Photolithographic masks are key components in the fabrication process of patterned substrates for various applications. Different patterns generally require different photomasks, whose total cost is high for the multilevel fabrication of three-dimensional microstructures. We developed a photomask that combines two imaging elements—microlens arrays and clear windows—in one structure. Such structures can be produced using multibeam interference lithography. We demonstrate their application as multipattern photomasks; that is, by using the same photomask and simply adjusting (i) the illumination dose, (ii) the distance between the mask and the photoresist film, and (iii) the tone of photoresist, we are able to create a variety of different microscale patterns with controlled sizes, geometries, and symmetries that originate from the lenses, clear windows, or their combination. The experimental results agree well with the light field calculations.
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16 May 2005
Research Article|
May 13 2005
Microlens arrays with integrated pores as a multipattern photomask
Shu Yang;
Shu Yang
a)
Department of Materials Science and Engineering,
University of Pennsylvania
, 3231 Walnut Street, Philadelphia, Pennsylvania 19104
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Chaitanya K. Ullal;
Chaitanya K. Ullal
Department of Materials Science and Engineering,
Massachusetts Institute of Technology
, 77 Massachusetts Avenue, Cambridge, Massachusetts 02139
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Edwin L. Thomas;
Edwin L. Thomas
Department of Materials Science and Engineering,
Massachusetts Institute of Technology
, 77 Massachusetts Avenue, Cambridge, Massachusetts 02139
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Gang Chen;
Gang Chen
Bell Laboratories,
Lucent Technologies
, 600 Mountain Avenue, Murray Hill, New Jersey 07974
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Joanna Aizenberg
Joanna Aizenberg
b)
Bell Laboratories,
Lucent Technologies
, 600 Mountain Avenue, Murray Hill, New Jersey 07974
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Appl. Phys. Lett. 86, 201121 (2005)
Article history
Received:
January 17 2005
Accepted:
March 28 2005
Citation
Shu Yang, Chaitanya K. Ullal, Edwin L. Thomas, Gang Chen, Joanna Aizenberg; Microlens arrays with integrated pores as a multipattern photomask. Appl. Phys. Lett. 16 May 2005; 86 (20): 201121. https://doi.org/10.1063/1.1926405
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