Computer Applications in Plasma Materials ProcessingComplex and parameter-sensitive plasma processes may be better understood by a combination of simulation and experiment

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Research Article| November 01 1990

Computer Applications in Plasma Materials Processing: Complex and parameter-sensitive plasma processes may be better understood by a combination of simulation and experiment

David B. Graves;

David B. Graves

1an Assistant Professor of Chemical Engineering at the University of California at Berkeley

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Richard A. Gottscho

2head of the Electronic Materials Research Department at AT&T Bell Laboratories, Murray Hill, New Jersey

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David B. Graves ¹

,

Richard A. Gottscho ²

1an Assistant Professor of Chemical Engineering at the University of California at Berkeley

2head of the Electronic Materials Research Department at AT&T Bell Laboratories, Murray Hill, New Jersey

Comput. Phys. 4, 584–590 (1990)

https://doi.org/10.1063/1.4822955