Visible-wavelength very large-scale integration photonic circuits have a potential to play important roles in quantum information and sensing technologies. The realization of scalable, high-speed, and low-loss photonic mesh circuits depends on reliable and well-engineered visible photonic components. Here, we report a low-voltage optical phase shifter based on piezo-actuated mechanical cantilevers, fabricated on a CMOS compatible, 200 mm wafer-based visible photonics platform. We show linear phase and amplitude modulation with 6 Vπ cm in differential operation, −1.5 to −2 dB insertion loss, and up to 40 dB contrast in the 700–780 nm range. By adjusting selected cantilever parameters, we demonstrate a low-displacement and a high-displacement device, both exhibiting a nearly flat frequency response from DC to a peak mechanical resonance at 23 and 6.8 MHz respectively, which, through resonant enhancement of Q ∼ 40, further decreases the operating voltage down to 0.15 Vπ cm.
I. INTRODUCTION
There is currently an increasing demand for very large-scale integration (VLSI) photonic circuits1,2 that provide precise, rapid, and low-power control of visible optical fields. Quantum information applications from quantum computing and networks to sensing3–5 increasingly rely on atom6–8 and atom-like9–11 systems, which make use of optical transitions in the visible wavelength regime. In chemical sensing and imaging, visible light is required to interact with particular molecular species12 and to achieve higher resolution than possible with longer wavelengths. A leading approach for large-scale optical control is programmable Mach–Zehnder meshes (MZMs),1 built from cascaded Mach–Zehnder interferometers (MZIs) [Fig. 1(a)]. Each MZI performs the unitary operation U(2) as the fundamental building block for different types of meshes,13–16 such as multi-port interferometers [Fig. 1(b)] and binary trees [Fig. 1(c)]. The complexity of scaling these circuits requires high-quality individual MZIs and has led to the development of many modulation schemes. In the near-infrared (NIR), phase modulation in MZIs has been demonstrated at large-scale with thermo-optic phase shifters17–21 and in individual devices using free-carriers,22 χ(2) nonlinearities,23–25 and MEMS.26 In the visible regime, previous reports on thermo-optic27–29 and thin-film lithium niobate30 MZIs show promise for VLSI photonics, but there remains an open challenge to build reliable MZMs that satisfy application requirements of high switching bandwidths (>10 MHz), high contrasts (>40 dB), and low losses (<1 dB) per modulator.
Piezo-optomechanical cantilevers for large-scale visible photonics: (a) diagram of a Mach–Zehnder interferometer with four phase shifters in push–pull configuration performing the U(2) operation; (b) schematic of a 4-port Mach–Zehnder mesh; (c) schematic of a 2 × 8 binary tree mesh; (d) optical microscope image of a fabricated device with four integrated cantilever phase shifters, each controlling the phases θ1,2, ϕ1,2; (e) operating principles of a piezo-optomechanical cantilever phase shifter, showing that an applied voltage Vs across an aluminum nitride piezo imparts a path-length change to the integrated SiNx waveguides, inducing an effective phase shift θ.
Piezo-optomechanical cantilevers for large-scale visible photonics: (a) diagram of a Mach–Zehnder interferometer with four phase shifters in push–pull configuration performing the U(2) operation; (b) schematic of a 4-port Mach–Zehnder mesh; (c) schematic of a 2 × 8 binary tree mesh; (d) optical microscope image of a fabricated device with four integrated cantilever phase shifters, each controlling the phases θ1,2, ϕ1,2; (e) operating principles of a piezo-optomechanical cantilever phase shifter, showing that an applied voltage Vs across an aluminum nitride piezo imparts a path-length change to the integrated SiNx waveguides, inducing an effective phase shift θ.
To address this need, we previously introduced a programmable MZM platform31 based on visible-spectrum silicon nitride (SiNx) waveguides with high-speed (>100 MHz) aluminum nitride (AlN) piezo-modulation.32 However, the modulators in this mesh have a high voltage-loss product (175 V dB), defined as VLP = Vπ × αm, where Vπ is the voltage required for a π-phase shift and αm is the modulator insertion loss. The VLP metric governs the limit on possible mesh circuit depths, given the maximum voltage (e.g., set by CMOS driver circuitry) and optical loss requirements. Conversely, for a set mesh size, cascading high-VLP modulators to reduce Vπ or improve unitary fidelity33 may not be possible due to increasing photon losses. As the number of optical components in a mesh generally increases quadratically with the number of input/output fields,15 modulators with low VLPs are highly desirable.
In this work, we demonstrate a visible-spectrum phase and amplitude modulator using piezo-actuated mechanical cantilevers. An improved undercut process in the fabrication enables reliable, singly clamped cantilevers with large released regions (>500 µm) and lower VLPs in the 20–30 V dB range, an order of magnitude improvement over our previous work.31,34 The optically broadband modulator has a 6 Vπ cm, up to >40 dB extinction, low hold-power consumption (<30 nW), −1.5 to −2 dB insertion loss, and minimal modulation losses. Moreover, the modulator exhibits a nearly flat frequency response from DC to a peak mechanical eigenmode (up to tens of MHz) for nanosecond switching or resonantly enhanced actuation to further reduce operating voltage (down to 0.15 Vπ cm or 0.8 V dB). We arrange the phase modulators for differential operation13 in an MZI configuration [microscope image shown in Fig. 1(d)] with the four possible phase shifts labeled. The device consists of 400 nm wide × 300 nm thick SiNx waveguides coupled to an AlN piezo-stack [Fig. 1(e)]. The modulator operates by applying a voltage Vs across the piezo-layer, which mechanically deforms the cantilever and induces a path length change ΔL and phase shift θ in the waveguides. We characterize the device across the 700–780 nm wavelength range and explore different cantilever designs to target various operating regimes.
II. PHASE SHIFTER FABRICATION AND DESIGN
We illustrate the cantilever design in Fig. 2. A scanning electron microscope (SEM) image is shown in Fig. 2(a) of the fully fabricated and released cantilever with false-colored SiNx waveguides, which are looped several times across the surface of the cantilever to increase the phase shifter response. Figure 2(b) maps out a cross section of our entire layer stack.
Basic design and layer stack of a piezo-optomechanical cantilever phase shifter: (a) SEM of a 300 µm overhang length cantilever with SiNx waveguides colored purple; (b) cross section schematic of a cantilever, depicting the cantilever overhang defined by the sacrificial amorphous-Si layer, SiNx waveguide (purple) and oxide cladding (gray), aluminum (yellow)/aluminum nitride (blue) piezo-stack, and the aluminum routing metal M1. Etched release holes are shown to enable removal of the amorphous-Si layer for large overhangs.
Basic design and layer stack of a piezo-optomechanical cantilever phase shifter: (a) SEM of a 300 µm overhang length cantilever with SiNx waveguides colored purple; (b) cross section schematic of a cantilever, depicting the cantilever overhang defined by the sacrificial amorphous-Si layer, SiNx waveguide (purple) and oxide cladding (gray), aluminum (yellow)/aluminum nitride (blue) piezo-stack, and the aluminum routing metal M1. Etched release holes are shown to enable removal of the amorphous-Si layer for large overhangs.
The fabrication is based on a 200 mm-wafer optical lithography process at Sandia National Labs, which we briefly summarize. First, a bottom aluminum metal layer (M1) is patterned and etched for routing electrical signals and grounds. We then deposit and pattern a sacrificial amorphous-Si (a-Si) layer for defining the cantilevers. Next, a stack of aluminum, aluminum nitride, aluminum (Al/AlN/Al) forms the electrodes and piezo-layers for optomechanical actuation. After some buffer oxide, we deposit and etch the SiNx waveguides to form the optical waveguides. We next etch a set of small release holes through the entire stack [Fig. 2(b)], exposing additional a-Si to facilitate device release. Finally, post wafer dicing, a xenon difluoride (XeF2) process removes the a-Si, undercutting all cantilever devices on a single die.
The physical mechanisms that contribute to the optical phase shift is primarily due to waveguide path length deformations induced by applying voltages across the piezo-layer, in addition to stress-optic effects.35 Using finite-element models (COMSOL Multiphysics®) of our cantilever geometry, we calculate the displacement tensor ∇u, defined as the gradient of the mechanical displacement vector field u, for a given applied voltage Vs. Integrating the displacement tensor along the meandering waveguide path [Fig. 2(a)], which we define as a curve C, we find the path length change ΔL to be
where is the unit vector parallel to the path C. This length deformation then induces a phase shift
where neff = 1.68 is the effective modal index of our waveguide. Based on our simulations, for an h = 30 µm overhang cantilever at Vs = 10 V, we estimate a total ΔL = 0.89 nm for a single waveguide loop, corresponding to θ ∼ 0.004π radians at 737 nm wavelength. We note that at lower wavelengths, the phase-shifter becomes more effective, ultimately limited by the transparency window of our SiNx. We also find in the linear elastic regime (applicable for the small strain values present in our system) that ΔL scales approximately linearly with cantilever overhang h and the number of waveguide loops NL.
The induced phase shift’s dependence on the cantilever and waveguide geometric parameters h and NL allows for a trade-off between device size, operating voltage, optical losses, and mechanical resonance frequency. Accordingly, we design two different cantilever geometries: design 1 is a high-displacement cantilever, optimized for DC, low voltage operation with a lower peak mechanical frequency, while design 2 is a low-displacement cantilever, optimized for AC, fast switching with a higher peak mechanical frequency. Table I summarizes the geometries and measured characteristics of the two devices based on experiments described in Sec. III.
Measured characteristics of piezo-optomechanical cantilevers.
Device . | Overhang h (μm) . | Waveguide loops NL . | Peak resonance frequency (MHz) . | Footprint (μm2) . | Vπ (V) . | αm (dB) . | Voltage-loss product VLP (V-dB) . |
---|---|---|---|---|---|---|---|
Design 1 cantilever | 300 | 6 | 6.8 | 350 × 325 | 15 | −1.5 | 22 |
(high-displacement) | |||||||
Design 2 cantilever | 80 | 19 | 23.3 | 100 × 650 | 18 | −2.0 | 36 |
(low-displacement) |
Device . | Overhang h (μm) . | Waveguide loops NL . | Peak resonance frequency (MHz) . | Footprint (μm2) . | Vπ (V) . | αm (dB) . | Voltage-loss product VLP (V-dB) . |
---|---|---|---|---|---|---|---|
Design 1 cantilever | 300 | 6 | 6.8 | 350 × 325 | 15 | −1.5 | 22 |
(high-displacement) | |||||||
Design 2 cantilever | 80 | 19 | 23.3 | 100 × 650 | 18 | −2.0 | 36 |
(low-displacement) |
III. DEVICE CHARACTERIZATION
We characterize our cantilever modulator’s performance by measuring MZIs with both design 1 and design 2 parameters by actuating the two internal phase shifters per MZI, each contributing a phase of θ1,2 [Fig. 1(c)], while the additional phase shifts ϕ1,2 are unused. We use a 250-µm pitch fiber array to couple a broadly tunable continuous-wave (CW) Ti:sapphire laser into our SiNx waveguides through on-chip gratings designed for the 700–780 nm range. DC and AC electrical signals are delivered with a ground-signal-ground (GSG) RF probe touching down onto electrical pads connected to the phase shifters for active modulation. Insertion losses measured at 737 nm wavelength typically range from −1.5 to −2 dB per modulator after subtracting the grating coupler efficiencies.
A. Design 1: DC actuation
We first characterize a design 1 MZI by applying a single voltage signal Vs connected in opposite polarities to the two phase shifters such that nominally θ1 = −θ2. Figure 3 shows the normalized optical transmission from the MZI’s cross-port as the voltage Vs is swept from 0 to 30 V at a 0.25 V step size. We plot modulation performances across 705, 737, and 780 nm wavelengths [Fig. 3(a)] and find the Vπ values via a sinusoidal fit of the data to be 14.0, 15.2, and 16.3 V, respectively, increasing with wavelength. The total SiNx waveguide length for design 1 is 3.9 mm (accounting for all loops), and thus, we calculate VπL ranging from 5.5 to 6.3 V cm. The passive directional couplers in our modulator are optimized (50:50 splitting) around 737 nm, and thus, the depth of modulation decreases as the wavelength moves farther away from this wavelength.33 The splitting ratios, seen more clearly in log scale [Fig. 3(b)], vary by wavelength and dip below 40 dB for 780 nm, while 737 and 705 nm show 28–30 dB, respectively. We attribute the variation to differences in polarization and frequency stability of the laser at different wavelength set points.
DC of actuation a piezo-optomechanical modulator with design 1 parameters: (a) normalized transmission of cross-port at 705, 737, and 780 nm; (b) log scale of same data.
DC of actuation a piezo-optomechanical modulator with design 1 parameters: (a) normalized transmission of cross-port at 705, 737, and 780 nm; (b) log scale of same data.
B. Design 2: AC actuation and mechanical resonance enhancement
We next investigate a design 2 MZI to determine the temporal response and mechanical resonances present in the cantilever. For the experiments in this section, we apply an AC signal to modulate phase shifter θ1 only, while the other phase shifter θ2 is set to a specific DC bias point depending on the measurement.
The switching behavior of our modulator is characterized by applying various switch signals. Here, the phase θ2 is biased such that the modulator turns “on” and “off” as θ1 is modulated. When a simple square wave is applied [Fig. 4(a)], we observe many excited mechanical resonances, including a long-lived oscillation at ∼23 MHz. The high frequency components in the sharp square edge can be suppressed by tailoring a smoothed (hyperbolic tangent) switch signal, resulting in a clean transition with a 250 ns rise time [Fig. 4(b)] more suitable for applications requiring faster time scales.
Switching characteristics of a piezo-optomechanical modulator with design 2 parameters: (a) cross-port time-trace (16 averages) of an applied 10 kHz square wave showing long-lived mechanical resonances; (b) cross-port time-trace (16 averages) of an applied 10 kHz tanh square showing a smooth transition with a rise time of 250 ns.
Switching characteristics of a piezo-optomechanical modulator with design 2 parameters: (a) cross-port time-trace (16 averages) of an applied 10 kHz square wave showing long-lived mechanical resonances; (b) cross-port time-trace (16 averages) of an applied 10 kHz tanh square showing a smooth transition with a rise time of 250 ns.
We next measure the modulator’s frequency transfer function using small-signal (0.5 V pk–pk) sinusoids on θ1 while setting θ2 to the maximum slope of the MZI’s amplitude response for enhanced contrast. Figure 5(a) plots the device’s modulation amplitude as the small-signal sine is swept in frequency, normalized to the DC response. Several piezo-mechanical resonances36 are clearly seen at 1.8, 4.4, 8.3, 14.1 MHz, and the long-lived 23.3 MHz resonance responsible for the oscillations observed in Fig. 4(a). Finite-element modeling of the cantilever confirms eigenmodes close to the measured frequencies, showing the resonances belong to the same family of modes. We show two lower order resonances at 1.8 and 4.4 MHz [Fig. 5(b)], simulated on a cantilever subsection, to illustrate the mechanical deformations. The number of ripples along the free-hanging portion of the cantilever increases for the higher frequency eigenmodes. We note that the measured resonance peaks are similar to those observed in other piezo-electronic systems.37,38
Frequency response of a piezo-optomechanical modulator with design 2 parameters: (a) measured small-signal transfer function of the modulator, depicting several mechanical eigenfrequencies including a peak at 23 MHz highlighted with a 3D finite-element simulation of the eigenmode; (b) additional finite-element simulations of the second and third order mechanical eigenmodes at 1.8 and 4.4 MHz, respectively; (c) time trace of the modulator response driven with a 0.8 V pk–pk sinusoid at 20 MHz (off resonance) and 23 MHz (on resonance), showing a resonantly enhanced phase shift per volt.
Frequency response of a piezo-optomechanical modulator with design 2 parameters: (a) measured small-signal transfer function of the modulator, depicting several mechanical eigenfrequencies including a peak at 23 MHz highlighted with a 3D finite-element simulation of the eigenmode; (b) additional finite-element simulations of the second and third order mechanical eigenmodes at 1.8 and 4.4 MHz, respectively; (c) time trace of the modulator response driven with a 0.8 V pk–pk sinusoid at 20 MHz (off resonance) and 23 MHz (on resonance), showing a resonantly enhanced phase shift per volt.
The presence of cantilever mechanical eigenmodes particular to each phase shifter allows for the resonances to greatly enhance the phase shift per voltage response. We focus on the peak mode at 23.3 MHz, for which the mechanical ripples and the waveguide loops are spatially aligned approximately in a 1:1 ratio. We record a time-resolved trace of the cross port output while applying sine waves at 20 MHz (off-resonance) and 23 MHz (on-resonance) to θ1 [Fig. 5(c)]. A large enhancement (∼15 dB) of the modulator response is seen due to the mechanical resonance effects. By adjusting the amplitude of the applied sine wave until the modulator output saturates, we measure the single cantilever Vπ to be 0.8 V. The total SiNx waveguide length for design 2 is 3.62 mm, corresponding to a VπL of 0.3 V cm (or 0.15 V cm for two cantilevers in differential operation). Comparing the resonant Vπ to the static Vπ of a single cantilever (36 V) for design 2 (see supplementary material), the mechanical Q is estimated to be ∼40. The interaction between the optics and the mechanical resonance further contributes to the path displacement effect as well as strain-optic effects—we are currently investigating the detailed theory of the resonant piezo-optoelectronic physics.
IV. DISCUSSION
We presented two specific designs for our piezo-optomechanical modulator, highlighting its versatility and overall suitability for large programmable photonic mesh circuits in the visible regime. The robustness of our fabrication process enables reliable cantilever performance and engineering of several important device parameters, including peak resonance frequency and Vπ. We characterize additional cantilevers with varying overhang lengths from three different batches of wafers. Figures 6(a) and 6(b) show the measured single-loop Vπ values at DC and peak cantilever resonance, respectively. Each data point is the average of three to five different cantilever modulators, with ±1 standard deviation error bars shown. Based on a least-squares fit, both the DC Vπ and peak mechanical resonance fR have a predictable inverse relationship with cantilever overhang, given by
where h is the cantilever overhang, NL is the number of waveguide loops, and aV and aR are the slope coefficients of the Vπ and peak resonance equations, respectively. We calculate aV and aR to be 42.7 V mm-loops and 1.81 MHz mm, respectively. From Eqs. (3) and (4), the critical parameters of Vπ and fR are quickly estimated by simply dividing a by the cantilever overhang and in the case of Vπ, further divided by the number of waveguide loops. Unlike Vπ, the peak mechanical resonance of the cantilever does not strongly depend on the number of waveguide loops. This behavior is explained by the resonance mode deformations [Fig. 5(b)], which is affected predominantly by the density of loops (nominally constant across all measured devices) over the cantilever area.
Dependence of DC Vπ and peak resonance frequency on cantilever overhang: (a) measured Vπ values for various cantilevers with a fitted slope of aV = 42.7 V mm-loops and (b) measured resonance frequency values for various cantilevers with a fitted slope of aR = 1.81 MHz mm.
Dependence of DC Vπ and peak resonance frequency on cantilever overhang: (a) measured Vπ values for various cantilevers with a fitted slope of aV = 42.7 V mm-loops and (b) measured resonance frequency values for various cantilevers with a fitted slope of aR = 1.81 MHz mm.
Despite the overall predictability of device performance, we see that the error bars in Fig. 6 increase as the cantilever overhang lengths get smaller. We attribute this effect to the smaller devices’ increased sensitivity to fabrication variations. This uncertainty applies strongly to the Vπ measurements and, to a lesser degree, the resonance frequency measurements. However, these MHz-range mechanical resonance frequencies maintain an uncertainty of less than one linewidth from the measured devices, making them more robust to fabrication variations compared to typical optical resonance structures.39
The broad ranges in operating voltage and bandwidth available to our cantilever modulator by simply adjusting parameters h and NL allow for the engineering of larger photonic meshes to application-specific needs. Ultra-low-Vπ MZMs are promising candidates for monolithically integrated photonics and CMOS electronic drivers40—a single-chip solution that allows for a small number of electronic inputs to control a large number of complex circuits. Optogenetics41 and display technologies42 would not require >1 MHz responses and would be well served by a larger cantilever with lower actuation voltage and power consumption. Other applications, such as optical switches and optical neural networks,43 would benefit from shorter cantilevers with >10 MHz resonance frequencies for high-speed reconfiguration. Moreover, quantum network switches likely prefer modulators with shorter waveguides and low optical loss at the expense of higher drive voltages. Finally, driving multiple engineered cantilevers on-resonance would be beneficial for phased arrays and light ranging applications,44,45 which require fast and cyclical control of many output beams.
SUPPLEMENTARY MATERIAL
See the supplementary material for additional device performance data.
ACKNOWLEDGMENTS
Major funding for this work was provided by MITRE for the Quantum Moonshot Program. D.E. acknowledges partial support from the DARPA ONISQ program, Brookhaven National Laboratory, supported by U.S. Department of Energy, Office of Basic Energy Sciences (Contract No. DE-SC0012704), and the NSF RAISE TAQS program. M.E. acknowledges partial support from the Center for Integrated Nanotechnologies, an Office of Science User Facility operated by the U.S. Department of Energy Office of Science. M.D. thanks Adrian Menssen, Ian Christen, and Artur Hermans for helpful technical discussions. M.D. also thanks Julia M. Boyle for characterizing the electrical impedances.
AUTHOR DECLARATIONS
Conflict of Interest
The authors have no conflicts to disclose.
DATA AVAILABILITY
The data that support the findings of this study are available from the corresponding authors upon reasonable request. The data are not publicly available.