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Lifetime determination for high‐lying excited states using Z scan
Appl. Phys. Lett. 67, 2266–2268 (1995)
https://doi.org/10.1063/1.115121
Ray optics model and numerical computations for the radiation pressure micromotor
Appl. Phys. Lett. 67, 2269–2271 (1995)
https://doi.org/10.1063/1.115122
Nonlinear optical polymers with dipole moment aligned transverse to main chain
Appl. Phys. Lett. 67, 2272–2274 (1995)
https://doi.org/10.1063/1.115123
Ultrafast intensity switching and nonthermal carrier effects in semiconductor microcavity lasers
Appl. Phys. Lett. 67, 2278–2280 (1995)
https://doi.org/10.1063/1.115125
Single‐layer white light‐emitting organic electroluminescent devices based on dye‐dispersed poly(N‐vinylcarbazole)
Appl. Phys. Lett. 67, 2281–2283 (1995)
https://doi.org/10.1063/1.115126
Pseudomorphic Si1−xSnx alloy films grown by molecular beam epitaxy on Si
Appl. Phys. Lett. 67, 2287–2289 (1995)
https://doi.org/10.1063/1.115128
Effect of pressure on the crystallization of amorphous Fe–Mo–Si–B alloy with diffusion reaction at its surface
Appl. Phys. Lett. 67, 2290–2292 (1995)
https://doi.org/10.1063/1.115129
Stability hierarchy of the pseudomorphic FeSi2 phases: α, γ, and defected CsCl
Appl. Phys. Lett. 67, 2293–2295 (1995)
https://doi.org/10.1063/1.115130
The microstructural stability of Al(Cu) lines during electromigration
Appl. Phys. Lett. 67, 2296–2298 (1995)
https://doi.org/10.1063/1.115131
Deposition of continuous and well adhering diamond films on steel
Appl. Phys. Lett. 67, 2299–2301 (1995)
https://doi.org/10.1063/1.115132
Electroplating of poly(tetrafluoroethylene) using plasma enhanced chemical vapor deposited titanium nitride as an interlayer
Appl. Phys. Lett. 67, 2311–2313 (1995)
https://doi.org/10.1063/1.115136
A gas phase chemical etchant for boron nitride films
Appl. Phys. Lett. 67, 2314–2316 (1995)
https://doi.org/10.1063/1.115137
Relaxation mechanism of Ge islands/Si(001) at low temperature
Appl. Phys. Lett. 67, 2317–2319 (1995)
https://doi.org/10.1063/1.115138
Graded‐composition buffer layers using digital AlGaAsSb alloys
Appl. Phys. Lett. 67, 2320–2322 (1995)
https://doi.org/10.1063/1.114331
Far‐infrared emission spectroscopy of hot two‐dimensional plasmons in Al0.3Ga0.7As/GaAs heterojunctions
Appl. Phys. Lett. 67, 2326–2328 (1995)
https://doi.org/10.1063/1.114333
Fabrication of large area silicon solar cells by rapid thermal processing
Appl. Phys. Lett. 67, 2335–2337 (1995)
https://doi.org/10.1063/1.114336
Band‐gap reduction and valence‐band splitting of ordered GaInP2
Appl. Phys. Lett. 67, 2347–2349 (1995)
https://doi.org/10.1063/1.114340
Study of surface Fermi level and surface state distribution in InAlAs surface‐intrinsic‐n+ structure by photoreflectance
Appl. Phys. Lett. 67, 2350–2352 (1995)
https://doi.org/10.1063/1.114341
Epitaxial electrodeposition of CdTe films on InP from aqueous solutions: Role of a chemically deposited CdS intermediate layer
Appl. Phys. Lett. 67, 2355–2357 (1995)
https://doi.org/10.1063/1.114343
InGaAs/InP quantum wires grown by gas source molecular beam epitaxy onto V‐grooved InP substrates with (111)A facet sidewalls
Appl. Phys. Lett. 67, 2358–2360 (1995)
https://doi.org/10.1063/1.114344
Formation of buried oxide in silicon using separation by plasma implantation of oxygen
Appl. Phys. Lett. 67, 2361–2363 (1995)
https://doi.org/10.1063/1.114345
Au–Sn solder bumps with tungsten silicide based barrier metallization schemes
Appl. Phys. Lett. 67, 2367–2369 (1995)
https://doi.org/10.1063/1.114347
Relaxed Si0.7Ge0.3 buffer layers for high‐mobility devices
Appl. Phys. Lett. 67, 2373–2375 (1995)
https://doi.org/10.1063/1.114349
Paramagnetic resonance in GaN‐based light emitting diodes
Appl. Phys. Lett. 67, 2376–2378 (1995)
https://doi.org/10.1063/1.114350
Diamond deposition from fluorinated precursors using microwave‐plasma chemical vapor deposition
Appl. Phys. Lett. 67, 2379–2381 (1995)
https://doi.org/10.1063/1.114351
Desegregation of boron at the grain boundaries of the in situ boron doped diamond films
Appl. Phys. Lett. 67, 2382–2384 (1995)
https://doi.org/10.1063/1.114352
Incorporation mechanism of N, Al, and B impurities in chemical vapor deposition of SiC
Appl. Phys. Lett. 67, 2385–2387 (1995)
https://doi.org/10.1063/1.114555
Properties of YBa2Cu3O7−δ thick films on flexible buffered metallic substrates
X. D. Wu; S. R. Foltyn; P. N. Arendt; W. R. Blumenthal; I. H. Campbell; J. D. Cotton; J. Y. Coulter; W. L. Hults; M. P. Maley; H. F. Safar; J. L. Smith
Appl. Phys. Lett. 67, 2397–2399 (1995)
https://doi.org/10.1063/1.114559
Damping of the oscillations of a permanent magnet levitating between high‐Tc superconductors
Appl. Phys. Lett. 67, 2400–2402 (1995)
https://doi.org/10.1063/1.114560
Phase intergrowth in Bi2Sr2Ca2Cu3Ox superconducting thin films prepared by single cylindrical‐sputtering gun
Appl. Phys. Lett. 67, 2403–2405 (1995)
https://doi.org/10.1063/1.114561
High critical‐current density of Nd(Ba,Nd)2Cu3O7−δ single crystals
Appl. Phys. Lett. 67, 2406–2408 (1995)
https://doi.org/10.1063/1.114562
Nanometer scale lithography at high scanning speeds with the atomic force microscope using spin on glass
Appl. Phys. Lett. 67, 2415–2417 (1995)
https://doi.org/10.1063/1.114565
Erratum: ‘‘Electron Hall mobility of n‐GaN’’ [Appl. Phys. Lett. 66, 1972 (1995)]
Appl. Phys. Lett. 67, 2418 (1995)
https://doi.org/10.1063/1.115554
Roadmap on photonic metasurfaces
Sebastian A. Schulz, Rupert. F. Oulton, et al.
Era of entropy: Synthesis, structure, properties, and applications of high-entropy materials
Christina M. Rost, Alessandro R. Mazza, et al.
Piezoelectric phononic integrated circuits
Krishna C. Balram