Position- and size-controlled fabrication of iron silicide nanorods by electron-beam-induced deposition using an ultrahigh-vacuum transmission electron microscope

We have fabricated arrays of nanorods of cubic iron silicide from iron pentacarbonyl gas source on Si(111) substrates by electron-beam-induced deposition at elevated temperature in an ultrahigh-vacuum transmission electron microscope. The nanorods are aligned along one of the $Si⟨110⟩$ directions. Their length could be controlled by changing the irradiation time. It was revealed that the vicinity of the substrate surface influences the growth direction and location of the nanorods.