The authors study temperature dependent electrical transport in pristine and tetrafluorotetracyanoquinodimethane (F4TCNQ)-doped pentacene to explore the physical mechanism of the doping-induced reduction in the contact resistance at the metal-organic semiconductor interface. It was found that the F4TCNQ-doping induces an apparent lowering of the hole injection barrier at gold-pentacene interfaces. In addition, characteristic changes in the density of states (DOS) induced by the F4TCNQ-doping in a thin-film transistor geometry have been observed. The correlation between the doping-induced DOS and the carrier injection process is discussed.

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Here, pac was evaluated from the positive threshold gate voltage shift of 1V of the doped-PC TFT compared to the pristine-PC TFT at room temperature. The total concentration of the F4TCNQ molecules co-deposited in the PC film is equal to 4×1019cm3. Therefore, the fraction of the electronically active F4TCNQ is in the order of 102. Previous estimates of the doping efficiency of F4TCNQ molecule to PC returned a value equal to 0.1 holes/dopant in vacuum. The lower doping efficiency by a factor of about 10 observed here, is ascribed to the brief (5min) exposure of the sample to the ambient air during the transfer from the PC deposition chamber to the cryostat (see also Ref. 15).
25.
The doping-induced states observed here is potentially consistent with the previously observed Vg-dependence of Rc in TFTs (Ref. 2); An increase of Rc upon increasing the negative Vg above 10 V can be ascribed to the resonantlike-injection from Au into the doping-induced states detuned by Vg.
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