A ferroelectric field-effect transistor with a solid-solution channel layer and a lead zirconate titanate gate oxide has been fabricated. The remnant polarization of the ferroelectric yields two states at 0 V, which produce a relative change in channel resistance of 75% and a coercivity of 3 V. The channel has sufficient off-state free carrier concentration to provide sufficient balancing charge for ferroelectric stability. The device was subjected to more than read-write cycles with no degradation. This nonvolatile device offers the possibility of a nondestructive, current sense memory cell with good retention properties.
REFERENCES
1.
2.
3.
4.
T. A.
Rost
, H.
Lin
, and T. A.
Rabson
, Appl. Phys. Lett.
59
, 3654
(1991
);Y.
Fujimori
, N.
Izumi
, T.
Nakamura
, and A.
Kamisawa
, Integr. Ferroelectr.
21
, 73
(1998
);Y.
Fujimori
, N.
Izumi
, T.
Nakamura
, and A.
Kamisawa
, Jpn. J. Appl. Phys., Part 1
37
, 5207
(1998
).5.
M. W. J.
Prins
, K.-O
Grosse-Holz
, G.
Müeller
, J. F. M.
Cillessen
, J. B.
Giesbers
, R. P.
Weening
, and R. M.
Wolf
, Appl. Phys. Lett.
68
, 3650
(1996
);M. W. J.
Prins
, S. E.
Zinnemers
, J. F. M.
Cillessen
, and J. B.
Giesbers
, Appl. Phys. Lett.
70
, 458
(1997
);S.
Mathews
, R.
Ramesh
, T.
Venkatesan
, and J.
Benedetto
, Science
276
, 238
(1997
).6.
M.
Okuyama
, H.
Sugiyama
, T.
Nakaiso
, and M.
Noda
, Integr. Ferroelectr.
34
, 37
(2001
).7.
8.
C. B.
Eom
, R. J.
Cava
, R. M.
Fleming
, J. M.
Phillips
, R. B.
van Dover
, J. H.
Marshall
, J. W. P.
Hsu
, J. J.
Krajewski
, and W. F.
Peck
,Jr. , Science
258
, 1766
(1992
);C. B.
Eom
, R. A.
Rao
, Q.
Gan
, K.
Wasa
, and D. J.
Werder
, Integr. Ferroelectr.
21
, 251
(1998
).9.
C. H.
Ahn
, R. H.
Hammond
, T. H.
Geballe
, M. R.
Beasley
, J. M.
Triscone
, M.
Decroux
, O.
Fisher
, A.
Antognazza
, and K.
Char
, Appl. Phys. Lett.
70
, 206
(1997
).10.
Z.
Sefrioui
, D.
Arias
, M. A.
Navacerrada
, M.
Varela
, G.
Loos
, M.
Lucia
, J.
Santamaria
, F.
Sanchez-Quesada
, and M. A.
Lopez de la Torre
, Appl. Phys. Lett.
73
, 3375
(1998
).11.
R. F.
Bianchi
, J. A. G.
Carrio
, S. L.
Cuffini
, Y. P.
Mascarenhas
, and R. M.
Faria
, Phys. Rev. B
62
, 10785
(2000
).12.
T.
Shimizu
and T.
Kawakubo
, Jpn. J. Appl. Phys., Part 2
40
, L117
(2001
).13.
J. A.
Misewich
and A. G.
Schrott
, Appl. Phys. Lett.
76
, 3632
(2000
);A. G.
Schrott
, J. A.
Misewich
, M.
Copel
, D. W.
Abraham
, and D. A.
Neumayer
, Mater. Res. Soc. Symp. Proc.
623
, 25
(2000
).14.
L.
Mieville
, T. H.
Geballe
, L.
Antognazza
, and K.
Char
, Appl. Phys. Lett.
70
, 126
(1997
).15.
G. K. Wehner in Methods of Surface Analysis, edited by A. W. Czanderna (Elsevier, New York, 1975), p. 7.
16.
S.
Tehrani
, B.
Engel
, J. M.
Slaughter
, E.
Chen
, M.
DeHerrera
, M.
Durlam
, P.
Naji
, R.
Whig
, J.
Janesky
, and J.
Calder
, IEEE Trans. Magn.
36
, 2752
(2000
).17.
C. S.
Ganpule
, A
Stanishevsky
, Q.
Su
, S.
Aggarwal
, J.
Meingailis
, E.
Williams
, and R.
Ramesh
, Appl. Phys. Lett.
75
, 409
(1999
);C. S.
Ganpule
, A
Stanishevsky
, S.
Aggarwal
, J.
Meingailis
, E.
Williams
, R.
Ramesh
, V.
Joshi
, and Carlos
Paz de Araujo
, Appl. Phys. Lett.
75
, 3874
(1999
).
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