We have investigated the interfacial reaction between platinum and InGaP in a Schottky diode structure. There was a -thick amorphous layer formed at the interface between Pt and InGaP after metal deposition. After annealing at for , this amorphous layer increased to and the reverse leakage current also decreased. The diffusion of Pt atoms and the crystallization of amorphous layer took place after annealing at for . Prolonging the annealing to led to formation of and phases in InGaP and Schottky diodes degraded after these new phases were observed.
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