A ferroelectric field-effect transistor with a SrRuxTi1−xO3 solid-solution channel layer and a lead zirconate titanate gate oxide has been fabricated. The remnant polarization of the ferroelectric yields two states at 0 V, which produce a relative change in channel resistance (ΔR/R) of 75% and a coercivity of 3 V. The channel has sufficient off-state free carrier concentration to provide sufficient balancing charge for ferroelectric stability. The device was subjected to more than 1010 read-write cycles with no degradation. This nonvolatile device offers the possibility of a nondestructive, current sense memory cell with good retention properties.

1.
H.
Takasu
,
J. Electroceram.
4:2/3
,
327
(
2000
).
2.
J. F.
Scott
,
IEICE Trans. Electron.
E81
,
477
(
1998
).
3.
H.
Toyoshima
and
H.
Kobatake
,
NEC Res. Dev.
40
,
206
(
1999
).
4.
T. A.
Rost
,
H.
Lin
, and
T. A.
Rabson
,
Appl. Phys. Lett.
59
,
3654
(
1991
);
Y.
Fujimori
,
N.
Izumi
,
T.
Nakamura
, and
A.
Kamisawa
,
Integr. Ferroelectr.
21
,
73
(
1998
);
Y.
Fujimori
,
N.
Izumi
,
T.
Nakamura
, and
A.
Kamisawa
,
Jpn. J. Appl. Phys., Part 1
37
,
5207
(
1998
).
5.
Y.
Watanabe
,
Appl. Phys. Lett.
66
,
1770
(
1995
);
M. W. J.
Prins
,
K.-O
Grosse-Holz
,
G.
Müeller
,
J. F. M.
Cillessen
,
J. B.
Giesbers
,
R. P.
Weening
, and
R. M.
Wolf
,
Appl. Phys. Lett.
68
,
3650
(
1996
);
M. W. J.
Prins
,
S. E.
Zinnemers
,
J. F. M.
Cillessen
, and
J. B.
Giesbers
,
Appl. Phys. Lett.
70
,
458
(
1997
);
S.
Mathews
,
R.
Ramesh
,
T.
Venkatesan
, and
J.
Benedetto
,
Science
276
,
238
(
1997
).
6.
P.
Wurfel
and
I. P.
Batra
,
Phys. Rev. B
8
,
5126
(
1973
);
M.
Okuyama
,
H.
Sugiyama
,
T.
Nakaiso
, and
M.
Noda
,
Integr. Ferroelectr.
34
,
37
(
2001
).
7.
D. J.
Singh
,
J. Appl. Phys.
79
,
4818
(
1996
).
8.
C. B.
Eom
,
R. J.
Cava
,
R. M.
Fleming
,
J. M.
Phillips
,
R. B.
van Dover
,
J. H.
Marshall
,
J. W. P.
Hsu
,
J. J.
Krajewski
, and
W. F.
Peck
,Jr.
,
Science
258
,
1766
(
1992
);
C. B.
Eom
,
R. A.
Rao
,
Q.
Gan
,
K.
Wasa
, and
D. J.
Werder
,
Integr. Ferroelectr.
21
,
251
(
1998
).
9.
C. H.
Ahn
,
R. H.
Hammond
,
T. H.
Geballe
,
M. R.
Beasley
,
J. M.
Triscone
,
M.
Decroux
,
O.
Fisher
,
A.
Antognazza
, and
K.
Char
,
Appl. Phys. Lett.
70
,
206
(
1997
).
10.
Z.
Sefrioui
,
D.
Arias
,
M. A.
Navacerrada
,
M.
Varela
,
G.
Loos
,
M.
Lucia
,
J.
Santamaria
,
F.
Sanchez-Quesada
, and
M. A.
Lopez de la Torre
,
Appl. Phys. Lett.
73
,
3375
(
1998
).
11.
R. F.
Bianchi
,
J. A. G.
Carrio
,
S. L.
Cuffini
,
Y. P.
Mascarenhas
, and
R. M.
Faria
,
Phys. Rev. B
62
,
10785
(
2000
).
12.
T.
Shimizu
and
T.
Kawakubo
,
Jpn. J. Appl. Phys., Part 2
40
,
L117
(
2001
).
13.
J. A.
Misewich
and
A. G.
Schrott
,
Appl. Phys. Lett.
76
,
3632
(
2000
);
A. G.
Schrott
,
J. A.
Misewich
,
M.
Copel
,
D. W.
Abraham
, and
D. A.
Neumayer
,
Mater. Res. Soc. Symp. Proc.
623
,
25
(
2000
).
14.
L.
Mieville
,
T. H.
Geballe
,
L.
Antognazza
, and
K.
Char
,
Appl. Phys. Lett.
70
,
126
(
1997
).
15.
G. K. Wehner in Methods of Surface Analysis, edited by A. W. Czanderna (Elsevier, New York, 1975), p. 7.
16.
S.
Tehrani
,
B.
Engel
,
J. M.
Slaughter
,
E.
Chen
,
M.
DeHerrera
,
M.
Durlam
,
P.
Naji
,
R.
Whig
,
J.
Janesky
, and
J.
Calder
,
IEEE Trans. Magn.
36
,
2752
(
2000
).
17.
C. S.
Ganpule
,
A
Stanishevsky
,
Q.
Su
,
S.
Aggarwal
,
J.
Meingailis
,
E.
Williams
, and
R.
Ramesh
,
Appl. Phys. Lett.
75
,
409
(
1999
);
C. S.
Ganpule
,
A
Stanishevsky
,
S.
Aggarwal
,
J.
Meingailis
,
E.
Williams
,
R.
Ramesh
,
V.
Joshi
, and
Carlos
Paz de Araujo
,
Appl. Phys. Lett.
75
,
3874
(
1999
).
This content is only available via PDF.
You do not currently have access to this content.