Optical intensity modulators (OIMs) are essential for mid-infrared (mid-IR) photonics, enabling applications such as bond-selective molecular sensing, and free-space communications via atmospheric windows. Integrated photonics offers a compact and cost-effective solution, yet on-chip mid-IR OIMs significantly underperform compared to their near-IR counterparts. Furthermore, despite the potential benefits for system reconfiguration in accessing various communication frequencies and molecular absorption bands, developing a single OIM capable of operating across a broad spectral range remains a challenge. In this study, we introduce an on-chip OIM that operates over a wide wavelength range in the mid-IR, implemented using a racetrack resonator structure in thin film lithium niobate (TFLN). The modulator employs a two-point coupling scheme, allowing active control of the coupling strength to maintain critical coupling and thereby ensuring high modulation extinction across a wide spectral region. This approach not only achieves high modulation performance but also relaxes the design constraints and fabrication precision typically associated with resonator-based modulators, as confirmed through an analytic model. Implemented in TFLN having a wide transmission spectrum and strong electro-optic coefficient, the OIM demonstrates a modulation extinction ratio exceeding 20 dB with an electro-optic efficiency of 7.7 V cm over the wavelength range of 3.3–3.8 μm, which falls within the first atmospheric transmission widow in the mid-IR. This approach can be adapted to other spectral regions, providing a versatile solution for diverse photonic applications.

The mid-infrared (mid-IR) spectral region holds considerable significance for various applications, including bond-selective chemical sensing and free-space communications through atmospheric windows.1–4 Integrated photonics presents the most promising approach to achieve these unique functions at low cost, with high yield, and in a miniaturized form factor.5–11 In parallel with the ongoing efforts to implement essential building blocks of mid-IR photonics on a chip, optical intensity modulators (OIMs), indispensable for information encoding and sensitivity enhancement via synchronous detection, have been demonstrated using various material platforms, mainly relying on the electroabsorption effect.12–15 However, their performance remains significantly lagged behind that of near-IR modulators.16 

Lithium niobate (LN), known for its pronounced second-order nonlinearity, is an ideal candidate for high-performance OIMs due to its high electro-optic (EO) coefficient and broad transparency range, spanning from the ultraviolet to the mid-IR.17 The hybrid integration of silicon photonics with bonded LN bulk crystals has demonstrated the potential of LN for mid-IR modulators.18,19 Moreover, recent advances in thin-film lithium niobate (TFLN) fabrication techniques have enabled tight optical confinement within an LN waveguide, resulting in OIMs that operate with sub-volt voltages in the visible and near-infrared spectrum.20–24 Although TFLN-based OIMs for the mid-IR are promising, they have yet to be demonstrated.

In addition to the conventional performance metrics of OIMs, a wide operational spectrum, particularly in the mid-IR, is highly desirable. This capability allows for system reconfiguration with a limited number of modulators to cover different carrier frequencies for communications or to access various molecular absorption bands for sensing. However, superior material properties alone are insufficient to support wide spectral operation. The internal characteristics of conventional devices, such as the beam splitting ratio for Mach–Zehnder interferometers (MZIs), do not maintain their optimal values (50:50 for MZI) and vary with wavelength. Therefore, effective active control mechanisms need to be integrated into LN OIMs to compensate for the chromatic variations in internal properties and maintain them at optimum values, ensuring wide spectral operation in a single modulator.25,26

In this study, we demonstrate an on-chip LN optical modulator based on a microresonator that operates over a wide wavelength range in the mid-IR spectrum. By actively adjusting its coupling strength using a two-point coupling method (TPCM), a critical coupling that ensures a high extinction ratio of the modulation can be maintained across the entire operating wavelength range. The design rules for the coupling structure, significantly relaxed by the TPCM, have been quantitatively described by a simple analytic form, which we coined the relaxed critical coupling conditions (RCCCs). The developed modulator fully leverages the broad transparency window and the strong EO coefficient of LN, exhibiting high extinction ratios of over 20 dB and modulation efficiencies of 7.7 V cm over the wavelength range of 3.3–3.8 μm, which falls within the first atmospheric transmission window.

In this section, we describe the working principle of wide-spectrum OIMs, as illustrated in Fig. 1. Over the decades, intensity modulation based on microresonators, particularly involving a coupling structure between a bus waveguide and a resonator at a localized point (one-point coupling method, OPCM), has been extensively studied [Fig. 1(a)].27–29 This conventional approach modulates the intensity of the input optical wave by adjusting the resonant frequency to align the signal frequency either on resonance or off resonance [black line in Fig. 1(c)]. Therefore, to achieve a high extinction ratio in modulation, it is essential to obtain critical coupling, which results in totally destructive interference at the transmitted output port. This is accomplished by satisfying the following condition within the OPCM framework:27 
(1)
Here, τ and α correspond to the transmission coefficient and optical loss per circulation, respectively. τ is related to the coupling coefficient (κ) to satisfy the power conservation law: τ2+κ2=1. It should be noted that α is equal to 1 when the resonator is lossless.27 We note that the realization of critical coupling is challenging because it requires precise geometric alignment of the optical couplers according to the optical attenuation coefficient, which cannot be exactly predetermined but varies with each fabrication. In addition, critical coupling is inherently limited to a narrow spectral range due to the chromatic dispersive nature of the coupling coefficient τ, which is caused by the significant wavelength dependence of the waveguide evanescent field, as illustrated by the gray line in Fig. 1(c).
FIG. 1.

(a) Schematic of the one-point coupled method (OPCM). (b) Schematic of the two-point coupled method (TPCM) with a push–pull phase modulator. (c) and (d) Schematics of full-extinction intensity modulation employing critical coupling for OPCM and TPCM, respectively. The red arrow indicates the wavelength of the laser signal to be modulated. The purple solid line represents the applied voltage, and the red solid line shows the intensity of the modulated light. In the OPCM, only the resonance at a certain optimal wavelength (the black line) can exhibit a high extinction ratio, while in the TPCM, resonances at a variety of wavelengths (both the black and gray lines) can achieve high extinction ratios. (e) and (f) Diagrams of the critical condition for OPCM and TPCM, respectively. The gray solid circle indicates the trajectory that α2 can span.

FIG. 1.

(a) Schematic of the one-point coupled method (OPCM). (b) Schematic of the two-point coupled method (TPCM) with a push–pull phase modulator. (c) and (d) Schematics of full-extinction intensity modulation employing critical coupling for OPCM and TPCM, respectively. The red arrow indicates the wavelength of the laser signal to be modulated. The purple solid line represents the applied voltage, and the red solid line shows the intensity of the modulated light. In the OPCM, only the resonance at a certain optimal wavelength (the black line) can exhibit a high extinction ratio, while in the TPCM, resonances at a variety of wavelengths (both the black and gray lines) can achieve high extinction ratios. (e) and (f) Diagrams of the critical condition for OPCM and TPCM, respectively. The gray solid circle indicates the trajectory that α2 can span.

Close modal
The two-point coupling method (TPCM), also known as the MZI-coupled resonator or self-interference method, offers a design-tolerant solution that enables wide-spectrum operation.21,25,30–34 In this method, the coupled light at a single-point coupler splits into inner and outer paths and recombines at the second single-point coupler, which has the same geometric design as the first one [Fig. 1(b)]. The combination of interference and resonance introduced by this dual-path structure leads to a relaxed form of the critical coupling condition, derived from the transfer matrix method (details in Method A),
(2)
where φ and η are phase terms that can be individually controlled by varying the inner and outer optical path lengths. This additional degree of freedom modifies the one-dimensional formula Eq. (1) to the two-dimensional formula Eq. (2), as shown in Figs. 1(e) and 1(f). For the arbitrary values of τ and α, critical coupling can always be achieved by appropriately tuning φ and η, if the device meets the following sufficient condition:
(3)

We refer to this constraint as the relaxed critical coupling condition (RCCC). Previous studies on TPCM have described a sinusoidal modulation of the effective coupling strength, assuming a small coupling strength at one coupler.25,31 However, we note that the RCCC derived in this work provides a more generalized description of the coupling properties. Compared to OPCM, TPCM significantly relaxes the practical requirements to achieve critical coupling, allowing for intensity modulation with a high extinction ratio [both the black and gray lines in Fig. 1(d)] over a wide spectral range. Notably, the wavelength range satisfying the RCCC broadens as α2 increases.

To verify the validity of the RCCC, we numerically simulated the transmission spectrum of the TPCM platform in the mid-infrared wavelength range. Here, we chose a structure with a length of 1.5 mm for the modulated straight segment and a radius of 250 μm for the curved part of the resonator in Fig. 1(b). To confirm the existence of a critical coupling state, the transmission spectrum for the different applied voltages was obtained, reflecting the EO modulation efficiency with a value of 15 V−1 cm−1. Initially, Fig. 2(a) shows the transmission spectrum for three different values of τ2 (0.9, 0.5, 0.2) with α2 fixed at 0.45, corresponding to Qint = 1 × 104. Since the RCCCs specify that 0.275<τ2<0.725 according to Eq. (3), the case of τ2=0.5 supports critical coupling but the other two cases do not. Increasing α2 to 0.85 (Qint = 5 × 104) extends the RCCC range to 0.075<τ2<0.925, and the transmission spectrum shows that critical coupling is attained for all three values of τ2, as shown in Fig. 2(b). This simulation result confirms that the RCCC is a reliable criterion for determining the coupler design parameters needed to achieve critical coupling, which are significantly relaxed by the TPCM, especially with high-Q resonators.

FIG. 2.

Numerically simulated transmission spectrum of TPCM depending on τ while α2 is fixed as 0.45 (Qint = 1 × 104) and 0.85 (Qint = 5 × 104), respectively.

FIG. 2.

Numerically simulated transmission spectrum of TPCM depending on τ while α2 is fixed as 0.45 (Qint = 1 × 104) and 0.85 (Qint = 5 × 104), respectively.

Close modal

To satisfy the RCCC across a wide wavelength range from 3 to 4 μm, maintaining sufficiently low optical loss is crucial. We tailored the cross-sectional design of the TFLN [Fig. 3(a)] to reduce optical absorption loss from the SiO2 bottom cladding, which is a dominant source of loss in on-chip mid-IR photonics.18 A waveguide geometry with a top air cladding was employed, and the loss from the bottom cladding was mitigated by engineering the thickness of the TFLN.35 The observed trend of increasing propagation loss with wavelength is attributed to a greater overlap of the evanescent field with the SiO2 film, whose absorption coefficient increases with wavelength in this region.36 For an LN thickness of 900 nm and an etching depth of 350 nm [orange solid line in Fig. 3(a)], we theoretically expect a low propagation loss of less than 1.1 dB/cm (Q ∼ 1.9 × 105) over the target wavelength range, considering the material absorption.

FIG. 3.

Design and fabrication of the on-chip wide-spectrum mid-IR EO modulator. (a) Calculated propagation loss as a function of the wavelength at various thicknesses of the LN film. The refractive indices of LN and SiO2 are modeled using the Sellmeier equation, and the optical loss of SiO2 is included based on Ref. 36. The orange line represents the result of the target structure for the EO modulator. The inset shows schematic of the cross-sectional view of the waveguide and simulated electric field intensity distribution of the TE00 mode. The width and etching depth of the waveguide are fixed: W = 3 μm and Hetch = 350 nm. (b) Optical microscope image of the fabricated EO modulator. (c) SEM images of the EO modulation section (top), the point coupler (middle), and the cross section of the bus waveguide (bottom).

FIG. 3.

Design and fabrication of the on-chip wide-spectrum mid-IR EO modulator. (a) Calculated propagation loss as a function of the wavelength at various thicknesses of the LN film. The refractive indices of LN and SiO2 are modeled using the Sellmeier equation, and the optical loss of SiO2 is included based on Ref. 36. The orange line represents the result of the target structure for the EO modulator. The inset shows schematic of the cross-sectional view of the waveguide and simulated electric field intensity distribution of the TE00 mode. The width and etching depth of the waveguide are fixed: W = 3 μm and Hetch = 350 nm. (b) Optical microscope image of the fabricated EO modulator. (c) SEM images of the EO modulation section (top), the point coupler (middle), and the cross section of the bus waveguide (bottom).

Close modal

We also optimized the electro-optic modulator (EOM) configuration to reduce the optical losses caused by the circuit design while maintaining sufficient EO modulation efficiency. The length and radius of the resonator are the same as those of the simulated structure in Sec. II. To ensure consistent EO efficiency throughout the device, the waveguide width of the modulated segment was fixed at 3 μm for both the bus waveguide and the resonator. The spacing between electrodes was optimized to 14 μm, which balances minimizing electrode-induced losses and maximizing EO modulation efficiency, as shown in Fig. 3(c). In addition, to explore designs satisfying the RCCC over a wide spectral range, samples were fabricated with different gap sizes of the point-coupler, which support various transmission coefficients.

The on-chip LN device was fabricated using electron beam lithography (EBL) to pattern the FOX-16 resist and Ar-based inductively coupled plasma-reactive ion etching (ICP-RIE) to transfer the pattern onto the TFLN. The 900 nm thick, x-cut LN film was etched to a depth (Hetch) of 350 nm, followed by Ar–O2 mixture plasma exposure. Subsequently, the LN devices were thermally annealed at 530 °C for 12 h to restore optical transparency in the mid-IR wavelengths (details in Method B), after which the electrodes (100 nm Au/30 nm Ti) were formed [Fig. 3(b)].37 

We experimentally demonstrated full modulation of the coupling state, ranging from the under-coupling and critical to over-coupling regimes, across the wavelength spectrum from 3.3 to 3.8 μm within a single device. In Fig. 4, the measured DC responses of the four EOMs with different gap distances of the point coupler (denoted as Gap) are characterized. The representative resonant modes at each wavelength are successfully modulated depending on the applied DC bias through the push–pull electrodes.

FIG. 4.

DC characterization of wide-spectrum EOMs. We measured the applied bias-dependent EO modulation of resonant modes at various wavelengths ranging from 3.3 to 3.8 μm. The inset shows the applied voltage. From panel (a) to panel (d), the gap size of the point-coupler (Gap) changes from 1700, 1500, 1200, to 800 nm. While the solid lines represent either the under- or over-coupling states, the dashed line corresponds to the measure of the critical coupling state. The wavelengths indicated at the top are those around which the resonant modes were measured by coarse scanning of the laser frequency.

FIG. 4.

DC characterization of wide-spectrum EOMs. We measured the applied bias-dependent EO modulation of resonant modes at various wavelengths ranging from 3.3 to 3.8 μm. The inset shows the applied voltage. From panel (a) to panel (d), the gap size of the point-coupler (Gap) changes from 1700, 1500, 1200, to 800 nm. While the solid lines represent either the under- or over-coupling states, the dashed line corresponds to the measure of the critical coupling state. The wavelengths indicated at the top are those around which the resonant modes were measured by coarse scanning of the laser frequency.

Close modal

For the EOMs with Gap values of 1700 and 1500 nm, the longer the wavelength, the greater the transmission depth [Figs. 4(a) and 4(b)]. This is because the evanescent coupling between the bus waveguide and the resonator increases with the wavelength, allowing resonant modes at longer wavelengths to be tunable to the critical coupling state. Similarly, reducing the gap size increases the coupling coefficient κ due to the larger evanescent field overlap at the point coupler and enables the achievement of the critical coupling state over a wider spectral range. Remarkably, as shown in Fig. 4(d), the device with an 800 nm Gap reaches the critical coupling state over the entire wavelength range under investigation. Furthermore, it exhibits the EO modulation with a negligible resonant frequency change for the resonant modes at the wavelengths of 3500 and 3600 nm, which will be investigated in detail later.

By analyzing the DC response, we proved that the wide-spectrum operation of the developed device is attributed to the achievement of the RCCC. Initially, κQc and αQint were extracted by fitting the numerical simulation with the experimental results, which showed good correspondence for all four devices with different gap distances. The simulation and experimental results of the transmission spectra for the devices with a gap distance of 1700 and 800 nm are plotted in Figs. 5(a) and 5(b), respectively. The Nelder–Mead simplex optimization algorithm was used for the fitting process (Method C).

FIG. 5.

(a) and (b) Characteristic transmission spectra for different resonant modes positioned at 3300, 3500, and 3700 nm. The top and bottom correspond to experimental and numerically simulated results, respectively. δf is the relative frequency from the resonance frequency with no applied voltage. NT is normalized transmission. Panel (a) is for Gap = 1700 nm, and panel (b) is for Gap = 800 nm. (c) The extracted values of Qint and Qc. (d) The evaluated α2 and τ2 (solid lines). The dashed lines represent the upper and lower bounds of τ2, denoted as τthup2 and τthlow2. The light red box indicates the wavelength region where experimentally measured resonant modes transition from under to critical and over coupling. The red blank star marks the particular case with a 50:50 power splitting ratio: τ2=0.5.

FIG. 5.

(a) and (b) Characteristic transmission spectra for different resonant modes positioned at 3300, 3500, and 3700 nm. The top and bottom correspond to experimental and numerically simulated results, respectively. δf is the relative frequency from the resonance frequency with no applied voltage. NT is normalized transmission. Panel (a) is for Gap = 1700 nm, and panel (b) is for Gap = 800 nm. (c) The extracted values of Qint and Qc. (d) The evaluated α2 and τ2 (solid lines). The dashed lines represent the upper and lower bounds of τ2, denoted as τthup2 and τthlow2. The light red box indicates the wavelength region where experimentally measured resonant modes transition from under to critical and over coupling. The red blank star marks the particular case with a 50:50 power splitting ratio: τ2=0.5.

Close modal

Figure 5(c) shows the coupling and intrinsic Q factors, Qc and Qint, depending on the wavelength and the gap distance. For all the devices, an inverse relationship between the wavelength and Qc was consistently observed, which originates from the wavelength-dependent evanescent field overlap at the point coupler. On the other hand, Qint increases with wavelength, reaching a peak value of 5.2 × 104 (∼4.02 dB/cm) at the wavelength of 3800 nm. This trend indicates that the optical losses by the bottom SiO2 layer and electrode, which increase with wavelength, were masked by the dominant losses such as those by hydrocarbon molecules exhibiting strong absorption around a wavelength of 3.4 μm.18 In this study, these additional losses were introduced during the electrode patterning process, as evidenced by a reference sample that underwent the same fabrication steps as the EO modulator device but without the electrode formation, which exhibited significantly higher and more uniform Q-factors across the measured wavelength range (Method B).

Figure 5(d) confirms that the capture of the RCCC enables the full coupling modulation observed experimentally. τ and α were evaluated from Qc and Qint. The upper and lower bounds of the RCCC are given as τth2=κth2±α2, τthlow2=κth2α2, and τthup2=κth2+α2 [dashed lines in Fig. 5(d)]. The full modulation of the resonant mode traversing from under-, critical, to over-coupling, observed in Fig. 4 and highlighted in Fig. 5(d) with a light red box, occurs when the condition of the RCCC, τthlow2<τ2<τthup2, is satisfied. Notably, under the push–pull configuration of the electrode, τ2 tuned to 0.5 [indicated by the red blank star in Fig. 5(d)] results in no shift in the center frequency, as confirmed by the EO modulation of the transmission spectrum [the case of λ = 3500 nm in Fig. 4(d)].21,30 We expect that this specific condition, termed “pure coupling control” can be exploited for ultra-fast modulation exceeding 100 GHz as envisioned in the near-IR.21 

We note that the observed working bandwidth of the EOM with Gap of 800 nm ranging from 3.3 to 3.8 μm was limited by the operational wavelength range of the employed optical parametric oscillator (OPO) laser. We expect the actual working bandwidth to surpass the measurement. Furthermore, pulley couplers, which exhibit a more chromatically uniform coupling strength, could be a promising alternative to the point couplers used in this experiment for further expanding the operational bandwidth.38,39

Previous studies on mid-infrared OIMs have typically demonstrated operation at a single fixed wavelength or over a narrow wavelength band. However, for the first time to the best of our knowledge, we report intensity modulation with a high extinction ratio across a wide spectral range using a single modulator. Initially, the full modulation voltage (Vfull), defined as the swinging voltage required for maximal change in the transmission depth, was characterized by utilizing the critical-to-under coupling transition in the optimized device (Gap = 800 nm). The laser frequency was set to the center of the resonant mode under the critical coupling, and a 50 Hz voltage was applied. The average Vfull was 51.3 V, with the lowest value of 46.5 V being achieved at the wavelength of 3600 nm, where Qint reached its maximum (Vfullλ/Q. Considering the modulated segment length of 1.5 mm, the EO modulation efficiency was determined to be 7.7 V cm, comparable with other mid-IR platforms utilizing the Pockels effect.18,19 in addition, the extinction depth across the entire wavelength range exceeded 20 dB. In the final step, full intensity modulation with a square wave was successfully demonstrated across the entire wavelength range under investigation by applying 1 kHz rate square pulses [Fig. 6(b)]. The demonstrated modulation speed was limited by the bandwidth of the employed high-voltage amplifier.

FIG. 6.

Characterization and demonstration of wide-spectrum mid-IR intensity modulation. (a) Measurement of the full modulation voltage (Vfull) at different wavelengths. We employed the device with Gap = 800 nm. The gray box indicates the transition from the under-to critical coupling. (b) Intensity modulated optical signal (solid line) with full extinction under applied square voltage pulses (dashed line).

FIG. 6.

Characterization and demonstration of wide-spectrum mid-IR intensity modulation. (a) Measurement of the full modulation voltage (Vfull) at different wavelengths. We employed the device with Gap = 800 nm. The gray box indicates the transition from the under-to critical coupling. (b) Intensity modulated optical signal (solid line) with full extinction under applied square voltage pulses (dashed line).

Close modal

The operating voltage can be further reduced by optimization strategies, which would enable ultrafast modulation of mid-IR light. First, additional improvement of Q factors leads to a narrower linewidth of the resonant mode, thereby reducing Vfull. Second, increasing the length of the phase modulator can induce more phase difference between the resonator and the bus waveguide. Finally, the use of advanced deep LN etching techniques can surpass the current etching depth limit of 350 nm, which restricts the electrode gap spacing to 15 μm.40–44 We expect that etching depths beyond 600 nm would reduce the gap spacing between the electrodes due to the increased confinement of the optical mode, thereby enhancing the EO efficiency.

In this study, we demonstrated a TFLN micro-resonator-based OIM that operates across a broad mid-IR wavelength range, which is crucial for detecting and manipulating molecular vibrational dynamics. By employing a two-point coupling geometry, the device design requirements for achieving high modulation extinction were significantly relaxed, which was quantitatively described by a simple, general analytic form called the RCCC. To the best of our knowledge, this study is the first to achieve mid-IR intensity modulation across a wide spectral range within a single modulator despite challenges associated with the chromatic dispersive nature of the coupling coefficient and the intrinsic Q factor, which are particularly pronounced in the mid-IR wavelength. The developed modulator exhibited high extinction ratios of over 20 dB and modulation efficiencies of 7.7 V cm in the wavelength range from 3.3 to 3.8 μm. Our methods hold promise for further expansion into the deeper mid-IR spectrum by integrating with material platforms that provide high optical transmission, such as chalcogenide glass.

We modeled the TPCM, illustrated in Fig. 7, employing the transfer matrix method as follows:30,33
(4)
with the relations τ2=exp(ωtRes/Qc), τ2+κ2=1, and α2 = exp(−ωtRes/2Qint). Here, tRes is defined as the time for the light to make a single round trip in the resonator. The Qc and Qint values are the coupling and intrinsic quality factors, respectively.
FIG. 7.

We represent the characteristic parameters in the TPCM. El is the amplitude of the electric field inside just after it passes through the second coupler part. τ, κ, and α are the transmission, coupling, and attenuation coefficients. ϕ and θ1,2 correspond to the phase accumulation through the bus-waveguide and each half of the resonator, respectively.

FIG. 7.

We represent the characteristic parameters in the TPCM. El is the amplitude of the electric field inside just after it passes through the second coupler part. τ, κ, and α are the transmission, coupling, and attenuation coefficients. ϕ and θ1,2 correspond to the phase accumulation through the bus-waveguide and each half of the resonator, respectively.

Close modal

We assume that the passes through each half of the resonator and the bus waveguide exhibit the same attenuation since their length difference is about 400 μm, which results in only a 3% imbalance. The phase shifts for the paths passing through the bus waveguide and both the top and bottom parts of the resonator are given by ϕ=k0neffLWG+ΔnL, θ1=k0neffLRes/2ΔnL, and θ2=k0neffLRes/2, respectively. Here, LRes, LWG, and L are the circumference of the racetrack resonator, the total length of the bus waveguide, and the length of the electrode, respectively. The refractive index change by the Pockels effect is given as Δn=kVΔVk0,, where kV and k0 are the modulation efficiency and wavenumber in the free space, respectively. In the numerical simulation shown in Fig. 2, the value of 15 V cm−1 was used for kV, which was extracted from our device.

From Eq. (1), the output transmission, T, can be written as
(5)
Defining η = ϕθ2, the amplitude and phase of the effective field, A and φ, are determined as follows:
(6)
(7)
The formulation in Eq. (2) is utilized as numerical simulations to check the performance of the device based on the experimental results. Finally, we derived the RCCC at resonance [eiθ1+ϕ+φ=1] as follows:
(8)

We demonstrated that thermal annealing successfully reduces the propagation loss in TFLN waveguides and micro-resonators. We fabricated a 300 μm radius LN microring resonator using the same fabrication processes as those used for the EOMs. As shown in Fig. 8, we monitored the transmission spectrum and Q factor of the LN microring resonator for each of the following stages: (1) initial, as-is condition, (2) after 2 h of thermal annealing at 530 °C, (3) after additional 4 h of thermal annealing at 530 °C, and (4) following the electrode patterning process. Figure 8(b) shows the intrinsic quality factor (Qint) extracted from the loaded quality factor and transmission depth measurements. Remarkably, the thermal annealing process significantly improved Qint, reaching up to 2 × 105. As shown in Fig. 8(c), the resonances over the wide wavelength range get narrower and deeper as applying an additional annealing process. In the final step, the reference microring resonator sample undergoes the same electrode lift-off process as the main EOM sample, resulting in a decrease in Q factors, which is attributed to chemical loss. It is emphasized that the thermal annealing process should be conducted as the very last step in the whole fabrication process, or the appropriate passivation layer is essential to prevent post-fabrication contamination.

FIG. 8.

Reduction of propagation loss by the thermal annealing process. (a) Sequential process for recovering transparency of the lithium niobate film. The colors of the lines denote each step and are used for the subsequent figures. (b) Changes in the measured intrinsic Q factor for each process. The orange straight line represents the simulated result, considering the loss from the SiO2 layer. The inset shows the optical microscope image of the LN microring with a 300 μm radius. (c) Detailed transmission of the resonant modes at different wavelengths.

FIG. 8.

Reduction of propagation loss by the thermal annealing process. (a) Sequential process for recovering transparency of the lithium niobate film. The colors of the lines denote each step and are used for the subsequent figures. (b) Changes in the measured intrinsic Q factor for each process. The orange straight line represents the simulated result, considering the loss from the SiO2 layer. The inset shows the optical microscope image of the LN microring with a 300 μm radius. (c) Detailed transmission of the resonant modes at different wavelengths.

Close modal
We developed an algorithm for fitting numerical simulations with experimental results to extract κ and α, which correlate with Qc and Qint derived from the measured transmission spectrum of the resonant mode and analyzed in response to the applied voltage. At the heart of the fitting process, the scalar error function, estimating the degree of agreement, was defined as σerr=TrP×W (Fig. 9). Here, P is the modulus of the disparity between the experimental and simulated transmission in the space of the relative frequency δf with respect to the lowest transmission and the applied voltage V. W, a Gaussian weight function, prioritizes the data near the center frequency of the resonant mode (from the experimental data), facilitating faster convergence in iterative fitting. The detailed equations for P and W are as follows:
(9)
Here, Texp ,sim represents the matrix consisting of the transmission spectrum set for different voltages applied. δfc and Δf are the experimentally determined relative frequency shift and linewidth of the resonant mode, respectively, as functions of voltage.
FIG. 9.

Graphical representation of the scalar error function σerr for fitting simulations to experimental results. The matrices within the modulus symbols represent the experimental and simulated transmissions in the two-dimensional space of δf and V and their difference. The weight function reflects the experimentally obtained center frequency shift and intrinsic linewidth. P and W correspond to M by N and N by M matrics, respectively, where M and N denote the number of voltage and frequency mapping, respectively.

FIG. 9.

Graphical representation of the scalar error function σerr for fitting simulations to experimental results. The matrices within the modulus symbols represent the experimental and simulated transmissions in the two-dimensional space of δf and V and their difference. The weight function reflects the experimentally obtained center frequency shift and intrinsic linewidth. P and W correspond to M by N and N by M matrics, respectively, where M and N denote the number of voltage and frequency mapping, respectively.

Close modal

Once the initial values of α and κ and the geometrical information of the TPCM are given, the iterative fitting begins. The Nelder–Mead simplex algorithm was employed to update the parameters iteratively toward the minimum of σerr and resulted in a good agreement of the simulated results with the experimental data, as shown in Fig. 5. We note that the initial parameter set was sparsely scanned to avoid local minima problems in the optimization process.

We have established an experimental setup for precise characterization of transmission spectra spanning from 3 to 4 μm using an OPO laser [Fig. 10(a)]. To accurately measure the linewidth and relative frequency shift of the resonant modes, the OPO laser is partially divided into a free-space interferometer with a bandwidth of 75.25 MHz, and the resulting signal is used as a reference for correcting the relative frequency [Fig. 10(b)]. The coupling of light into and out of the on-chip integrated photonic device has been achieved using two identical single-mode InF3 fibers (Thorlabs) with a mean field diameter of 11 μm. To increase the fiber-to-chip coupling efficiency, we gradually adjusted the waveguide’s width from 2 to 5 μm at the device’s end facets. The measured coupling loss averaged over the employed spectral range was 31.2 dB. The out-coupled light signals were detected using a HgCdTe photodetector (VIGO Photonics). To examine the behavior of the target high-Q resonant mode in response to the applied voltage, we finely tuned the OPO laser source employing a servo-controller. For the characterization of the DC response of the resonant mode, the transmission spectrum was measured at a 10 Hz repetition rate, while the induced voltage was simultaneously modulated at a frequency of 1 Hz [Fig. 10(c)], which enabled effective measurements at ten different applied voltages.

FIG. 10.

(a) Diagram of the measurement setup of the on-chip electro-optic device depending on the applied voltage. The black and red lines denote the electrical and optical signal pathways, respectively. FG: function generator, OPO: optical parametric oscillation, HVA: high voltage amplifier, PD: photodiode, BS: beam splitter, and Pol: polarization controller. (b) Measurements of the trigger signal, transmission, and interferometer signal. (c) Measurement of DC response. Sequential measurements of the transmission for ten different applied voltages were conducted. The black, red, and purple lines represent the transmission, trigger signal, and applied voltage, respectively.

FIG. 10.

(a) Diagram of the measurement setup of the on-chip electro-optic device depending on the applied voltage. The black and red lines denote the electrical and optical signal pathways, respectively. FG: function generator, OPO: optical parametric oscillation, HVA: high voltage amplifier, PD: photodiode, BS: beam splitter, and Pol: polarization controller. (b) Measurements of the trigger signal, transmission, and interferometer signal. (c) Measurement of DC response. Sequential measurements of the transmission for ten different applied voltages were conducted. The black, red, and purple lines represent the transmission, trigger signal, and applied voltage, respectively.

Close modal

M.-K.S. and H.L acknowledge the support from the KAIST Cross-Generation Collaborative Lab project, the Institute for Information, Communication Technology Promotion of Korea (Grant Nos. 2020-0-00890 and 2021-0-00552), the National Research Foundation of Korea (Grant Nos. RS-2024-00350185 and RS-2024-00408271), the National Research Council of Science and Technology (Grant No. 21031-200), and the Samsung Research Funding & Incubation Center of Samsung Electronics (Grant No. SRFC-IT1801-03).

The authors have no conflicts to disclose.

Hyeon Hwang: Conceptualization (lead); Data curation (lead); Formal analysis (lead); Funding acquisition (lead); Investigation (lead); Methodology (lead); Validation (lead); Visualization (lead); Writing – original draft (lead); Writing – review & editing (equal). Kiyoung Ko: Data curation (equal); Resources (equal); Writing – review & editing (equal). Mohamad Reza Nurrahman: Data curation (equal); Formal analysis (equal); Writing – review & editing (equal). Kiwon Moon: Investigation (supporting); Resources (supporting). Jung Jin Ju: Investigation (equal); Resources (equal). Sang-Wook Han: Investigation (equal); Resources (equal). Hojoong Jung: Investigation (equal); Resources (equal). Min-Kyo Seo: Conceptualization (equal); Funding acquisition (equal); Project administration (equal); Supervision (equal); Writing – review & editing (equal). Hansuek Lee: Conceptualization (equal); Funding acquisition (equal); Project administration (equal); Supervision (equal); Writing – original draft (equal); Writing – review & editing (equal).

The data that support the findings of this study are available from the corresponding authors upon reasonable request.

1.
M. J.
Walsh
,
R. K.
Reddy
, and
R.
Bhargava
, “
Label-free biomedical imaging with mid-IR spectroscopy
,”
IEEE J. Sel. Top. Quantum Electron.
18
(
4
),
1502
1513
(
2012
).
2.
M.
Yan
,
P.-L.
Luo
,
K.
Iwakuni
,
G.
Millot
,
T. W.
Hänsch
, and
N.
Picqué
, “
Mid-infrared dual-comb spectroscopy with electro-optic modulators
,”
Light Sci. Appl.
6
(
10
),
e17076
(
2017
).
3.
Z.
Zuo
,
C.
Gu
,
D.
Peng
,
X.
Zou
,
Y.
Di
,
L.
Zhou
,
D.
Luo
,
Y.
Liu
, and
W.
Li
, “
Broadband mid-infrared molecular spectroscopy based on passive coherent optical–optical modulated frequency combs
,”
Photonics Res.
9
(
7
),
1358
(
2021
).
4.
K.
Zou
,
K.
Pang
,
H.
Song
,
J.
Fan
,
Z.
Zhao
,
H.
Song
,
R.
Zhang
,
H.
Zhou
,
A.
Minoofar
,
C.
Liu
,
X.
Su
,
N.
Hu
,
A.
McClung
,
M.
Torfeh
,
A.
Arbabi
,
M.
Tur
, and
A. E.
Willner
, “
High-capacity free-space optical communications using wavelength- and mode-division-multiplexing in the mid-infrared region
,”
Nat. Commun.
13
(
1
),
7662
(
2022
).
5.
T.
Hu
,
B.
Dong
,
X.
Luo
,
T.-Y.
Liow
,
J.
Song
,
C.
Lee
, and
G.-Q.
Lo
, “
Silicon photonic platforms for mid-infrared applications [invited]
,”
Photonics Res.
5
(
5
),
417
(
2017
).
6.
M.
Yu
,
Y.
Okawachi
,
A. G.
Griffith
,
N.
Picqué
,
M.
Lipson
, and
A. L.
Gaeta
, “
Silicon-chip-based mid-infrared dual-comb spectroscopy
,”
Nat. Commun.
9
(
1
),
1869
(
2018
).
7.
F.
Ottonello-Briano
,
C.
Errando-Herranz
,
H.
Rödjegård
,
H.
Martin
,
H.
Sohlström
, and
K. B.
Gylfason
, “
Carbon dioxide absorption spectroscopy with a mid-infrared silicon photonic waveguide
,”
Opt. Lett.
45
(
1
),
109
(
2020
).
8.
Q.
Qiao
,
X.
Liu
,
Z.
Ren
,
B.
Dong
,
J.
Xia
,
H.
Sun
,
C.
Lee
, and
G.
Zhou
, “
MEMS-enabled on-chip computational mid-infrared spectrometer using silicon photonics
,”
ACS Photonics
9
(
7
),
2367
2377
(
2022
).
9.
Z.
Ren
,
Z.
Zhang
,
J.
Wei
,
B.
Dong
, and
C.
Lee
, “
Wavelength-multiplexed hook nanoantennas for machine learning enabled mid-infrared spectroscopy
,”
Nat. Commun.
13
(
1
),
3859
(
2022
).
10.
B.
Hinkov
,
F.
Pilat
,
L.
Lux
,
P. L.
Souza
,
M.
David
,
A.
Schwaighofer
,
D.
Ristanić
,
B.
Schwarz
,
H.
Detz
,
A. M.
Andrews
,
B.
Lendl
, and
G.
Strasser
, “
A mid-infrared lab-on-a-chip for dynamic reaction monitoring
,”
Nat. Commun.
13
(
1
),
4753
(
2022
).
11.
A.
Shams-Ansari
,
M.
Yu
,
Z.
Chen
,
C.
Reimer
,
M.
Zhang
,
N.
Picqué
, and
M.
Lončar
, “
Thin-film lithium-niobate electro-optic platform for spectrally tailored dual-comb spectroscopy
,”
Commun. Phys.
5
(
1
),
88
(
2022
).
12.
A.
Nadgir
,
R.
Thurston
, and
M. L.
Meade
, You May Also Like Advances in Lock-in Amplifiers,
1982
.
13.
M.
Montesinos-Ballester
,
L.
Deniel
,
N.
Koompai
,
T. H. N.
Nguyen
,
J.
Frigerio
,
A.
Ballabio
,
V.
Falcone
,
X.
Le Roux
,
C.
Alonso-Ramos
,
L.
Vivien
,
A.
Bousseksou
,
G.
Isella
, and
D.
Marris-Morini
, “
Mid-infrared integrated electro-optic modulator operating up to 225 MHz between 6.4 and 10.7 μm wavelength
,”
ACS Photonics
9
(
1
),
249
255
(
2022
).
14.
T.
Li
,
M.
Nedeljkovic
,
N.
Hattasan
,
W.
Cao
,
Z.
Qu
,
C. G.
Littlejohns
,
J. S.
Penades
,
L.
Mastronardi
,
V.
Mittal
,
D.
Benedikovic
,
D. J.
Thomson
,
F. Y.
Gardes
,
H.
Wu
,
Z.
Zhou
, and
G. Z.
Mashanovich
, “
Ge-on-Si modulators operating at mid-infrared wavelengths up to 8 μm
,”
Photonics Res.
7
(
8
),
828
(
2019
).
15.
X.
Wang
,
W.
Shen
,
W.
Li
,
Y.
Liu
,
Y.
Yao
,
J.
Du
,
Q.
Song
, and
K.
Xu
, “
High-speed silicon photonic Mach–Zehnder modulator at 2 μm
,”
Photonics Res.
9
(
4
),
535
(
2021
).
16.
H.
Lin
,
Z.
Luo
,
T.
Gu
,
L. C.
Kimerling
,
K.
Wada
,
A.
Agarwal
, and
J.
Hu
, “
Mid-infrared integrated photonics on silicon: A perspective
,”
Nanophotonics
7
(
2
),
393
420
(
2017
).
17.
E. L.
Wooten
,
K. M.
Kissa
,
A.
Yi-Yan
,
E. J.
Murphy
,
D. A.
Lafaw
,
P. F.
Hallemeier
,
D.
Maack
,
D. V.
Attanasio
,
D. J.
Fritz
,
G. J.
McBrien
, and
D. E.
Bossi
, “
A review of lithium niobate modulators for fiber-optic communications systems
,”
IEEE J. Sel. Top. Quantum Electron.
6
(
1
),
69
82
(
2000
).
18.
J.
Chiles
and
S.
Fathpour
, “
Mid-infrared integrated waveguide modulators based on silicon-on-lithium-niobate photonics
,”
Optica
1
(
5
),
350
(
2014
).
19.
S.
Xu
,
Z.
Ren
,
B.
Dong
,
J.
Zhou
,
W.
Liu
, and
C.
Lee
, “
Mid‐infrared silicon‐on‐lithium‐niobate electro‐optic modulators toward integrated spectroscopic sensing systems
,”
Adv. Opt. Mater.
11
(
4
),
2202228
(
2023
).
20.
C.
Wang
,
M.
Zhang
,
X.
Chen
,
M.
Bertrand
,
A.
Shams-Ansari
,
S.
Chandrasekhar
,
P.
Winzer
, and
M.
Lončar
, “
Integrated lithium niobate electro-optic modulators operating at CMOS-compatible voltages
,”
Nature
562
(
7725
),
101
104
(
2018
).
21.
P.
Kharel
,
C.
Reimer
,
K.
Luke
,
L.
He
, and
M.
Zhang
, “
Breaking voltage–bandwidth limits in integrated lithium niobate modulators using micro-structured electrodes
,”
Optica
8
(
3
),
357
(
2021
).
22.
D.
Renaud
,
D. R.
Assumpcao
,
G.
Joe
,
A.
Shams-Ansari
,
D.
Zhu
,
Y.
Hu
,
N.
Sinclair
, and
M.
Loncar
, “
Sub-1 volt and high-bandwidth visible to near-infrared electro-optic modulators
,”
Nat. Commun.
14
(
1
),
1496
(
2023
).
23.
K.
Zhang
,
W.
Sun
,
Y.
Chen
,
H.
Feng
,
Y.
Zhang
,
Z.
Chen
, and
C.
Wang
, “
A power-efficient integrated lithium niobate electro-optic comb generator
,”
Commun. Phys.
6
(
1
),
17
(
2023
).
24.
N.
Jagatpal
,
A. J.
Mercante
,
A. N. R.
Ahmed
, and
D. W.
Prather
, “
Thin film lithium niobate electro-optic modulator for 1064 nm wavelength
,”
IEEE Photonics Technol. Lett.
33
(
5
),
271
274
(
2021
).
25.
H.
Hwang
,
H.
Heo
,
K.
Ko
,
M. R.
Nurrahman
,
K.
Moon
,
J. J.
Ju
,
S.-W.
Han
,
H.
Jung
,
H.
Lee
, and
M.-K.
Seo
, “
Electro-optic control of the external coupling strength of a high-quality-factor lithium niobate micro-resonator
,”
Opt. Lett.
47
(
23
),
6149
(
2022
).
26.
H.
Hwang
,
M. R.
Nurrahman
,
H.
Heo
,
K.
Ko
,
K.
Moon
,
J. J.
Ju
,
S.-W.
Han
,
H.
Jung
,
H.
Lee
, and
M.-K.
Seo
, “
Hyperband electro-optic modulator based on a two-pulley coupled lithium niobate racetrack resonator
,”
Opt. Lett.
49
(
3
),
658
(
2024
).
27.
A.
Yariv
, “
Critical coupling and its control in optical waveguide-ring resonator systems
,”
IEEE Photonics Technol. Lett.
14
(
4
),
483
485
(
2002
).
28.
W.
Cao
,
D.
Hagan
,
D. J.
Thomson
,
M.
Nedeljkovic
,
C. G.
Littlejohns
,
A.
Knights
,
S.-U.
Alam
,
J.
Wang
,
F.
Gardes
,
W.
Zhang
,
S.
Liu
,
K.
Li
,
M. S.
Rouifed
,
G.
Xin
,
W.
Wang
,
H.
Wang
,
G. T.
Reed
, and
G. Z.
Mashanovich
, “
High-speed silicon modulators for the 2 μm wavelength band
,”
Optica
5
(
9
),
1055
(
2018
).
29.
Y.
Yuan
,
W. V.
Sorin
,
Z.
Huang
,
X.
Zeng
,
D.
Liang
,
A.
Kumar
,
S.
Palermo
,
M.
Fiorentino
, and
R. G.
Beausoleil
, “
A 100 Gb/s PAM4 two-segment silicon microring resonator modulator using a standard foundry process
,”
ACS Photonics
9
(
4
),
1165
1171
(
2022
).
30.
W. D.
Sacher
and
J. K. S.
Poon
, “
Characteristics of microring resonators with waveguide-resonator coupling modulation
,”
J. Lightwave Technol.
27
(
17
),
3800
3811
(
2009
).
31.
Z.
Gong
,
M.
Li
,
X.
Liu
,
Y.
Xu
,
J.
Lu
,
A.
Bruch
,
J. B.
Surya
,
C.
Zou
, and
H. X.
Tang
, “
Photonic dissipation control for Kerr soliton generation in strongly Raman-active media
,”
Phys. Rev. Lett.
125
(
18
),
183901
(
2020
).
32.
J.
Hong
and
Y.
Enami
, “
Modeling and analysis of microring resonator modulators with feedback waveguide coupling
,”
J. Lightwave Technol.
29
(
21
),
3243
3249
(
2011
).
33.
L.
Zhou
and
A. W.
Poon
, “
Electrically reconfigurable silicon microring resonator-based filter with waveguide-coupled feedback
,”
Opt. Express
15
,
9194
(
2007
).
34.
D.
Kim
,
S.
Han
,
D.-G.
Kim
,
K.
Ko
,
D.-Y.
Choi
, and
H.
Lee
, “
Two-point coupling method to independently control coupling efficiency at different wavelengths
,”
Opt. Lett.
47
(
1
),
106
(
2022
).
35.
S. A.
Miller
,
M.
Yu
,
X.
Ji
,
A. G.
Griffith
,
J.
Cardenas
,
A. L.
Gaeta
, and
M.
Lipson
, “
Low-loss silicon platform for broadband mid-infrared photonics
,”
Optica
4
(
7
),
707
(
2017
).
36.
R.
Kitamura
,
L.
Pilon
, and
M.
Jonasz
, “
Optical constants of silica glass from extreme ultraviolet to far infrared at near room temperature
,”
Appl. Opt.
46
(
33
),
8118
(
2007
).
37.
A.
Shams-Ansari
,
G.
Huang
,
L.
He
,
Z.
Li
,
J.
Holzgrafe
,
M.
Jankowski
,
M.
Churaev
,
P.
Kharel
,
R.
Cheng
,
D.
Zhu
,
N.
Sinclair
,
B.
Desiatov
,
M.
Zhang
,
T. J.
Kippenberg
, and
M.
Lončar
, “
Reduced material loss in thin-film lithium niobate waveguides
,”
APL Photonics
7
(
8
),
081301
(
2022
).
38.
E.
Shah Hosseini
,
S.
Yegnanarayanan
,
A. H.
Atabaki
,
M.
Soltani
, and
A.
Adibi
, “
Systematic design and fabrication of high-Q single-mode pulley-coupled planar silicon nitride microdisk resonators at visible wavelengths
,”
Opt. Express
18
(
3
),
2127
(
2010
).
39.
G.
Moille
,
Q.
Li
,
T. C.
Briles
,
S.-P.
Yu
,
T.
Drake
,
X.
Lu
,
A.
Rao
,
D.
Westly
,
S. B.
Papp
, and
K.
Srinivasan
, “
Broadband resonator-waveguide coupling for efficient extraction of octave-spanning microcombs
,”
Opt. Lett.
44
(
19
),
4737
(
2019
).
40.
Z.
Li
,
R. N.
Wang
,
G.
Lihachev
,
J.
Zhang
,
Z.
Tan
,
M.
Churaev
,
N.
Kuznetsov
,
A.
Siddharth
,
M. J.
Bereyhi
,
J.
Riemensberger
, and
T. J.
Kippenberg
, “
High density lithium niobate photonic integrated circuits
,”
Nat. Commun.
14
(
1
),
4856
(
2023
).
41.
Y.
Gao
,
F.
Lei
,
M.
Girardi
,
Z.
Ye
,
R.
Van Laer
,
V.
Torres-Company
, and
J.
Schröder
, “
Compact lithium niobate microring resonators in the ultrahigh Q/V regime
,”
Opt. Lett.
48
(
15
),
3949
(
2023
).
42.
F.
Yang
,
X.
Fang
,
X.
Chen
,
L.
Zhu
,
F.
Zhang
,
Z.
Chen
, and
Y.
Li
, “
Monolithic thin film lithium niobate electro-optic modulator with over 110 GHz bandwidth
,”
Chin. Opt. Lett.
20
,
022502
(
2022
).
43.
R.
Zhuang
,
J.
He
,
Y.
Qi
, and
Y.
Li
, “
High-Q thin-film lithium niobate microrings fabricated with wet etching
,”
Adv. Mater.
35
(
3
),
2370015
(
2023
).
44.
S.
Yu
et al, “
Poling-assisted hydrofluoric acid wet etching of thin-film lithium niobate
,”
Opt. Lett.
49
(
4
),
854
857
(
2024
).