Temperature-dependent infrared photoreflectance (PR) measurements are performed on as-grown arsenic-doped HgCdTe epilayers in a midinfrared spectral region. Main PR features near bandedge manifest clear evolution of lineshape with temperature, of which the fittings identify besides a band-band process several below-gap processes. Analyses show that these features are due to photomodulation-induced screening of donor-acceptor pairs and photomodulation of band- impurity and band-band reflectance, their intensities correlate to the joint concentration of the involved energetic states. Temperature-dependent infrared PR may be a right optical spectroscopy for identifying impurity levels in semiconductors such as HgCdTe with high-density impurities.
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29 September 2008
Research Article|
October 02 2008
Evolution of infrared photoreflectance lineshape with temperature in narrow-gap HgCdTe epilayers
Jun Shao;
Jun Shao
a)
1National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics,
Chinese Academy of Sciences
, 200083 Shanghai, People’s Republic of China
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Lili Ma;
Lili Ma
1National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics,
Chinese Academy of Sciences
, 200083 Shanghai, People’s Republic of China
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Xiang Lü;
Xiang Lü
1National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics,
Chinese Academy of Sciences
, 200083 Shanghai, People’s Republic of China
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Wei Lu;
Wei Lu
1National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics,
Chinese Academy of Sciences
, 200083 Shanghai, People’s Republic of China
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Jun Wu;
Jun Wu
2Research Center for Advanced Materials and Devices, Shanghai Institute of Technical Physics,
Chinese Academy of Sciences
, 200083 Shanghai, People’s Republic of China
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F.-X. Zha;
F.-X. Zha
3Physics Department,
Shanghai University
, 200444 Shanghai, People’s Republic of China
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Y.-F. Wei;
Y.-F. Wei
2Research Center for Advanced Materials and Devices, Shanghai Institute of Technical Physics,
Chinese Academy of Sciences
, 200083 Shanghai, People’s Republic of China
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Z.-F. Li;
Z.-F. Li
1National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics,
Chinese Academy of Sciences
, 200083 Shanghai, People’s Republic of China
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S.-L. Guo;
S.-L. Guo
1National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics,
Chinese Academy of Sciences
, 200083 Shanghai, People’s Republic of China
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J.-R. Yang;
J.-R. Yang
2Research Center for Advanced Materials and Devices, Shanghai Institute of Technical Physics,
Chinese Academy of Sciences
, 200083 Shanghai, People’s Republic of China
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Li He;
Li He
2Research Center for Advanced Materials and Devices, Shanghai Institute of Technical Physics,
Chinese Academy of Sciences
, 200083 Shanghai, People’s Republic of China
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J.-H. Chu
J.-H. Chu
1National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics,
Chinese Academy of Sciences
, 200083 Shanghai, People’s Republic of China
4Key Laboratory of Polar materials and Devices, Ministry of Education,
East China Normal University
, 200062 Shanghai, People’s Republic of China
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a)
Author to whom correspondence should be addressed. Electronic mail: jshao@mail.sitp.ac.cn.
Appl. Phys. Lett. 93, 131914 (2008)
Article history
Received:
August 04 2008
Accepted:
September 16 2008
Citation
Jun Shao, Lili Ma, Xiang Lü, Wei Lu, Jun Wu, F.-X. Zha, Y.-F. Wei, Z.-F. Li, S.-L. Guo, J.-R. Yang, Li He, J.-H. Chu; Evolution of infrared photoreflectance lineshape with temperature in narrow-gap HgCdTe epilayers. Appl. Phys. Lett. 29 September 2008; 93 (13): 131914. https://doi.org/10.1063/1.2996030
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