Because of their unique structural, chemical, optical, and biological properties, metal phosphate coatings are highly versatile for various applications. Thermodynamically facile and favorable functionalization of phosphate moieties (like orthophosphates, metaphosphates, pyrophosphates, and phosphorus-doped oxides) makes them highly sought-after functional materials as well. Being a sequential self-limiting technique, atomic layer deposition has been used for producing high-quality conformal coatings with sub-nanometer control. In this review, different atomic layer deposition-based strategies used for the deposition of phosphate materials are discussed. The mechanisms underlying those strategies are discussed, highlighting advantages and limitations of specific process chemistries. In a second part, the application of metal phosphates deposited through atomic layer deposition in energy storage and other emerging technologies such as electrocatalysis, biomedical, or luminescence applications are summarized. Next to this, perspectives on untangled knowledge gaps and opportunities for future research are also emphasized.
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March 2022
Review Article|
February 17 2022
Atomic layer deposition of metal phosphates

Lowie Henderick
;
Lowie Henderick
Department of Solid State Sciences, Ghent University
, Krijgslaan 281 S1, 9000 Gent, Belgium
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Arpan Dhara;
Arpan Dhara
Department of Solid State Sciences, Ghent University
, Krijgslaan 281 S1, 9000 Gent, Belgium
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Andreas Werbrouck;
Andreas Werbrouck
Department of Solid State Sciences, Ghent University
, Krijgslaan 281 S1, 9000 Gent, Belgium
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Jolien Dendooven
;
Jolien Dendooven
Department of Solid State Sciences, Ghent University
, Krijgslaan 281 S1, 9000 Gent, Belgium
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Christophe Detavernier
Christophe Detavernier
a)
Department of Solid State Sciences, Ghent University
, Krijgslaan 281 S1, 9000 Gent, Belgium
a)Author to whom correspondence should be addressed: [email protected]
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Lowie Henderick
Arpan Dhara
Andreas Werbrouck
Jolien Dendooven
Christophe Detavernier
a)
Department of Solid State Sciences, Ghent University
, Krijgslaan 281 S1, 9000 Gent, Belgium
a)Author to whom correspondence should be addressed: [email protected]
Appl. Phys. Rev. 9, 011310 (2022)
Article history
Received:
September 01 2021
Accepted:
January 06 2022
Citation
Lowie Henderick, Arpan Dhara, Andreas Werbrouck, Jolien Dendooven, Christophe Detavernier; Atomic layer deposition of metal phosphates. Appl. Phys. Rev. 1 March 2022; 9 (1): 011310. https://doi.org/10.1063/5.0069647
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