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Plasma Sources for Advanced Semiconductor Applications

Plasma sources are essential tools for advanced semiconductor and computation technologies. Laser-produced plasma powers state-of-the-art nanolithography by generating the required extreme-ultraviolet (EUV) light. Remarkable reduction of feature-sizes in modern semiconductors is a major theme for semiconductor manufacturing where features are approaching nanometers and often involve 3D structures. Predicting, modeling, and high-resolution measurements of plasma properties of advanced plasma sources are at the forefront of research for many advanced industrial applications. This Joint Special Topic Collection in Applied Physics Letters and Physics of Plasmas welcomes new submissions reporting new research results and perspectives in the field of plasma sources and their many important applications to semiconductor and computational technologies.

Read this collection’s papers published in Applied Physics Letters here and published in Physics of Plasmas here.

Guest Editors: Oscar Versolato, Ronnie Hoekstra, John Sheil, Igor Kaganovich, Thorsten Lill, Kallol Bera, Sang Ki Nam, and Hyo-Chang Lee

Special Collection Image
Bocong Zheng; Yangyang Fu; Keliang Wang; Huihui Wang; Long Chen; Thomas Schuelke; Qi Hua Fan
Sang-Young Chung; Yeong Geun Yook; Won-Seok Chang; Heechol Choi; Yeon Ho Im; Deuk-Chul Kwon
J. Gonzalez; J. Sheil
S. R. Totorica; K. Lezhnin; D. J. Hemminga; J. Gonzalez; J. Sheil; A. Diallo; A. Hyder; W. Fox
Nozomi Tanaka; Baojun Zhu; Chang Liu; Yubo Wang; Katsunobu Nishihara; James Edward Hernandez; Tomoyuki Johzaki; Atsushi Sunahara; Kyung Sik Kang; Shinji Ueyama; Ken Ozawa; Shinsuke Fujioka
Peng Tian; Jason Kenney; Shahid Rauf; Ihor Korolov; Julian Schulze
Bhavesh Ramkorun; Swapneal Jain; Adib Taba; Masoud Mahjouri-Samani; Michael E. Miller; Saikat C. Thakur; Edward Thomas, Jr.; Ryan B. Comes
Florian Krüger; Hyunjae Lee; Sang Ki Nam; Mark J. Kushner
A. N. Kropotkin; D. G. Voloshin
Lakshman Srinivasan; Laurent Invernizzi; Swaminathan Prasanna; Kristaq Gazeli; Nicolas Fagnon; Pere Roca i Cabarrocas; Guillaume Lombardi; Karim Ouaras
K. Mongey; S. J. J. de Lange; R. Brady; D. J. Hemminga; B. Delaney; M. M. Basko; E. Sokell; F. O'Reilly; J. Sheil
Elia Jüngling; Sebastian Wilczek; Thomas Mussenbrock; Marc Böke; Achim von Keudell
A. Sasaki
Yang Zhou; Kai Zhao; Fang-Fang Ma; Yong-Xin Liu; Fei Gao; Julian Schulze; You-Nian Wang
Nirbhav Singh Chopra; Ivan Romadanov; Yevgeny Raitses
Takeru Niinuma; Tsukasa Sugiura; Hiroki Morita; Weihua Jiang; Kazuyuki Sakaue; Gerry O'Sullivan; Shinichi Namba; Takeshi Higashiguchi
Sierra Jubin; Andrew Tasman Powis; Willca Villafana; Dmytro Sydorenko; Shahid Rauf; Alexander V. Khrabrov; Salman Sarwar; Igor D. Kaganovich
Masaki Kume; Tsukasa Sugiura; Hiroki Morita; Weihua Jiang; Kazuyuki Sakaue; Shinichi Namba; Gerry O'Sullivan; Takeshi Higashiguchi
A. T. Powis; I. D. Kaganovich
F. Sato; A. Nagano; Y. Teramoto
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