Synchrotron radiation photoelectron spectroscopy (SRPES) is used to investigate the in situ formation of ultra thin Mn silicate layers on , which has relevance for copper diffusion barrier layers in microelectronic devices. High temperature vacuum annealing of metallic Mn deposited on a 4 nm thermally grown film results in the self limiting formation of a magnesium silicate layer, the stoichiometry of which is consistent with the formation of . Curve fitted SRPES spectra show no evidence for the presence of a manganese oxide phase at the interface, in contrast to previous reports.
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