A diode has been realised using a silicon junctionless (JL) transistor. The device contains neither PN junction nor Schottky junction. The device is measured at different temperatures. The characteristics of the JL diode are essentially identical to those of a regular PN junction diode. The JL diode has an on/off current ratio of 108, an ideality factor of 1.09, and a reverse leakage current of 1 × 10−14 A at room temperature. The mechanism of the leakage current is discussed using the activation energy (EA). The turn-on voltage of the device can be tuned by JL transistor threshold voltage.

1.
C. W.
Lee
,
A.
Afzalian
,
N.
Dehdashti Akhavan
,
R.
Yan
,
I.
Ferain
, and
J. P.
Colinge
,
Appl. Phys. Lett.
94
,
053511
(
2009
).
2.
J. P.
Colinge
,
C.-W.
Lee
,
A.
Afzalian
,
N.
Dehdashti Akhavan
,
R.
Yan
,
I.
Ferain
,
P.
Razavi
,
B.
O’Neill
,
A.
Blake
,
M.
White
,
A.-M.
Kelleher
,
B.
McCarthy
, and
R.
Murphy
,
Nat. Nanotechnol.
15
,
1
(
2010
).
3.
J. P.
Colinge
,
C.-W.
Lee
,
I.
Ferain
,
N. D.
Akhavan
,
R.
Yan
,
P.
Razavi
,
R.
Yu
,
A. N.
Nazarov
, and
R. T.
Doria
,
Appl. Phys. Lett.
96
,
073510
(
2010
).
4.
A.
Kranti
,
R.
Yan
,
C.-W.
Lee
,
I.
Ferain
,
R.
Yu
,
N. D.
Akhavan
,
P.
Razavi
, and
J. P.
Colinge
, in
Proceedings of the ESSDERC Conference
(
2010
), pp.
357
360
.
5.
C. W.
Lee
,
A.
Borne
,
I.
Ferain
,
A.
Afzalian
,
R.
Yan
,
N. D.
Akhavan
,
P.
Razavi
, and
J. P.
Colinge
,
IEEE Trans. Electron Devices
57
,
620
(
2010
).
6.
A. N.
Nazarov
,
I.
Ferain
,
N. D.
Akhavan
,
P.
Razavi
,
R.
Yu
, and
J. P.
Colinge
,
Appl. Phys. Lett.
98
,
092111
(
2011
).
7.
R. T.
Doria
,
M. A.
Pavanello
,
R. D.
Trevisoli
,
M.
de Souza
,
C. W.
Lee
,
I.
Ferain
,
N. D.
Akhavan
,
R.
Yan
,
P.
Razavi
,
R.
Yu
,
A.
Kranti
, and
J. P.
Colinge
, in
SOI Conference
(
2010
), pp.
72
73
.
8.
N. D.
Akhavan
,
I.
Ferain
,
P.
Razavi
,
R.
Yu
, and
J. P.
Colinge
,
Appl. Phys. Lett.
98
,
103510
(
2011
).
9.
A.
Kranti
,
R.
Yan
,
C.-W.
Lee
,
I.
Ferain
,
R.
Yu
,
N. D.
Akhavan
,
P.
Razavi
, and
J. P.
Colinge
,
Electron. Lett.
46
,
1491
(
2010
).
10.
M.
de Souza
,
B.
Rue
,
D.
Flandre
, and
M. A.
Pavanello
,
ECS Trans.
35
,
325
(
2011
).
11.
S. M.
Sze
,
Semiconductor Devices Physics and Technology
(
Wiley
,
New York
,
2001
).
12.
D. K.
Schroder
,
Semiconductor Material and Device Characterization
(
Wiley
,
New Jersey
,
2006
), pp.
185
188
.
13.
J. P.
Colinge
,
C. W.
Lee
,
N. D.
Akhavan
,
R.
Yan
,
I.
Ferain
,
P.
Razavi
,
A.
Kranti
, and
R.
Yu
,
Semiconductor-On-Insulators Material for Nanoelectronics Applications, Engineering Materials
, edited by
A. N.
Nazarov
,
J. P.
Colinge
,
F.
Balestra
,
J. P.
Raskin
,
F.
Gamiz
, and
V. S.
Lysenko
(
Springer
,
New York
,
2011
), pp.
187
200
.
14.
R.
Duffy
,
A.
Heringa
,
V. C.
Venezia
,
J.
Loo
,
M. A.
Verheijen
,
M. J. P.
Hopstaken
,
K.
van der Tak
,
M.
de Potter
,
J. C.
Hooker
,
P.
Meunier-Beillard
, and
R.
Delhougne
,
Solid-State Electron.
54
,
243
(
2010
).
15.
D.-S.
Jeon
and
D. E.
Burk
,
IEEE Trans. Electron Devices
38
,
2101
(
1991
).
16.
S.
Ueno
,
H.
Furuta
,
Y.
Okumura
,
T.
Eimori
, and
Y.
Inoue
,
Tech. Dig. - Int. Electron Device Meet.
2002
,
449
.
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