The effect of annealing epitaxial films in forming gas (FG) mixed with 0.01%, 0.1%, and oxygen was investigated using in situ x-ray diffraction at temperatures up to . The phase transition that occurs at in pure FG is shifted to higher temperatures by small admixtures of oxygen in FG. Electron diffraction patterns demonstrate that this is a transition into an oxygen-deficient ordered phase with and superstructures. The phase can be recovered by annealing in oxygen at moderate temperatures as long as it has not decomposed at higher temperatures.
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Research Article| August 16 2006
Phase stability of films upon annealing in hydrogen atmosphere
C. Rossel, A. Rosová, K. Hušeková, D. Machajdík, K. Fröhlich; Phase stability of films upon annealing in hydrogen atmosphere. J. Appl. Phys. 15 August 2006; 100 (4): 044501. https://doi.org/10.1063/1.2244523
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