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Voltage‐tunable‐color multilayer organic light emitting diode
Appl. Phys. Lett. 68, 2317–2319 (1996)
https://doi.org/10.1063/1.115843
Resistless, area‐selective ultrashallow P+/N junction fabrication using projection gas immersion laser doping
K.‐Josef Kramer; Somit Talwar; Isabella T. Lewis; John E. Davison; Kenneth A. Williams; Keith A. Benton; Kurt H. Weiner
Appl. Phys. Lett. 68, 2320–2322 (1996)
https://doi.org/10.1063/1.115844
Pulsed anodic etching: An effective method of preparing light‐emitting porous silicon
Appl. Phys. Lett. 68, 2323–2325 (1996)
https://doi.org/10.1063/1.115845
Waveguiding in (quantum) wire structures: Impact on the polarization characteristics and the slope of the optical gain
Appl. Phys. Lett. 68, 2326–2328 (1996)
https://doi.org/10.1063/1.115846
Vanishing optical isolation barrier in double ion‐implanted lithium niobate waveguide
Appl. Phys. Lett. 68, 2329–2331 (1996)
https://doi.org/10.1063/1.115847
ZnSe‐based birefringent waveguide as Pockels retarder in the blue‐green spectral range
Appl. Phys. Lett. 68, 2332–2334 (1996)
https://doi.org/10.1063/1.115848
New method for in situ control of Bragg reflector fabrication
Appl. Phys. Lett. 68, 2335–2336 (1996)
https://doi.org/10.1063/1.115849
Near‐infrared contact mode collection near‐field optical and normal force microscopy of modulated multiple quantum well lasers
U. Ben‐Ami; N. Tessler; N. Ben‐Ami; R. Nagar; G. Fish; K. Lieberman; G. Eisenstein; A. Lewis; J. M. Nielsen; A. Mo/eller‐Larsen
Appl. Phys. Lett. 68, 2337–2339 (1996)
https://doi.org/10.1063/1.115850
Role of heterointerface on enhancement of no‐phonon luminescence in Si‐based neighboring confinement structure
Appl. Phys. Lett. 68, 2340–2342 (1996)
https://doi.org/10.1063/1.115851
Heat diffusivity of La1−xCaxMnO3 epitaxial layers
Appl. Phys. Lett. 68, 2343–2345 (1996)
https://doi.org/10.1063/1.115852
Polyquinoxaline as an excellent electron injecting material for electroluminescent device
Appl. Phys. Lett. 68, 2346–2348 (1996)
https://doi.org/10.1063/1.115853
Surface modification of silicon (111) by annealing at high temperature in hydrogen
Lei Zhong; Ryuji Takeda; Koji Izunome; Yoshiaki Matsushita; Yoshiro Aiba; Junichi Matsushita; Jun Yoshikawa; Kenro Hayashi; Hiroshi Shirai; Hiroyoki Saito
Appl. Phys. Lett. 68, 2349–2351 (1996)
https://doi.org/10.1063/1.115854
Observation of Si in SiC composite fibers: A micro‐Raman investigation
Appl. Phys. Lett. 68, 2352–2354 (1996)
https://doi.org/10.1063/1.115855
Measurement of index of refraction of InxAl1−xAs epitaxial layer using in situ laser reflectometry
Appl. Phys. Lett. 68, 2355–2357 (1996)
https://doi.org/10.1063/1.115856
Formation and observation of 50 nm polarized domains in PbZr1−xTixO3 thin film using scanning probe microscope
T. Hidaka; T. Maruyama; M. Saitoh; N. Mikoshiba; M. Shimizu; T. Shiosaki; L. A. Wills; R. Hiskes; S. A. Dicarolis; Jun Amano
Appl. Phys. Lett. 68, 2358–2359 (1996)
https://doi.org/10.1063/1.115857
Biaxial alignment of TiN films prepared by ion beam assisted deposition
Appl. Phys. Lett. 68, 2360–2362 (1996)
https://doi.org/10.1063/1.115858
Quasi‐one‐dimensional CaF2 islands formed on Si(001) by molecular beam epitaxy
Appl. Phys. Lett. 68, 2363–2365 (1996)
https://doi.org/10.1063/1.115859
Dry oxidation mechanisms of thin dielectric films formed under N2O using isotopic tracing methods
Appl. Phys. Lett. 68, 2366–2368 (1996)
https://doi.org/10.1063/1.116135
Local field in ferroelectrics: Direct measurements with an optical probe
Appl. Phys. Lett. 68, 2369–2371 (1996)
https://doi.org/10.1063/1.116136
The effect of stress on the resistivity of submicron aluminum lines
Appl. Phys. Lett. 68, 2372–2374 (1996)
https://doi.org/10.1063/1.116137
Formation of deep thermal donors in heat‐treated Czochralski silicon
Appl. Phys. Lett. 68, 2375–2377 (1996)
https://doi.org/10.1063/1.116138
Cathodoluminescence and writing of optical patterns on porous silicon by scanning electron microscopy
Appl. Phys. Lett. 68, 2378–2379 (1996)
https://doi.org/10.1063/1.116139
Polarization effect in light emitting diodes with ordered GaInP active layers
Appl. Phys. Lett. 68, 2383–2385 (1996)
https://doi.org/10.1063/1.116141
Observation of temperature‐insensitive emission wavelength in GaInAs strained multiple‐quantum‐wire heterostructures
Appl. Phys. Lett. 68, 2386–2388 (1996)
https://doi.org/10.1063/1.116142
Ion‐beam synthesis and stability of GaAs nanocrystals in silicon
Appl. Phys. Lett. 68, 2389–2391 (1996)
https://doi.org/10.1063/1.116143
Electrical characterization of Mg‐doped GaN grown by metalorganic vapor phase epitaxy
Appl. Phys. Lett. 68, 2392–2394 (1996)
https://doi.org/10.1063/1.116144
Simulation of cluster evaporation and transient enhanced diffusion in silicon
Appl. Phys. Lett. 68, 2395–2397 (1996)
https://doi.org/10.1063/1.116145
Strain relaxation mechanism of 250 °C grown Si0.33Ge0.67/Si(001) heterostructure
Appl. Phys. Lett. 68, 2398–2400 (1996)
https://doi.org/10.1063/1.116146
Large energy shifts in GaAs‐AlGaAs quantum wells by proton irradiation‐induced intermixing
Appl. Phys. Lett. 68, 2401–2403 (1996)
https://doi.org/10.1063/1.116147
Synthesis and characterization of heteroepitaxial diamond‐structured Ge1−xCx (x=1.5–5.0%) alloys using chemical vapor deposition
Appl. Phys. Lett. 68, 2407–2409 (1996)
https://doi.org/10.1063/1.116149
Room‐temperature, short‐wavelength (400–500 nm) photoluminescence from silicon‐implanted silicon dioxide films
Appl. Phys. Lett. 68, 2410–2412 (1996)
https://doi.org/10.1063/1.116150
Effects of interfacial chemistry on the formation of interfacial layers and faulted defects in ZnSe/GaAs
Appl. Phys. Lett. 68, 2413–2415 (1996)
https://doi.org/10.1063/1.116151
Incorporation of hydrogen in nitrogen and arsenic doped ZnSe epitaxial layers grown by organometallic vapor phase epitaxy
Appl. Phys. Lett. 68, 2418–2420 (1996)
https://doi.org/10.1063/1.116153
Shallow donor neutralization in CdTe:In by atomic hydrogen
Appl. Phys. Lett. 68, 2424–2426 (1996)
https://doi.org/10.1063/1.116155
Direct scanning tunneling microscopy observation of non‐unit‐cell growth of YBa2Cu3O7−δ thin films
Appl. Phys. Lett. 68, 2427–2429 (1996)
https://doi.org/10.1063/1.116156
Molecular beam epitaxy growth of a layered cuprate having a multiple fluorite‐type block for use in trilayer junctions
Appl. Phys. Lett. 68, 2430–2432 (1996)
https://doi.org/10.1063/1.116157
The intrinsic determinants of the critical current in SIS′ and SIS high‐Tc Josephson junctions
Appl. Phys. Lett. 68, 2433–2435 (1996)
https://doi.org/10.1063/1.116158
The shape of a nanoprobe determined by imaging spherical clusters
Appl. Phys. Lett. 68, 2436–2438 (1996)
https://doi.org/10.1063/1.116159
Study of a novel C60−2,6‐bis(2,2‐bicyanovinyl)pyridine complex thin film
Appl. Phys. Lett. 68, 2441–2443 (1996)
https://doi.org/10.1063/1.116161
Analysis of capacitance‐voltage characteristics for two‐dimensional multi‐conductor in liquid crystal displays
Appl. Phys. Lett. 68, 2444–2446 (1996)
https://doi.org/10.1063/1.116162
Conductive thin films of bis(ethylenedithio)tetrathiafulvalene salt fabricated by a successive dry‐wet process
Appl. Phys. Lett. 68, 2447–2449 (1996)
https://doi.org/10.1063/1.116163
Electron‐emission‐enhanced diamond nucleation on Si by hot filament chemical vapor deposition
Appl. Phys. Lett. 68, 2450–2452 (1996)
https://doi.org/10.1063/1.116164
Roadmap on photonic metasurfaces
Sebastian A. Schulz, Rupert. F. Oulton, et al.
Era of entropy: Synthesis, structure, properties, and applications of high-entropy materials
Christina M. Rost, Alessandro R. Mazza, et al.
Topological and chiral matter—Physics and applications
Maia G. Vergniory, Takeshi Kondo, et al.