We have studied the feasibility of high-resolution laser interference lithography using a tabletop 46.9nm, 1.5ns Ar laser, combined with two different optical configurations based on a Lloyd’s mirror interferometer. Using one of these schemes we have encoded periodic grating structures with a half pitch of 42nm and a vertical modulation of 5nm on a commercial PMMA photoresist. Experiments performed with larger half-pitch structures and detailed theoretical calculations demonstrate the potentiality of producing periodic structures with a half-pitch resolution down to 20nm and a height of up to 60nm. The results can be of considerable interest for the development of a complete high-resolution lithographic process operating with the 47nm laser wavelength.

1.
S. R. J.
Brueck
,
Proc. IEEE
93
,
1704
(
2005
).
2.
H.
Schift
,
S.
Park
,
B. Y.
Jung
,
C. G.
Choi
,
C. S.
Kee
,
S. P.
Han
,
K. B.
Yoon
, and
J.
Gobrecht
,
Nanotechnology
16
,
S261
(
2005
).
3.
J.
Joo
,
B. Y.
Chow
, and
J. M.
Jacobson
,
Nano Lett.
6
,
2021
(
2006
).
4.
W. X.
Li
,
G.
Lalev
,
S.
Dimov
,
H.
Zhao
, and
D. T.
Pham
,
Appl. Surf. Sci.
253
,
3608
(
2007
).
5.
Proceedings of the fifth EUVL Symposium
Barcelona, Spain
15–18 October
2006
(unpublished).
6.
J. A.
Hoffnagle
,
W. D.
Hinsberg
,
M.
Sanchez
, and
F. A.
Houle
,
J. Vac. Sci. Technol. B
17
,
3306
(
1999
).
7.
9.
E.
Di Fabrizio
 et al.,
J. Phys.: Condens. Matter
16
,
S3517
(
2004
).
10.
M. G.
Capeluto
 et al.,
IEEE Trans. Nanotechnol.
5
,
3
(
2006
).
11.
G.
Tomassetti
 et al.,
Opt. Commun.
231
,
403
(
2004
).
13.
Y.
Liu
,
M.
Seminario
,
F. G.
Tomasel
,
C.
Chang
,
J.
Rocca
, and
D.
Attwood
,
Phys. Rev. A
63
,
033802
(
2001
).
14.
A.
Ritucci
,
G.
Tomassetti
,
A.
Reale
,
F.
Flora
, and
L.
Mezi
,
Phys. Rev. A
70
,
023818
(
2004
).
15.
R.
Gronheid
,
H. H.
Solak
,
Y.
Ekinci
,
A.
Jouve
, and
F.
Van Roey
,
Microelectron. Eng.
83
,
1103
(
2006
).
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