We have studied the feasibility of high-resolution laser interference lithography using a tabletop , Ar laser, combined with two different optical configurations based on a Lloyd’s mirror interferometer. Using one of these schemes we have encoded periodic grating structures with a half pitch of and a vertical modulation of on a commercial PMMA photoresist. Experiments performed with larger half-pitch structures and detailed theoretical calculations demonstrate the potentiality of producing periodic structures with a half-pitch resolution down to and a height of up to . The results can be of considerable interest for the development of a complete high-resolution lithographic process operating with the laser wavelength.
Interference lithography by a soft x-ray laser beam: Nanopatterning on photoresists
A. Ritucci, A. Reale, P. Zuppella, L. Reale, P. Tucceri, G. Tomassetti, P. Bettotti, L. Pavesi; Interference lithography by a soft x-ray laser beam: Nanopatterning on photoresists. J. Appl. Phys. 1 August 2007; 102 (3): 034313. https://doi.org/10.1063/1.2764244
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