We demonstrate efficient electron injection from a high work function metal in staggered transistors based on the high mobility poly{[-bis(2-octyldodecyl)-naphthalene-1,4,5,8-bis(dicarboximide)-2,6-diyl]-alt--(-bithiophene)}. Channel length scaling shows that the linear mobility for electrons remains higher than when reducing the channel length to a few micrometers. Field-enhanced injection favors downscaling at a fixed lateral voltage and reduces the contact resistance to at high gate voltages for channels of only a few micrometers. The contacts are asymmetric, with the source contribution dominating the overall resistance, consistent with an injection limited regime rather than bulk-limited as generally found in staggered transistors.
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Due to dependence of , gTLM is strictly not applicable, even though the error is limited on the shortest channels where the total resistance is dominated by the gateable part. Since is assumed to be -independent in DM, its dependence on can be unambiguously attributed to a dependence on the electric field. dependence on only affects the gate-voltage dependent term. In our case was equal to 12 V, 14.5 V, and 15.3 V for , , and , respectively. Likely due to short channel effects, the DM method could not be applied for