We report on the successful synthesis of highly conductive PdCoO2 ultrathin films on Al2O3 (0001) by pulsed laser deposition. The thin films grow along the c-axis of the layered delafossite structure of PdCoO2, corresponding to the alternating stacking of conductive Pd layers and CoO2 octahedra. The thickness-dependent transport measurement reveals that each Pd layer has a homogeneous sheet conductance as high as 5.5 mS in the samples thicker than the critical thickness of 2.1 nm. Even at the critical thickness, high conductivity exceeding 104 S cm−1 is achieved. Optical transmittance spectra exhibit high optical transparency of PdCoO2 thin films particularly in the near-infrared region. The concomitant high values of electrical conductivity and optical transmittance make PdCoO2 ultrathin films promising transparent electrodes for triangular-lattice-based materials.
A palladium-based delafossite metal, PdCoO2, is one of the most conductive oxides characterized by a long mean free path,1,2 which gives rise to hydrodynamic electron flow in ultrapure single crystals.3 The crystal structure of PdCoO2, shown in Fig. 1(a), is a natural superlattice of highly conductive two-dimensional sheets of Pd atoms and triangular lattices of CoO2 octahedra.4 The Pd ions are weakly bound with oxygens to form O–Pd–O chains. This unique anisotropic crystal structure hosts remarkably high electrical conductivity with the bulk in-plane resistivity ∼2.6 μΩ cm at 300 K, which is even lower than that of Pd metal and comparable to that of Au.5 Transport and optical measurements on bulk single crystals5,6 as well as theoretical studies7–10 have shown that the two-dimensional Pd1+ layers are responsible for the high in-plane conductivity of PdCoO2. Because of its high electrical conductivity, PdCoO2 will be applicable to transparent electrodes when stabilized in an ultrathin film form to allow light to pass through, increasing interest in the thin-film growth of PdCoO2. However, research on PdCoO2 has been limited to bulk crystals3–6,11–17 and thick films prepared by post-annealing of amorphous precursors.18 To date, ultrathin film growth of PdCoO2 remains unexplored in the literature.
(a) Crystal structure of PdCoO2. The c-axis length is about 1.77 nm. In-plane lattice configurations of (b) the Pd layer and (c) the CoO2 layers. (d) Schematic illustration of possible epitaxial relationships of PdCoO2 on an Al2O3 (0001) substrate surface. The oppositely placed CoO2 layers (domain A and B) are depicted.
(a) Crystal structure of PdCoO2. The c-axis length is about 1.77 nm. In-plane lattice configurations of (b) the Pd layer and (c) the CoO2 layers. (d) Schematic illustration of possible epitaxial relationships of PdCoO2 on an Al2O3 (0001) substrate surface. The oppositely placed CoO2 layers (domain A and B) are depicted.
Here, we demonstrate the thin-film growth of highly conductive PdCoO2 on Al2O3 (0001) substrates. Figure 1(a) shows the crystal structure of PdCoO2, consisting of three sets of the Pd and CoO2 layers stacked alternately along the c-axis. The top views of the Pd and CoO2 layers are illustrated in Figs. 1(b) and 1(c). The Pd and CoO2 layers form triangular lattices with the in-plane lattice constants of a = b = 2.83 Å.4 The oxygen atoms in PdCoO2, shown as red spheres in Fig. 1(c), form a triangular lattice with an inter-oxygen distance of 2.83 Å that equals to the in-plane lattice constants. This inter-oxygen distance in PdCoO2 is close to that in Al2O3 (2.75 Å on average), suggesting Al2O3 (0001) an appropriate substrate for the growth of PdCoO2 thin films. A consideration of the epitaxial relationship between PdCoO2 and Al2O3 suggests two possible configurations, PdCoO2 (A) and PdCoO2 (B), as shown in Fig. 1(d): the orientation of oxygen triangles on the PdCoO2 surface is in-plane upward in the domain A and is rotated by 180° in the domain B. Although the crystal structure is different between delafossite PdCoO2 and corundum Al2O3, the close similarities in the triangular lattice motif of surface oxygens enable us to synthesize highly crystalline PdCoO2 thin films.
We have prepared PdCoO2 thin films by pulsed-laser deposition (PLD). Commercially available Al2O3 (0001) substrates (SHINKOSHA CO., LTD) were ultrasonically cleaned with acetone and ethanol, followed by annealing in air at 900 °C for 12 h to obtain an atomically flat surface with step-and-terrace structures. The annealed substrate was loaded into a vacuum chamber and preheated at T = 700 °C for 10 min under an oxygen partial pressure of = 100 mTorr. A stoichiometric PdCoO2 target (KOJUNDO CHEMICAL LABORATORY Co., LTD) and a Pd–PdO mixed-phase target, prepared by sintering pelletized PdO powder at 1000 °C for 24 h in air, were ablated alternately by using a KrF excimer laser with a laser fluence of 2 J/cm2 under the growth conditions of T = 700 °C and = 100 mTorr. We repeated an ablation sequence of 140 pulses at a laser repetition rate of 5 Hz for PdCoO2 and 300 pulses at 15 Hz for Pd–PdO targets. This single cycle resulted in 0.2 nm deposition on average. We repeated the cycle to fabricate the thin films with desired thickness. The samples were cooled down to room temperature in roughly 10 min immediately after the growth. The cation composition in the films was evaluated by inductively coupled plasma atomic emission spectroscopy (ICP-AES) and energy-dispersive X-ray spectroscopy (EDX) using the calibration line determined by the ICP-AES of a thick (d ∼ 200 nm) sample. We note that thin films prepared with only a PdCoO2 target suffer from significant Pd deficiencies with typical composition ratios of Pd/Co ∼ 0.6. Employing the alternate deposition with the Pd–PdO target was found to effectively improve the stoichiometry as Pd/Co = 0.9 ± 0.1. The surface morphology was measured by atomic force microscopy (AFM). Crystal structures of the PdCoO2 thin films were characterized by X-ray diffraction (XRD). The thickness d of the samples was determined by the thickness fringes observed around the PdCoO2 (0006) diffraction peaks. The high-resolution transmission electron microscope (HRTEM) images were collected with a JEOL EM-002B. For the electrical transport measurement, indium electrodes were mechanically soldered on the samples. The temperature dependence of the sample resistance was measured by a four-terminal method using a Quantum Design, a physical property measurement system (PPMS). The transmittance spectra were measured with a Shimadzu UV-3600 plus equipped with an integrating sphere MPC-3100.
The XRD patterns for the PdCoO2 thin films with different thicknesses are shown in Fig. 2(a). All the film peaks are assigned to PdCoO2 (0003n), indicating that c-axis oriented PdCoO2 thin films are grown without any traces of impurity phases. The widths of the PdCoO2 (0003n) peaks in the 2θ-ω scans become larger with decreasing PdCoO2 thickness, as expected from the Laue function. In addition, clear interference thickness fringes appear around the main diffraction peaks for all the samples. We determined the film thickness denoted as the numbers in Fig. 2(a) using the periodicity of the fringes near PdCoO2 (0006) peaks. To identify the epitaxial relationship of PdCoO2 and Al2O3, we measured the XRD ϕ-scans around the PdCoO2 (012) and Al2O3 (012) diffraction peaks. As shown in Fig. 2(b), the ϕ-scan diffraction patterns have a 6-fold symmetry for PdCoO2 and a 3-fold symmetry for Al2O3. The peak positions in the ϕ-scans of the PdCoO2 (012) are shifted by Δϕ = 30° from those of Al2O3 (012), indicating the epitaxial relationship with the same oxygen triangular configuration in Fig. 1(d), where the lattice unit of PdCoO2 and Al2O3 is 30° rotated from each other. The PdCoO2 thin films showed the 6-fold ϕ-scan diffraction pattern, despite the 3-fold symmetric crystal structure of delafossite PdCoO2. It is thus reasonable to consider that the PdCoO2 thin film has two domains with the in-plane orientation rotated by Δϕ = 180°. This is supported by the AFM image of the PdCoO2 surface shown in Fig. 2(c), which detects triangular shapes aligned to two directions with one of the bases parallel to the direction. These triangular domains are consistent with the two kinds of crystalline orientations found in the XRD ϕ-scan and domains A and B in Fig. 1(d).
(a) The thickness-dependent 2θ-ω XRD patterns of PdCoO2 thin films grown on Al2O3 (0001). The substrate peaks are indicated by asterisks (*). The numbers in the figure are thickness d (nm). (b) The XRD in-plane azimuthal scans for the PdCoO2 (8.8 nm)/Al2O3 around the PdCoO2 (012) (top) and the Al2O3 (012) diffraction peaks (bottom). (c) The AFM topographic image of the PdCoO2 (6.7 nm)/Al2O3. Two triangular shapes corresponding to two domains are highlighted by the white dotted lines. The cross-sectional height profile along the light blue line is shown at the bottom. The steps with a 1/3 and 2/3 unit-cell (u.c.) height are marked. The scale of the bottom axis for the height profile is the same as the AFM image. (d) The cross-sectional HRTEM image of PdCoO2 (10.7 nm)/Al2O3 in Al2O3 [100] projection measured at an electron acceleration voltage of 200 kV. The inset shows the diffraction pattern measured over a wide region including the PdCoO2 thin film and the Al2O3 substrate. The PdCoO2 (0003n) and Al2O3 (0003n) reflections are indicated by white and blue arrows, respectively.
(a) The thickness-dependent 2θ-ω XRD patterns of PdCoO2 thin films grown on Al2O3 (0001). The substrate peaks are indicated by asterisks (*). The numbers in the figure are thickness d (nm). (b) The XRD in-plane azimuthal scans for the PdCoO2 (8.8 nm)/Al2O3 around the PdCoO2 (012) (top) and the Al2O3 (012) diffraction peaks (bottom). (c) The AFM topographic image of the PdCoO2 (6.7 nm)/Al2O3. Two triangular shapes corresponding to two domains are highlighted by the white dotted lines. The cross-sectional height profile along the light blue line is shown at the bottom. The steps with a 1/3 and 2/3 unit-cell (u.c.) height are marked. The scale of the bottom axis for the height profile is the same as the AFM image. (d) The cross-sectional HRTEM image of PdCoO2 (10.7 nm)/Al2O3 in Al2O3 [100] projection measured at an electron acceleration voltage of 200 kV. The inset shows the diffraction pattern measured over a wide region including the PdCoO2 thin film and the Al2O3 substrate. The PdCoO2 (0003n) and Al2O3 (0003n) reflections are indicated by white and blue arrows, respectively.
The lattice periodicity in the PdCoO2 thin film was resolved by HRTEM. As shown in Fig. 2(d), the HRTEM image of a PdCoO2 thin film shows periodic bright lines stacked along the PdCoO2 [0001] direction, corresponding to the layered crystal structure of the PdCoO2 thin film. The period of the bright lines is about 0.59 nm, which agrees well with the 1/3 unit cell height, i.e., a single stack of the Pd layer and CoO2 octahedron. This periodicity is clearly observed in the diffraction pattern of PdCoO2/Al2O3, shown in the inset of Fig. 2(d). Clear PdCoO2 (0003n) bright spots, indicated by white arrows, are observed together with those for the Al2O3 substrate indicated by blue arrows. We note that the Al2O3 substrate showed normally forbidden (0003) and (000) spots, which might be due to the strained crystal structure with off-stoichiometric oxygen composition19 caused by annealing in the growth process. The periodic HRTEM image evidences that the atomic layers in PdCoO2 are regularly ordered along the PdCoO2 [0001] direction.
The thickness dependence of the room-temperature sheet conductance (1/Rs300K) is plotted in Fig. 3(a). The 1/Rs300K linearly increases above the thickness larger than d = 2 nm, indicating that each PdCoO2 layer possesses the homogeneous sheet conductance. The room-temperature sheet conductance per Pd sheet, deduced from the slope of the fitting line in Fig. 3(a), is as high as 5.5 mS, which is comparable to that of the doped graphene (∼8 mS).20 The existence of a roughly 1-unit-cell dead layer implies that the initial growth unit seems a whole unit cell of PdCoO2 composed of three sequences of the Pd sheet/CoO2 layers, rather than the 1/3 unit cell, i.e., a single sequence of the Pd sheet/CoO2 stack. The formation of such a whole single unit cell might be a key requirement to stabilizing the structure and producing high sheet conductance. After the formation of the 1-unit-cell initial layer, the growth unit seems to become a 1/3 unit cell as evidenced by steps with the 1/3-unit-cell height in the cross-sectional height profile in Fig. 2(c). We note that a 1-unit-cell-thick dead layer should exist also in the thicker films (d > 2 nm), as indicated by the linear 1/Rs vs d dependence shifted to the positive direction in the d axis. Extrinsic scattering origins such as surface roughness and interfacial effects could be responsible for the persisting dead layer.
(a) The thickness dependence of the room-temperature sheet conductance 1/Rs300K. The inset shows 1-u.c.-thick PdCoO2, which contains 3 Pd sheets. (b) The Rs-T curves for PdCoO2 thin films with different thicknesses. The numbers in the panel correspond to the PdCoO2 thickness d (nm).
(a) The thickness dependence of the room-temperature sheet conductance 1/Rs300K. The inset shows 1-u.c.-thick PdCoO2, which contains 3 Pd sheets. (b) The Rs-T curves for PdCoO2 thin films with different thicknesses. The numbers in the panel correspond to the PdCoO2 thickness d (nm).
The temperature dependence of the sheet resistance (Rs-T curve) for d = 2.1–8.8 nm is displayed in Fig. 3(b). All the samples show a monotonic decrease of Rs upon cooling down to T ∼ 40 K with small upturns at low temperature. In comparison with polycrystalline and single-crystalline bulk studies, the residual resistance ratio (RRR) of about 2 in our films is closer to that in the polycrystalline bulk of about 4,21 rather than a high purity single-crystal of 400.14 The plausible origins for such upturns are either impurity in the thin films or carrier scattering at the domain boundaries. Further improvement of crystallinity in PdCoO2 thin films will lead to an increase in 1/Rs300K per Pd sheet toward the bulk corresponding value of ∼23 mS,1 by reducing the effect of impurities and the domain boundaries.14
The optical transmittance spectra of the PdCoO2/Al2O3 in Fig. 4 represent the specific features of the band structure and high optical transparency. The overall spectral shape is identical for all the thicknesses, representing high transparency in a near-infrared (NIR) region at around 1 eV. The transmittance spectra have three characteristic dips around 1.2, 2.8, and 5.3 eV (red arrows), positions of which are independent of the PdCoO2 film thickness. As discussed for noble metals22 and correlated oxides,23 inter-band electronic transition between a flat filled band at some different k-points and an empty band just above the Fermi surface might be the origin of the observed dip structures. The dip positions in the transmittance spectra in Fig. 4 are consistent with the flat band positions in k-space calculated by density functional theory, which is located lower than the Fermi level by E1 ∼ 0.8-1.5; E2 ∼ 2.3-3.0; E3 ∼ 5.6-5.8 eV.10 The PdCoO2 ultrathin films possess high optical transparency as shown in the inset photograph of Fig. 4. To evaluate the transmittance of the PdCoO2 films Tfilm for three energy regions (three color lines in Fig. 4), the optical loss in the Al2O3 is subtracted as Tfilm = Tfilm+sub/Tsub. The thickness dependence of the Tfilm at the selected wavelengths in near-infrared (NIR), visible (Vis), and ultraviolet (UV) regions is plotted in the left inset of Fig. 4. The Tfilm has an approximately linear dependence on the PdCoO2 thin film d. In particular, at the energy of 0.8 eV in the NIR region, the Tfilm is as high as 80% even for the thick PdCoO2 thin films (d = 8.8 nm), demonstrating the superior optical factor as a NIR transparent conductor.
Transmittance spectra of PdCoO2 (d nm)/Al2O3. The transmittance of the bare Al2O3 substrate without PdCoO2 layers is also represented. The red arrows indicate characteristic dip structures. The left inset shows the thickness dependence of the transmittance of the PdCoO2 film (Tfilm = Tfilm+sub/Tsub) plotted for selected photon energies: 0.8 eV (NIR: red), 2.3 eV (Vis: green), and 4.4 eV (UV: purple). The corresponding photon energies are indicated by vertical lines in the main transmittance spectra. The right inset is the photograph of the bare Al2O3 substrate (left), PdCoO2 (2.1 nm)/Al2O3 (middle), and PdCoO2 (4.1 nm)/Al2O3 (right).
Transmittance spectra of PdCoO2 (d nm)/Al2O3. The transmittance of the bare Al2O3 substrate without PdCoO2 layers is also represented. The red arrows indicate characteristic dip structures. The left inset shows the thickness dependence of the transmittance of the PdCoO2 film (Tfilm = Tfilm+sub/Tsub) plotted for selected photon energies: 0.8 eV (NIR: red), 2.3 eV (Vis: green), and 4.4 eV (UV: purple). The corresponding photon energies are indicated by vertical lines in the main transmittance spectra. The right inset is the photograph of the bare Al2O3 substrate (left), PdCoO2 (2.1 nm)/Al2O3 (middle), and PdCoO2 (4.1 nm)/Al2O3 (right).
In summary, PdCoO2 ultrathin films are successfully synthesized on Al2O3 (0001) substrates by PLD. High sheet conductance is obtained above d = 2.1 nm, the thickness of which is close to the c-axis lattice unit. The PdCoO2 thin films have two domains, depending on the configurations of triangular CoO2 lattices on an Al2O3 (0001) surface. Ultrathin PdCoO2 possesses high optical transparency, particularly in the NIR region, while keeping low sheet resistance ∼100 Ω. Further attempts to reduce the low-temperature residual resistance by suppressing impurities and domain boundaries will broaden the applicable research field of PdCoO2 thin films, for example, mesoscopic systems and heterostructures.
The authors thank Dr. S. Kuboya and Professor T. Matsuoka for the help in optical transmittance measurement, Mr. S. Ito for the HRTEM measurement, and Mr. F. Sakamoto for ICP-AES analysis. This work is a cooperative program (Proposal No. 16G0404) of the CRDAM-IMR, Tohoku University. This work is partly supported by a Grant-in-Aid for Specially Promoted Research (No. 25000003), a Grant-in-Aid for Scientific Research (A) (No. 15H02022) from the Japan Society for the Promotion of Science (JSPS), and the Mayekawa Houonkai Foundation.