A technique based on the combined measurements of random telegraph-signal noise amplitude and drain current vs. gate voltage characteristics is proposed to extract the channel mobility in inversion-mode and accumulation-mode nanowire transistors. This method does not require the preliminary knowledge of the gate oxide capacitance or that of the channel width. The method accounts for the presence of parasitic source and drain resistance effect. It has been used to extract the zero-field mobility and the field mobility reduction factor in inversion-mode and junctionless transistors operating in accumulation mode.

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