The influence of a postannealing procedure on the transport properties of magnetic tunnel junctions with ion-bombardment-manipulated exchange bias is investigated. The controlled manipulation of the direction of the exchange bias field in magnetic tunnel junctions by He ion bombardment usually is accompanied by a reduction of the tunneling magnetoresistance and an increase in the resistance. Here, we demonstrate that it is possible to reduce these negative effects of the ion bombardment considerably by postannealing without a magnetic field. For optimized combinations of ion dose and postannealing temperature, the tunneling magnetoresistance recovers completely ( resistance change) while the exchange bias direction set by the ion bombardement is preserved.
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11 April 2005
Research Article|
April 04 2005
Postannealing of magnetic tunnel junctions with ion-bombardment-modified exchange bias Available to Purchase
V. Höink;
V. Höink
a)
Department of Physics, Nano Device Group,
University of Bielefeld
, P.O. Box 100131, 33501 Bielefeld, Germany
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M. D. Sacher;
M. D. Sacher
Department of Physics, Nano Device Group,
University of Bielefeld
, P.O. Box 100131, 33501 Bielefeld, Germany
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J. Schmalhorst;
J. Schmalhorst
Department of Physics, Nano Device Group,
University of Bielefeld
, P.O. Box 100131, 33501 Bielefeld, Germany
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G. Reiss;
G. Reiss
Department of Physics, Nano Device Group,
University of Bielefeld
, P.O. Box 100131, 33501 Bielefeld, Germany
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D. Engel;
D. Engel
Department of Physics,
Kaiserslautern University of Technology
, Erwin-Schrödinger-Str., 67663 Kaiserslautern, Germany
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D. Junk;
D. Junk
Department of Physics,
Kaiserslautern University of Technology
, Erwin-Schrödinger-Str., 67663 Kaiserslautern, Germany
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A. Ehresmann
A. Ehresmann
Department of Physics,
Kaiserslautern University of Technology
, Erwin-Schrödinger-Str., 67663 Kaiserslautern, Germany
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V. Höink
a)
Department of Physics, Nano Device Group,
University of Bielefeld
, P.O. Box 100131, 33501 Bielefeld, Germany
M. D. Sacher
Department of Physics, Nano Device Group,
University of Bielefeld
, P.O. Box 100131, 33501 Bielefeld, Germany
J. Schmalhorst
Department of Physics, Nano Device Group,
University of Bielefeld
, P.O. Box 100131, 33501 Bielefeld, Germany
G. Reiss
Department of Physics, Nano Device Group,
University of Bielefeld
, P.O. Box 100131, 33501 Bielefeld, Germany
D. Engel
Department of Physics,
Kaiserslautern University of Technology
, Erwin-Schrödinger-Str., 67663 Kaiserslautern, Germany
D. Junk
Department of Physics,
Kaiserslautern University of Technology
, Erwin-Schrödinger-Str., 67663 Kaiserslautern, Germany
A. Ehresmann
Department of Physics,
Kaiserslautern University of Technology
, Erwin-Schrödinger-Str., 67663 Kaiserslautern, Germanya)
Electronic mail: [email protected]
Appl. Phys. Lett. 86, 152102 (2005)
Article history
Received:
December 06 2004
Accepted:
February 25 2005
Citation
V. Höink, M. D. Sacher, J. Schmalhorst, G. Reiss, D. Engel, D. Junk, A. Ehresmann; Postannealing of magnetic tunnel junctions with ion-bombardment-modified exchange bias. Appl. Phys. Lett. 11 April 2005; 86 (15): 152102. https://doi.org/10.1063/1.1899771
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