A time-resolved optical emission spectroscopic study identified transient behavior of the excited SiH emission in a parallel plate plasma. The transient behavior could be prevented by filling the background gas with prior to plasma ignition. Applying this condition, state-of-the-art microcrystalline silicon could be deposited irrespective of the applied flow, ultimately demonstrated by a 9.5% efficient solar cell deposited from pure . The results are discussed in terms of back diffusion: an initial diffusion flux of from the reactor’s dead volume back into the plasma.
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