Synthesis of high-density PtSi nanocrystals for memory application Available to Purchase

Vapor-solid-solid growth mechanism was employed to synthesize PtSi nanocrystals with density of $1.5×1012cm−2$ by introducing $SiH4$ onto Pt-catalyzed $SiO2/Si$ substrate. The nanocrystal density and average size were measured by scanning electron microscope and the nanocrystal chemical nature was determined by x-ray photoelectron spectroscope. Metal-oxide-semiconductor memory with PtSi nanocrystals was fabricated and characterized, showing very good memory performance.