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© 1990 American Institute of Physics.
1990
American Institute of Physics
David B. Graves, Richard A. Gottscho; Computer Applications in Plasma Materials Processing: Complex and parameter-sensitive plasma processes may be better understood by a combination of simulation and experiment. Comput. Phys. 1 November 1990; 4 (6): 584–590. https://doi.org/10.1063/1.4822955
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