The relationship between the structure and mechanical properties of sputter-deposited boron carbide films was investigated. Changes in the structure induced by annealing were characterized in terms of chemical composition, chemical bonding, and concentrations of defects and trapped impurities. The creation of intericosahedral chains for higher annealing temperatures was revealed by infrared and Raman measurements, and the intensity of the infrared band at 1500 cm−1 was found to be related to the hardness. The presence of residual trapped Ar atoms and of open-volume defects is insensitive to relatively high annealing temperatures and does not influence the recovery of the hardness. Our results suggest postdeposition annealing as a pathway to enhance the mechanical properties of boron carbide films.
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24 May 2004
Research Article|
May 24 2004
Role of intericosahedral chains on the hardness of sputtered boron carbide films
L. G. Jacobsohn;
L. G. Jacobsohn
Materials Science and Technology Division, Los Alamos National Laboratory, Los Alamos, New Mexico 87545
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R. D. Averitt;
R. D. Averitt
Materials Science and Technology Division, Los Alamos National Laboratory, Los Alamos, New Mexico 87545
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C. J. Wetteland;
C. J. Wetteland
Materials Science and Technology Division, Los Alamos National Laboratory, Los Alamos, New Mexico 87545
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R. K. Schulze;
R. K. Schulze
Materials Science and Technology Division, Los Alamos National Laboratory, Los Alamos, New Mexico 87545
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M. Nastasi;
M. Nastasi
Materials Science and Technology Division, Los Alamos National Laboratory, Los Alamos, New Mexico 87545
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L. L. Daemen;
L. L. Daemen
Manuel Lujan Jr. Neutron Scattering Center, Los Alamos National Laboratory, Los Alamos, New Mexico 87545
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Z. Jenei;
Z. Jenei
Lawrence Livermore National Laboratory, Livermore, California 94550
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P. Asoka-Kumar
P. Asoka-Kumar
Lawrence Livermore National Laboratory, Livermore, California 94550
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Appl. Phys. Lett. 84, 4173–4175 (2004)
Article history
Received:
January 19 2004
Accepted:
March 30 2004
Citation
L. G. Jacobsohn, R. D. Averitt, C. J. Wetteland, R. K. Schulze, M. Nastasi, L. L. Daemen, Z. Jenei, P. Asoka-Kumar; Role of intericosahedral chains on the hardness of sputtered boron carbide films. Appl. Phys. Lett. 24 May 2004; 84 (21): 4173–4175. https://doi.org/10.1063/1.1755841
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