We studied theoretically the influence of the progressive strain relaxation and the depolarizing-field effect on the thickness dependence of the out-of-plane dielectric response of epitaxial ferroelectric thin films sandwiched between extended metal electrodes. The calculations show that the inverse of the measured capacitance varies with the film thickness almost linearly in the most part of the thickness range at the majority of temperatures. Extrapolation of this linear dependence to zero thickness usually gives considerable nonzero intercept even in the absence of nonferroelectric interfacial layers. Remarkably, such apparent “interfacial capacitance” in a certain temperature range becomes negative. The physical meaning of the effective dielectric constant, which can be extracted from the slope of the reciprocal capacitance thickness dependence, is also analyzed. The theoretical predictions are compared with the experimental data obtained for single-crystalline and thin-film capacitors.
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1 April 2007
Research Article|
April 03 2007
Thickness dependence of intrinsic dielectric response and apparent interfacial capacitance in ferroelectric thin films
N. A. Pertsev;
N. A. Pertsev
a)
Institut für Festkörperforschung and CNI,
Forschungszentrum Jülich
, D-52425 Jülich, Germany
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R. Dittmann;
R. Dittmann
Institut für Festkörperforschung and CNI,
Forschungszentrum Jülich
, D-52425 Jülich, Germany
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R. Plonka;
R. Plonka
Institut für Werkstoffe der Elektrotechnik,
RWTH Aachen University
, D-52056 Aachen, Germany
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R. Waser
R. Waser
Institut für Festkörperforschung and CNI,
Forschungszentrum Jülich
, D-52425 Jülich and Institut für Werkstoffe der Elektrotechnik, RWTH Aachen University
, D-52056 Aachen, Germany
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a)
On leave from: A. F. Ioffe Physico-Technical Institute, Russian Academy of Sciences, 194021 St. Petersburg, Russia; electronic mail: [email protected]
J. Appl. Phys. 101, 074102 (2007)
Article history
Received:
November 24 2006
Accepted:
January 21 2007
Citation
N. A. Pertsev, R. Dittmann, R. Plonka, R. Waser; Thickness dependence of intrinsic dielectric response and apparent interfacial capacitance in ferroelectric thin films. J. Appl. Phys. 1 April 2007; 101 (7): 074102. https://doi.org/10.1063/1.2713934
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