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Plasma Sources for Advanced Semiconductor Applications

Plasma sources are essential tools for advanced semiconductor and computation technologies. Laser-produced plasma powers state-of-the-art nanolithography by generating the required extreme-ultraviolet (EUV) light. Remarkable reduction of feature-sizes in modern semiconductors is a major theme for semiconductor manufacturing where features are approaching nanometers and often involve 3D structures. Predicting, modeling, and high-resolution measurements of plasma properties of advanced plasma sources are at the forefront of research for many advanced industrial applications. This Joint Special Topic Collection in Applied Physics Letters and Physics of Plasmas welcomes new submissions reporting new research results and perspectives in the field of plasma sources and their many important applications to semiconductor and computational technologies.

Read this collection’s papers published in Applied Physics Letters here and published in Physics of Plasmas here.

Guest Editors: Oscar Versolato, Ronnie Hoekstra, John Sheil, Igor Kaganovich, Thorsten Lill, Kallol Bera, Sang Ki Nam, and Hyo-Chang Lee

Special Collection Image
Oscar Versolato; Igor Kaganovich; Kallol Bera; Thorsten Lill; Hyo-Chang Lee; Ronnie Hoekstra; John Sheil; Sang Ki Nam
W. Villafana; A. T. Powis; S. Sharma; I. D. Kaganovich; A. V. Khrabrov
Hee-Jung Yeom; Gwang-Seok Chae; Min Young Yoon; Wooram Kim; Jae-Heon Lee; Jun-Hyung Park; Chan-Woo Park; Jung-Hyung Kim; Hyo-Chang Lee
Swati Dahiya; Narayan Sharma; Shivani Geete; Sarveshwar Sharma; Nishant Sirse; Shantanu Karkari
Yang Zhao; Xiaohua Zhou; Jianxiang Zhang; Shasha Song; Yuzhen Zhao
Seolhye Park; Yoona Park; Jaegu Seong; Haneul Lee; Namjae Bae; Ki-baek Roh; Rabul Seo; Bongsub Song; Gon-Ho Kim
Yusuke Yamashita; Kentaro Hara; Saravanapriyan Sriraman
Yu Zhang; Wei Yang; Fei Gao; You-Nian Wang
Myeong-Geon Lee; Nam-Kyun Kim; Jaemin Song; Ki-Baek Roh; Sung-Ryul Huh; Gon-Ho Kim
J. W. Brooks; M. C. Paliwoda
Bocong Zheng; Yangyang Fu; Keliang Wang; Huihui Wang; Long Chen; Thomas Schuelke; Qi Hua Fan
Sang-Young Chung; Yeong Geun Yook; Won-Seok Chang; Heechol Choi; Yeon Ho Im; Deuk-Chul Kwon
J. Gonzalez; J. Sheil
S. R. Totorica; K. Lezhnin; D. J. Hemminga; J. Gonzalez; J. Sheil; A. Diallo; A. Hyder; W. Fox
Peng Tian; Jason Kenney; Shahid Rauf; Ihor Korolov; Julian Schulze
Nozomi Tanaka; Baojun Zhu; Chang Liu; Yubo Wang; Katsunobu Nishihara; James Edward Hernandez; Tomoyuki Johzaki; Atsushi Sunahara; Kyung Sik Kang; Shinji Ueyama; Ken Ozawa; Shinsuke Fujioka
Bhavesh Ramkorun; Swapneal Jain; Adib Taba; Masoud Mahjouri-Samani; Michael E. Miller; Saikat C. Thakur; Edward Thomas, Jr.; Ryan B. Comes
Florian Krüger; Hyunjae Lee; Sang Ki Nam; Mark J. Kushner
A. N. Kropotkin; D. G. Voloshin
Lakshman Srinivasan; Laurent Invernizzi; Swaminathan Prasanna; Kristaq Gazeli; Nicolas Fagnon; Pere Roca i Cabarrocas; Guillaume Lombardi; Karim Ouaras

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