The leakage current response of high-permittivity columnar-grown thin films has been studied at elevated temperatures under dc load. We observe a thermally activated current prior to the onset of the resistance degradation with an activation energy of . A point defect model is applied to calculate the migration of electronic and ionic defects under the dc field as well as the current response of the system. We find that the peak in current is not caused by a space-charge-limited transient of oxygen vacancies, but related to a modulation of the electronic conductivity upon oxygen vacancy redistribution. Furthermore, we show that after the redistribution of electronic and ionic defects, no further increase in conductivity takes place in the simulation.
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14 March 2005
Research Article|
March 07 2005
Oxygen vacancy migration and time-dependent leakage current behavior of thin films
R. Meyer;
R. Meyer
a)
Institut für Werkstoffe der Elektrotechnik
, RWTH Aachen, 52056 Aachen, Germany
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R. Liedtke;
R. Liedtke
Institut für Werkstoffe der Elektrotechnik
, RWTH Aachen, 52056 Aachen, Germany
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R. Waser
R. Waser
Institut für Werkstoffe der Elektrotechnik
, RWTH Aachen, 52056 Aachen, Germany
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a)
Electronic mail: [email protected]
Appl. Phys. Lett. 86, 112904 (2005)
Article history
Received:
September 13 2004
Accepted:
January 11 2005
Citation
R. Meyer, R. Liedtke, R. Waser; Oxygen vacancy migration and time-dependent leakage current behavior of thin films. Appl. Phys. Lett. 14 March 2005; 86 (11): 112904. https://doi.org/10.1063/1.1874313
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