Green GaInN/GaN quantum well light-emitting diode (LED) wafers were grown on nanopatterned -plane sapphire substrate by metal-organic vapor phase epitaxy. Without roughening the chip surface, such LEDs show triple the light output over structures on planar sapphire. By quantitative analysis the enhancement was attributed to both, enhanced generation efficiency and extraction. The spectral interference and emission patterns reveal a 58% enhanced light extraction while photoluminescence reveals a doubling of the internal quantum efficiency. The latter was attributed to a 44% lower threading dislocation density as observed in transmission electron microscopy. The partial light output power measured from the sapphire side of the unencapsulated nanopatterned substrate LED die reaches 5.2 mW at 525 nm at 100 mA compared to 1.8 mW in the reference LED.
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11 April 2011
Research Article|
April 11 2011
Defect-reduced green GaInN/GaN light-emitting diode on nanopatterned sapphire
Yufeng Li (李虞锋);
Yufeng Li (李虞锋)
1Future Chips Constellation,
Rensselaer Polytechnic Institute
, Troy, New York 12180, USA
and Department of Physics, Applied Physics, and Astronomy, Rensselaer Polytechnic Institute
, Troy, New York 12180, USA
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Shi You (尤适);
Shi You (尤适)
1Future Chips Constellation,
Rensselaer Polytechnic Institute
, Troy, New York 12180, USA
and Department of Physics, Applied Physics, and Astronomy, Rensselaer Polytechnic Institute
, Troy, New York 12180, USA
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Mingwei Zhu (朱明伟);
Mingwei Zhu (朱明伟)
1Future Chips Constellation,
Rensselaer Polytechnic Institute
, Troy, New York 12180, USA
and Department of Physics, Applied Physics, and Astronomy, Rensselaer Polytechnic Institute
, Troy, New York 12180, USA
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Liang Zhao (赵亮);
Liang Zhao (赵亮)
1Future Chips Constellation,
Rensselaer Polytechnic Institute
, Troy, New York 12180, USA
and Department of Physics, Applied Physics, and Astronomy, Rensselaer Polytechnic Institute
, Troy, New York 12180, USA
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Wenting Hou (侯文婷);
Wenting Hou (侯文婷)
1Future Chips Constellation,
Rensselaer Polytechnic Institute
, Troy, New York 12180, USA
and Department of Physics, Applied Physics, and Astronomy, Rensselaer Polytechnic Institute
, Troy, New York 12180, USA
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T. Detchprohm;
T. Detchprohm
1Future Chips Constellation,
Rensselaer Polytechnic Institute
, Troy, New York 12180, USA
and Department of Physics, Applied Physics, and Astronomy, Rensselaer Polytechnic Institute
, Troy, New York 12180, USA
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Y. Taniguchi;
Y. Taniguchi
2
SCIVAX Corporation
, Kawasaki-Shi, Kanagawa 213-0012, Japan
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N. Tamura;
N. Tamura
2
SCIVAX Corporation
, Kawasaki-Shi, Kanagawa 213-0012, Japan
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S. Tanaka;
S. Tanaka
2
SCIVAX Corporation
, Kawasaki-Shi, Kanagawa 213-0012, Japan
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C. Wetzel
1Future Chips Constellation,
Rensselaer Polytechnic Institute
, Troy, New York 12180, USA
and Department of Physics, Applied Physics, and Astronomy, Rensselaer Polytechnic Institute
, Troy, New York 12180, USA
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a)
Electronic mail: wetzel@ieee.org.
Appl. Phys. Lett. 98, 151102 (2011)
Article history
Received:
January 27 2011
Accepted:
March 24 2011
Citation
Yufeng Li, Shi You, Mingwei Zhu, Liang Zhao, Wenting Hou, T. Detchprohm, Y. Taniguchi, N. Tamura, S. Tanaka, C. Wetzel; Defect-reduced green GaInN/GaN light-emitting diode on nanopatterned sapphire. Appl. Phys. Lett. 11 April 2011; 98 (15): 151102. https://doi.org/10.1063/1.3579255
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