Mixtures and nanolaminates of and with different alumina to titania ratios were prepared by atomic layer deposition. The studies were aimed at electrical characterization of metal-insulator-semiconductor capacitors formed by combining an insulating oxide with large band gap with an oxide with high dielectric permittivity . In mixtures, the ratio of and growth cycles varied from 10:2 to 5:5 with target layer thickness in the range of . In nanolaminates, the thicknesses of and constituent layers were in the ranges of 3–6 and , respectively. Appreciable step coverage on deep trenched substrates with high aspect ratio (1:40) was achieved with short pulse and purge times otherwise suited for the deposition of planar capacitors. The measurements confirmed the model calculations of leakage currents for laminates, mixtures, and pure films predicting the lowest leakage for pure films at all possible equivalent oxide thickness (EOT) values. Inclusion of as an oxide of higher permittivity but lower band offsets on Si considerably increased the leakage. Currents in the films became strongly affected by chemical and structural defects induced by the deposition process. The as-deposited films possessed higher EOT values and lower breakdown fields, compared to the model predictions. Flatband voltage shifts and hysteresis width of capacitance-voltage curves were also affected by built-in defects. Postdeposition annealing somewhat improved the dielectric performance of the films deposited.
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1 December 2007
Research Article|
December 14 2007
Electrical characterization of mixtures and nanolaminates
Indrek Jõgi;
Indrek Jõgi
a)
Institute of Experimental Physics and Technology,
University of Tartu
, Tähe 4, 51010 Tartu, Estonia
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Kaupo Kukli;
Kaupo Kukli
Institute of Experimental Physics and Technology,
University of Tartu
, Tähe 4, 51010 Tartu, Estonia and Department of Chemistry, University of Helsinki
, P.O. Box 55, FIN-00014 University of Helsinki, Finland
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Marianna Kemell;
Marianna Kemell
Department of Chemistry,
University of Helsinki
, P.O. Box 55, FIN-00014 University of Helsinki, Finland
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Mikko Ritala;
Mikko Ritala
Department of Chemistry,
University of Helsinki
, P.O. Box 55, FIN-00014 University of Helsinki, Finland
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Markku Leskelä
Markku Leskelä
Department of Chemistry,
University of Helsinki
, P.O. Box 55, FIN-00014 University of Helsinki, Finland
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a)
Electronic mail: [email protected].
J. Appl. Phys. 102, 114114 (2007)
Article history
Received:
July 24 2007
Accepted:
October 23 2007
Citation
Indrek Jõgi, Kaupo Kukli, Marianna Kemell, Mikko Ritala, Markku Leskelä; Electrical characterization of mixtures and nanolaminates. J. Appl. Phys. 1 December 2007; 102 (11): 114114. https://doi.org/10.1063/1.2822460
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