
G. C. A. M.
Janssen
, A. J.
Dammers
, V. G. M.
Sivel
, and W. R.
Wang
, Appl. Phys. Lett.
83
, 3287
(2003
).18.
G. C. A. M.
Janssen
and J. -D.
Kamminga
, Appl. Phys. Lett.
85
, 3086
(2004
).19.
S. J.
Hearne
and J. A.
Floro
, J. Appl. Phys.
97
, 014901
(2005
).20.
G. C. A. M.
Janssen
, F. D.
Tichelaar
, and C. C. G.
Visser
, J. Appl. Phys.
100
, 093512
(2006
).21.
A. -L.
Barabási
and H. E.
Stanley
, Fractal Concepts in Surface Growth
(Cambridge University Press
, New York
, 1995
).22.
B.
Stein
, AESF Electroforming Symposium
, March 27–29 1996
(unpublished).23.
J. J.
Kelly
, N.
Yang
, T.
Headley
, and J.
Hachman
, J. Electrochem. Soc.
150
, C445
(2003
).24.
N.
Goldenfeld
, Lectures on Phase Transitions and the Renormalization Group
(Perseus
, Massachusetts
, 1992
).25.
J. J.
Binney
, N. J.
Dowrick
, A. J.
Fisher
, and M. E. J.
Newman
, The Theory of Critical Phenomena
(Oxford Science
, New York
, 1992
).26.
R. D.
Armstrong
and A. A.
Metcalfe
, J. Electroanal. Chem.
63
, 19
(1975
).27.
B.
Scharifker
and G.
Hills
, Electrochim. Acta
28
, 879
(1983
).28.
M.
Saitou
, S.
Oshiro
, and S. M.
Asadul Hossain
, J. Appl. Electrochem.
38
, 309
(2008
).29.
30.
J.
Groza
, S.
Meagher
, R. S.
Borch
, H. W.
Green
III, and A. K.
Mukherjee
, J. Mater. Sci.
27
, 3963
(1992
).31.
Y.
Tsuru
, M.
Nomura
, and F. R.
Foulkes
, J. Appl. Electrochem.
30
, 231
(2000
).© 2008 American Institute of Physics.
2008
American Institute of Physics
You do not currently have access to this content.
