Separation by IMplantation of OXygen (SIMOX) based process has been developed to sculpt three-dimensionally integrated nano-optical waveguiding structures in silicon. An approach, based on the implantation of oxygen ions into a silicon substrate, patterned with thermal oxide, has been adopted to synthesize low loss buried rib waveguides in a single implantation step of thickness 286 nm and widths varying from 2 μm to 12 μm. These waveguides show propagation losses in the range of 3–4 dB/cm. The capability of the process to sculpt three-dimensional (3-D) structures has also been demonstrated by defining rib waveguides on the top silicon layer.
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