We have grown thin films on and using liquid delivery metalorganic chemical vapor deposition. Epitaxial films were successfully prepared through the systematic control of the chemical reaction and deposition process. We found that the film composition and phase equilibrium are sensitive to the Bi:Fe ratio in the precursor. Fe-rich mixtures show the existence of , while Bi-rich mixtures show the presence of as a second phase at the surface. In the optimized films, we were able to obtain an epitaxial single perovskite phase thin film. Electrical measurements using both quasistatic hysteresis and pulsed polarization measurements confirm the existence of ferroelectricity with a switched polarization of , . Out-of plane piezoelectric measurements using an atomic force microscope yield a value of .
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5 September 2005
Research Article|
August 30 2005
Metalorganic chemical vapor deposition of lead-free ferroelectric films for memory applications
S. Y. Yang;
S. Y. Yang
a)
Department of Materials Science and Engineering,
University of Maryland
, College Park, Maryland 20742
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F. Zavaliche;
F. Zavaliche
Department of Materials Science and Engineering,
University of Maryland
, College Park, Maryland 20742
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L. Mohaddes-Ardabili;
L. Mohaddes-Ardabili
Department of Materials Science and Engineering,
University of Maryland
, College Park, Maryland 20742
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V. Vaithyanathan;
V. Vaithyanathan
Department of Materials Science and Engineering,
Pennsylvania State University
, University Park, Pennsylvania 16802
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D. G. Schlom;
D. G. Schlom
Department of Materials Science and Engineering,
Pennsylvania State University
, University Park, Pennsylvania 16802
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Y. J. Lee;
Y. J. Lee
Department of Materials Science and Engineering and Department of Physics,
University of California
, Berkeley, California 94720
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Y. H. Chu;
Y. H. Chu
Department of Materials Science and Engineering and Department of Physics,
University of California
, Berkeley, California 94720
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M. P. Cruz;
M. P. Cruz
b)
Department of Materials Science and Engineering and Department of Physics,
University of California
, Berkeley, California 94720
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Q. Zhan;
Q. Zhan
Department of Materials Science and Engineering and Department of Physics,
University of California
, Berkeley, California 94720
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T. Zhao;
T. Zhao
Department of Materials Science and Engineering and Department of Physics,
University of California
, Berkeley, California 94720
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R. Ramesh
R. Ramesh
Department of Materials Science and Engineering and Department of Physics,
University of California
, Berkeley, California 94720
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a)
Electronic mail: [email protected]
b)
Also at: Centro de Ciencias de la Materia Condensada (CCMC)-UNAM. Km. 107 Carretera Tijuana-Ensenada. Ensenada, B.C., Mexico, Codigo Postal 22800.
Appl. Phys. Lett. 87, 102903 (2005)
Article history
Received:
April 25 2005
Accepted:
July 18 2005
Citation
S. Y. Yang, F. Zavaliche, L. Mohaddes-Ardabili, V. Vaithyanathan, D. G. Schlom, Y. J. Lee, Y. H. Chu, M. P. Cruz, Q. Zhan, T. Zhao, R. Ramesh; Metalorganic chemical vapor deposition of lead-free ferroelectric films for memory applications. Appl. Phys. Lett. 5 September 2005; 87 (10): 102903. https://doi.org/10.1063/1.2041830
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