We demonstrate the control of the hole concentration in over a wide range by introducing compensating vacancies. The resulting evolution of the Curie temperature from 51 to 7.5 K is remarkably similar to that observed in despite the dramatically different character of hole transport between the two material systems. The highly localized nature of holes in is reflected in the accompanying increase in resistivity by many orders of magnitude. Based on variable-temperature resistivity data we present a general picture for hole conduction in which variable-range hopping is the dominant transport mechanism in the presence of compensation.
© 2011 American Institute of Physics.
2011
American Institute of Physics
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