Annealing native oxide covered GaAs samples in prior to atomic-layer-deposition of with trimethyaluminum (TMA) and isopropanol (IPA) results in capacitance-voltage characteristics of the treated samples that resemble the superior characteristics of -type GaAs grown by an in situ metal-organic chemical vapor deposition process. Both TMA and IPA show self-cleaning effect on removing the native oxide in ex situ process, little evidence of a native oxide was observed with high resolution transmission electron microscopy at the interface. The discrepancy in the characteristics was observed in in situ - and -type GaAs samples.
REFERENCES
1.
M.
Passlack
, M.
Hong
, J. P.
Mannaerts
, R. L.
Opila
, S. N. G.
Chu
, N.
Moriya
, F.
Ren
, and J. R.
Kwo
, IEEE Trans. Electron Devices
44
, 214
(1997
).2.
F.
Ren
, J. M.
Kuo
, M.
Hong
, W. S.
Hobson
, J. R.
Lothian
, J.
Lin
, H. S.
Tasi
, J. P.
Mannaerts
, J.
Kwo
, S. N. G.
Chu
, Y. K.
Chen
, and A. Y.
Cho
, IEEE Electron Device Lett.
19
, 309
(1998
).3.
M. M.
Frank
, G. D.
Wilk
, D.
Starodub
, T.
Gustafsson
, E.
Garfunkel
, Y. J.
Chabal
, J.
Grazul
, and D. A.
Muller
, Appl. Phys. Lett.
86
, 152904
(2005
).4.
M. L.
Huang
, Y. C.
Chang
, C. H.
Chang
, Y. J.
Lee
, P.
Chang
, J.
Kwo
, T. B.
Wu
, and M.
Hong
, Appl. Phys. Lett.
87
, 252104
(2005
).5.
C. H.
Chang
, Y. K.
Chiou
, Y. C.
Chang
, K. Y.
Lee
, T. D.
Lin
, T. B.
Wu
, M.
Hong
, and J.
Kwo
, Appl. Phys. Lett.
89
, 242911
(2006
).6.
C. W.
Cheng
and E. A.
Fitzgerald
, Appl. Phys. Lett.
93
, 031902
(2008
).7.
F.
Reinhardt
, W.
Richter
, A. B.
Műller
, D.
Gutsche
, P.
Kurpas
, K.
Ploska
, K. C.
Rose
, and M.
Zorn
, J. Vac. Sci. Technol. B
11
, 1427
(1993
).8.
J. C.
Bailar
, Jr., H. J.
Emeléus
, S. R.
Nyholm
, and A. F.
Trotman-Dickenson
, Comprehensive Inorganic Chemistry
, Vol. 2
, pp. 607–609 (Academic
, New York
, 1973
).9.
A. G.
de Souza
, M. G. A.
Brasilino
, and C.
Airoldi
, J. Chem. Thermodyn.
28
, 1359
(1996
).10.
D. K.
Srivastrava
, L. K.
Krannich
, and C. L.
Watkins
, Inorg. Chem.
29
, 3502
(1990
).11.
C. L.
Hinkle
, M.
Milojevic
, B.
Brennan
, A. M.
Sonnet
, F. S.
Aguirre-Tostado
, G. J.
Hughes
, E. M.
Vogel
, and R. M.
Wallace
, Appl. Phys. Lett.
94
, 162101
(2009
).12.
J. F.
Moulder
, W. F.
Stickle
, P. E.
Sobol
, and K. D.
Bomben
, Handbook of X Ray Photoelectron Spectroscopy: A Reference Book of Standard Spectra for Identification and Interpretation of Xps Data
(Physical Electronics Division, Perkin-Elmer
, Eden Prairie
, 1992
).13.
D. A.
Shirley
, Phys. Rev. B
5
, 4709
(1972
).14.
C. L.
Hinkle
, A. M.
Sonnet
, M.
Milojevic
, F. S.
Aguirre-Tostado
, H. C.
Kim
, J.
Kim
, R. M.
Wallace
, and E. M.
Vogel
, Appl. Phys. Lett.
93
, 113506
(2008
).15.
M. D.
Pashley
, K. W.
Haberern
, R. M.
Feenstra
, and P. D.
Kirchner
, Phys. Rev. B
48
, 4612
(1993
).16.
G.
Brammertz
, H. C.
Lin
, K.
Martens
, D.
Mercier
, C.
Merckling
, J.
Penaud
, C.
Adelmann
, S.
Sioncke
, W. E.
Wang
, M.
Caymax
, M.
Meuris
, and M.
Heyns
, ECS Trans.
16
, 507
(2008
).© 2009 American Institute of Physics.
2009
American Institute of Physics
You do not currently have access to this content.