We have studied stress relaxation mechanisms in epitaxial films grown on substrates with buffer layers. A theoretical analysis has been undertaken to understand the variation of the lattice parameters of epitaxial films, taking into account stress relaxation due to the formation of an orthorhombic polydomain structure in the buffer layer as well as the formation of misfit dislocations at the and the interfaces. There exists a critical buffer layer thickness, above which the buffer layer can “screen” the effect of the substrate. It is shown that the internal stress level in films can be controlled using buffer layers that exhibit a structural phase transformation.
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