Epitaxial thin films of were deposited on single-crystal substrates of (100)-oriented by pulsed-laser deposition. Structural analysis by x-ray diffraction, electron diffraction, and transmission electron microscopy (TEM) indicated that the films were monoclinic and twinned with two dominant orientation relationships. The first is and the second is and High-resolution TEM images revealed that there is no reaction or appreciable interdiffusion at the substrate/film interface, despite the high temperature of the substrate during deposition (∼1000 K). Magnetic characterization was carried out (both magnetization versus temperature and hysteresis loops) and the results agree with previous reports of a ferromagnetic transition with ∼105 K. The actual value of in the films is a few degrees lower than the bulk material, the discrepancy being attributed to strain, nonstoichiometry, or size effects.
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5 January 2004
Research Article|
January 05 2004
Epitaxial growth and properties of metastable thin films
António F. Moreira dos Santos;
António F. Moreira dos Santos
Materials Research Laboratory, University of California Santa Barbara, Santa Barbara, California 93106
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Anthony K. Cheetham;
Anthony K. Cheetham
Materials Research Laboratory, University of California Santa Barbara, Santa Barbara, California 93106
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Wei Tian;
Wei Tian
Department of Materials Science and Engineering, University of Michigan, Ann Arbor, Michigan 48109-2136
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Xiaoqing Pan;
Xiaoqing Pan
Department of Materials Science and Engineering, University of Michigan, Ann Arbor, Michigan 48109-2136
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Yunfa Jia;
Yunfa Jia
Department of Materials Science and Engineering, Pennsylvania State University, University Park, Pennsylvania, 16802-5005
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Nathan J. Murphy;
Nathan J. Murphy
Department of Materials Science and Engineering, Pennsylvania State University, University Park, Pennsylvania, 16802-5005
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James Lettieri;
James Lettieri
Department of Materials Science and Engineering, Pennsylvania State University, University Park, Pennsylvania, 16802-5005
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Darrell G. Schlom
Darrell G. Schlom
Department of Materials Science and Engineering, Pennsylvania State University, University Park, Pennsylvania, 16802-5005
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Appl. Phys. Lett. 84, 91–93 (2004)
Article history
Received:
August 22 2003
Accepted:
October 30 2003
Citation
António F. Moreira dos Santos, Anthony K. Cheetham, Wei Tian, Xiaoqing Pan, Yunfa Jia, Nathan J. Murphy, James Lettieri, Darrell G. Schlom; Epitaxial growth and properties of metastable thin films. Appl. Phys. Lett. 5 January 2004; 84 (1): 91–93. https://doi.org/10.1063/1.1636265
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