Reactive neutral species densities for various conditions in dual frequency capacitively coupled discharges of , , and were determined using optical emission spectroscopy, Kr actinometry, and modeling. The reactive neutral species probed in this work include O, , N, , H, and . Densities are reported as a function of pressure , percent Ar in the feed gas (1%–86%), source power , and bias power (, ). It was found that increasing the pressure from resulted in order of magnitude increases in atomic species densities for all ash chemistries. At , percent dissociation is relatively low for all species. Also, at , the addition of Ar resulted in a small decrease in N and H densities, but an order of magnitude increase in O density. Based on modeling, it is proposed that the increase in O density is due to an increasing contribution of Penning dissociation with increasing Ar density. Only the source power contributed significantly to O and N radical densities, but bias power generated a significant H radical density above that generated via the source power. Details of these results are discussed in comparison with theory and literature.
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15 October 2006
Research Article|
October 18 2006
Characterization of neutral species densities in dual frequency capacitively coupled photoresist ash plasmas by optical emission actinometry
M. A. Worsley;
M. A. Worsley
Department of Chemical Engineering,
Stanford University
, Stanford, California 94305
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S. F. Bent;
S. F. Bent
Department of Chemical Engineering,
Stanford University
, Stanford, California 94305
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N. C. M. Fuller;
Semiconductor Research and Development Center
, IBM Research Division, Yorktown Heights, New York 10598
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T. Dalton
T. Dalton
Semiconductor Research and Development Center
, IBM Research Division, Yorktown Heights, New York 10598
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a)
Electronic mail: nfuller@us.ibm.com
J. Appl. Phys. 100, 083301 (2006)
Article history
Received:
March 20 2006
Accepted:
July 08 2006
Citation
M. A. Worsley, S. F. Bent, N. C. M. Fuller, T. Dalton; Characterization of neutral species densities in dual frequency capacitively coupled photoresist ash plasmas by optical emission actinometry. J. Appl. Phys. 15 October 2006; 100 (8): 083301. https://doi.org/10.1063/1.2358303
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