Lateral quantum dots are formed in the two-dimensional electron gases of a high-mobility SiSiGe heterostructures by means of split Schottky gates. Palladium gates, defined by e-beam lithography and lift-off, show Schottky barriers with very well controlled leakage currents. At low temperatures we observe Coulomb-blockade and stability diamonds on lateral quantum dots containing a total charge of about 25 electrons. The experiments demonstrate that, in contrast to recent reports, Schottky gates are a feasible approach for the fabrication and integration of single electron transistors in the strained SiSiGe heterosystem.

1.
For a review see, e.g.,
F.
Schäffler
,
Semicond. Sci. Technol.
12
,
1515
(
1997
).
2.
Z.
Wilamowski
,
N.
Sandersfeld
,
W.
Jantsch
,
D.
Többen
, and
F.
Schäffler
,
Phys. Rev. Lett.
87
,
026401
(
2001
).
3.
A. M.
Tyryshkin
,
S. A.
Lyon
,
W.
Jantsch
, and
F.
Schäffler
,
Phys. Rev. Lett.
94
,
126802
(
2005
).
4.
B. E.
Kane
,
Nature (London)
393
,
133
(
1998
).
5.
R.
Vrijen
,
E.
Yablonovich
,
K.
Wang
,
H. W.
Jiang
,
A.
Balandin
,
V.
Roychowdhury
,
T.
Mor
, and
D.
DiVicenzo
,
Phys. Rev. A
62
,
012306
(
2000
).
6.
M.
Friesen
,
P.
Rugheimer
,
D. E.
Savage
,
M. G.
Lagally
,
D. W.
van der Weide
,
R.
Joynt
, and
M. A.
Eriksson
,
Phys. Rev. B
67
,
1213010
(
2003
).
7.
M.
Holzmann
, Ph.D. thesis,
Technical University
, Munich,
1996
.
8.
A.
Notargiacomo
,
L.
Di Gaspare
,
G.
Scappucci
,
G.
Mariottini
,
F.
Evangelisti
,
E.
Giovine
, and
R.
Leoni
,
Appl. Phys. Lett.
83
,
302
(
2003
).
9.
L. J.
Klein
,
K. A.
Slinker
,
J. L.
Truitt
,
S.
Goswami
,
K. L. M.
Lewis
,
S. N.
Coppersmith
,
D. W.
van der Weide
,
M.
Friesen
,
R. H.
Blick
,
D. E.
Savage
,
M. G.
Lagally
,
C.
Tahan
,
R.
Joynt
,
M. A.
Eriksson
,
J. O.
Chu
,
J. A.
Ott
, and
P. M.
Mooney
,
Appl. Phys. Lett.
84
,
4047
(
2004
).
10.
M. R.
Sakr
,
H. W.
Jiang
,
E.
Yablonovitch
, and
E. T.
Croke
,
Appl. Phys. Lett.
87
,
223104
(
2005
).
11.
S.
Kanjanachuchai
,
T. J.
Thornton
,
J. M.
Fernandez
, and
H.
Ahmed
,
Semicond. Sci. Technol.
13
,
1215
(
1998
).
12.
K.
Lai
,
W.
Pan
,
D. C.
Tsui
,
S.
Lyon
,
M.
Mühlberger
, and
F.
Schäffler
,
Phys. Rev. Lett.
93
,
156805
(
2004
).
13.
L. L.
Tongson
,
B. E.
Knox
,
T. E.
Sullivan
, and
S. J.
Fonash
,
J. Appl. Phys.
50
,
1535
(
1979
).
14.
J.
Weis
,
R. J.
Haug
,
K. V.
Klitzing
, and
K.
Ploog
,
Phys. Rev. B
46
,
12837
(
1992
);
J.
Weis
,
R. J.
Haug
,
K. V.
Klitzing
, and
K.
Ploog
,
Phys. Rev. Lett.
71
,
4019
(
1993
).
[PubMed]
15.
L.
Kouwenhoven
,
C. M.
Marcus
,
P. L.
Mceuen
,
S.
Tarucha
,
R. M.
Westervelt
, and
N. S.
Wingreen
, in
Mesoscopic Electron Transport
, edited by
L. L.
Sohn
,
L. P.
Kouwenhoven
, and
G.
Schön
,
NATO Advanced Studies Institute, Series E. Applied Science
(
Kluwer
, Dordrecht,
1997
).
16.
S. M.
Sze
,
Physics of Semiconductor Devices
, 2nd ed. (
Wiley
,
New York
,
1981
).
17.
P. N.
Grillot
,
S. A.
Ringel
,
E. A.
Fitzgerald
,
G. P.
Watson
, and
Y. H.
Xie
,
J. Appl. Phys.
77
,
3248
(
1995
).
18.
D.
Monroe
,
Y. H.
Xie
,
E. A.
Fitzgerald
,
P. J.
Silverman
, and
G. P.
Watson
,
J. Vac. Sci. Technol. B
11
,
1731
(
1993
).
19.
E. C.
Lightowlers
,
V.
Higgs
,
M. J.
Gregson
,
G.
Davis
,
S. T.
Davey
,
C. J.
Gibbings
,
C. G.
Tuppen
,
F.
Schäffler
, and
E.
Kasper
,
Thin Solid Films
183
,
235
(
1989
).
20.
X.
Deng
and
M.
Krishnamurthy
,
Phys. Rev. Lett.
81
,
1473
(
1998
).
21.
K.
Lai
,
P. D.
Ye
,
W.
Pan
,
D. C.
Tsui
,
S. A.
Lyon
,
M.
Mühlberger
, and
F.
Schäffler
,
Appl. Phys. Lett.
87
,
142103
(
2005
).
You do not currently have access to this content.