Indium tin oxide (ITO), an important material used as a transparent conductive oxide in thin-film transistor liquid-crystal display fabrication, was patterned by a nonlithographic process. First, a substrate coated with photoresist was patterned by a projection photoablation process using wavelength KrF excimer laser radiation. ITO was then deposited by sputtering and patterned by lift-off. The resulting ITO pattern was clean even though it was patterned without the conventional steps of photoresist development and ITO etching. This process technology provides a faster and more economical patterning capability compared to conventional photolithography and etch processes used in the display industry.
Patterning of indium tin oxide by projection photoablation and lift-off process for fabrication of flat-panel displays
Junghun Chae, Sreeram Appasamy, Kanti Jain; Patterning of indium tin oxide by projection photoablation and lift-off process for fabrication of flat-panel displays. Appl. Phys. Lett. 25 June 2007; 90 (26): 261102. https://doi.org/10.1063/1.2751594
Download citation file: