capacitors were fabricated on (LAO) and (STO) substrates under identical conditions. Dielectric properties were measured in the temperature range from . High dielectric constants and single dielectric transition peaks were found in both TMO films. The dielectric constants of TMO film on STO substrate were larger than those of TMO film on LAO substrate; correspondingly, the transition temperature of TMO film on STO substrate was higher than that of TMO film on LAO substrate. Although x-ray diffraction showed both TMO films had the same epitaxial orientation, atom force microscopy revealed that the films had different surface morphologies, which originated from the YBCO layers on different substrates. The good surface morphology of YBCO layer and the element diffusion between TMO and YBCO layers may be suggested to be responsible for the significant improvement in the dielectric properties of TMO thin film.
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1 August 2006
Research Article|
August 01 2006
Microstructure-dependent dielectric properties of in capacitors
Yimin Cui;
Yimin Cui
Physics Department, School of Science,
Beijing University of Aeronautics and Astronautics
, Beijing 100083, People’s Republic of China
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Wei Cai;
Wei Cai
Physics Department, School of Science,
Beijing University of Aeronautics and Astronautics
, Beijing 100083, People’s Republic of China
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Yuan Li;
Yuan Li
Physics Department, School of Science,
Beijing University of Aeronautics and Astronautics
, Beijing 100083, People’s Republic of China
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JianQiang Qian;
JianQiang Qian
Physics Department, School of Science,
Beijing University of Aeronautics and Astronautics
, Beijing 100083, People’s Republic of China
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Ping Xu;
Ping Xu
Physics Department, School of Science,
Beijing University of Aeronautics and Astronautics
, Beijing 100083, People’s Republic of China
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Rongming Wang;
Rongming Wang
Physics Department, School of Science,
Beijing University of Aeronautics and Astronautics
, Beijing 100083, People’s Republic of China
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Junen Yao;
Junen Yao
Physics Department, School of Science,
Beijing University of Aeronautics and Astronautics
, Beijing 100083, People’s Republic of China
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Liuwan Zhang
Liuwan Zhang
Physics Department,
Tsinghua University
, Beijing 100084, People’s Republic of China
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J. Appl. Phys. 100, 034101 (2006)
Article history
Received:
December 19 2005
Accepted:
June 06 2006
Citation
Yimin Cui, Wei Cai, Yuan Li, JianQiang Qian, Ping Xu, Rongming Wang, Junen Yao, Liuwan Zhang; Microstructure-dependent dielectric properties of in capacitors. J. Appl. Phys. 1 August 2006; 100 (3): 034101. https://doi.org/10.1063/1.2220479
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