On the role of surface tensions and process conditions in detachment nanolithography

The calculated surface energies from the literature are as follows: $γAlq3=36.4mJ∕m2$⁠, $γnovolac=44.2mJ∕m2$⁠, $γNPB=31.8mJ∕m2$⁠, $γITO=32.4mJ∕m2$⁠, $γAl=44.9mJ∕m2$⁠, $γSi=63.2mJ∕m2$⁠, and $γAu=43.9mJ∕m2$⁠. Also, work of adhesion values are $Wepoxy∕Alq3=64.5mJ∕m2$⁠, $WAlq3∕ITO=41.0mJ∕m2$⁠, $WPDMS∕Alq3=57.6mJ∕m2$⁠, $WPUA∕novolac=81.7mJ∕m2$⁠, and $Wnovolac∕Al=78.2mJ∕m2$⁠. According to our experiment results, the values are $WPUA(high)∕NPB=72.8mJ∕m2$⁠, $WPUA(low)∕NPB=39.3mJ∕m2$⁠, $WNPB∕Si=59.7mJ∕m2$⁠, and $WNPB∕Au=71.7mJ∕m2$⁠. The calculated interface energies are as follows: $γAlq3∕ITO=27.8mJ∕m2$⁠, $γnovolac∕Al=10.9mJ∕m2$⁠, and $γNPB∕Si=35.3mJ∕m2$⁠, and $γNPB∕Si=4.0mJ∕Au2$⁠. The spreading coefficients are: $−31.8mJ∕m2$ [Alq3 on indium tin oxide (ITO) coated glass], $−10.2mJ∕m2$ (novolac on aluminum coated glass), $−3.9mJ∕m2$ (NPB on silicon substrate), and $+8.1mJ∕m2$⁠. (NPB on gold coated silicon substrate).