We report on the fabrication and characterization of single-crystal organic -type field-effect transistors (OFETs) with the field-effect mobility substantially higher than that observed in thin-film OFETs. The single-crystal devices compare favorably with thin-film OFETs not only in this respect: the mobility for the single-crystal devices is nearly independent of the gate voltage and the field effect onset is very sharp. The subthreshold slope as small as V/decade has been observed for a gate insulator capacitance This corresponds to the intrinsic subthreshold slope at least one order of magnitude smaller than that for the best thin-film OFETs and amorphous hydrogenated silicon (α-Si:H) devices.
REFERENCES
1.
H. E. Katz, A. Dodabalapur, and Z. Bao, in Oligo- and Polythiophene-Based Field-Effect Transistors, edited by D. Fichou (Wiley, Weinheim, 1998);
C. D.
Dimitracopoulos
and P. R. L.
Malenfant
, Adv. Mater. (Weinheim, Ger.)
14
, 99
(2002
).2.
S. F.
Nelson
, Y.-Y.
Lin
, D. J.
Gundlach
, and T. N.
Jackson
, Appl. Phys. Lett.
72
, 1854
(1998
);Y.-Y.
Lin
, D. J.
Gundlach
, S. F.
Nelson
, and T. N.
Jackson
, IEEE Electron Device Lett.
18
, 606
(1997
).3.
J.
Kanicki
, F. R.
Libsch
, J.
Griffith
, and R.
Polastre
, J. Appl. Phys.
69
, 2339
(1991
).4.
5.
C. D.
Dimitracopoulos
, S.
Purushothaman
, J.
Kymissis
, A.
Callegari
, and J. M.
Shaw
, Science
283
, 822
(1999
).6.
G.
Horowitz
, M. E.
Hajlaoui
, and R.
Hajlaoui
, J. Appl. Phys.
87
, 4456
(2000
).7.
Y.-Y.
Lin
, D. J.
Gundlach
, S. F.
Nelson
, and T. N.
Jackson
, IEEE Trans. Electron Devices
44
, 1325
(1997
);H.
Klauk
, D. J.
Gundlach
, J. A.
Nichols
, and T. N.
Jackson
, IEEE Trans. Electron Devices
46
, 1258
(1999
).8.
V.
Podzorov
, V. M.
Pudalov
, and M. E.
Gershenson
, Appl. Phys. Lett.
82
, 1739
(2003
).9.
Ch.
Kloc
, P. G.
Simpkins
, T.
Siegrist
, and R. A.
Laudise
, J. Cryst. Growth
182
, 416
(1997
).10.
R. A. Laudise, The Growth of Single Crystals (Prentice-Hall, Englewood Cliffs, NJ, 1970).
11.
K. C. Kao and W. Hwang, Electrical Transport in Solids (Pergamon, Oxford, 1981).
12.
Since the studied devices are -type FETs, we reserve the term “source” for an electrode that is biased positively and injects holes, while the grounded electrode is called the “drain.”
13.
The threshold voltage is defined as the limit of when →0.
14.
The total number of the “bulk” charge traps per the unit area of the conducting channel can be estimated as where is the bulk concentration of traps, and is the effective channel thickness (⩽10 nm). The corresponding threshold voltage, associated with the bulk traps in the studied devices, is therefore very small (<0.1 V).
15.
C. D.
Dimitracopoulos
, I.
Kymissis
, S.
Purushothaman
, D. A.
Neumayer
, P. R.
Duncombe
, and R. B.
Laibowitz
, Adv. Mater. (Weinheim, Ger.)
11
, 1372
(1999
).16.
S. M. Sze, Physics of Semiconductor Devices (Wiley, New York, 1981).
17.
P. V.
Necliudov
, M. S.
Shur
, D. J.
Gundlach
, and T. N.
Jackson
, Solid-State Electron.
47
, 259
(2003
);J.
Zaumseil
, K. W.
Baldwin
, and J. A.
Rogers
, J. Appl. Phys.
93
, 6117
(2003
).18.
The four-probe mobility is defined as where and are the distance and the voltage drop between the voltage probes, respectively. is measured by an electrometer with an input resistance Ω. The contact resistance has been determined as
This content is only available via PDF.
© 2003 American Institute of Physics.
2003
American Institute of Physics
You do not currently have access to this content.