A stress-induced double-donor conductivity model is proposed to investigate the temperature dependence of time-to-breakdown in ultrathin gate oxides. The permittivity-to-breakdown is defined as the product of conductivity and time-to-breakdown. The breakdown of oxides occurs when the permittivity-to-breakdown reaches a critical value. This model shows that the overall temperature dependence of time-to-breakdown can be described in terms of the extended Arrhenius law. In this case, there exist three temperature regions with different activation energies, where Arrhenius behavior still holds in each region.

1.
J. W.
McPherson
,
V. K.
Reddy
, and
H. C.
Mogul
,
Appl. Phys. Lett.
71
,
1101
(
1997
).
2.
A.
Yassine
,
H. E.
Nariman
, and
K.
Olasupo
,
IEEE Electron Device Lett.
20
,
390
(
1999
).
3.
J. S. Suehle, E. M. Vogel, B. Wang, and J. B. Bernstein, International Reliability Physics Proceedings (IEEE Piscataway, NJ, 2000), p. 33.
4.
C. F.
Chen
,
C. Y.
Wu
,
M. K.
Lee
, and
C. N.
Chen
,
IEEE Trans. Electron Devices
34
,
1540
(
1987
).
5.
D. J.
DiMaria
and
J. H.
Stathis
,
Appl. Phys. Lett.
74
,
1752
(
1999
).
6.
H.
Satake
,
N.
Yasuda
,
S. I.
Takagi
, and
A.
Toriumi
,
Appl. Phys. Lett.
69
,
1128
(
1996
).
7.
K.
Eriguchi
and
M.
Niwa
,
Appl. Phys. Lett.
73
,
1985
(
1998
).
8.
E.
Cartier
,
Microelectron. Reliab.
38
,
201
(
1998
).
9.
M.
Rasras
,
I.
Dewoff
,
G.
Groeseneken
,
B.
Kaczer
,
R.
Degraeve
, and
H. E.
Maes
,
IEEE Trans. Electron Devices
48
,
231
(
2001
).
10.
D. R. Wolters and A. T. A. Z. V. Duynhoven, Proceedings of a Symposium on the Physics and Technology of AmorphousSiO2 1987, p. 391.
11.
J. D. Bude, Tech. Dig. VLSI Symp. , 101 (1995).
12.
R. J.
Bell
and
P.
Dean
,
Philos. Mag.
25
,
1381
(
1972
).
13.
A. G. Revesz and G. V. Gibbs, in The Physics of MOS Insulators, edited by G. Lucovsky, S. T. Pantelides, and F. L. Galeener (Pergamon, New York, 1980), p. 92.
14.
F. L.
Galeener
,
J. Non-Cryst. Solids
49
,
53
(
1982
).
15.
F. L.
Galeener
,
R. A.
Barrio
,
E.
Martinez
, and
R. J.
Elliott
,
Phys. Rev. Lett.
53
,
2429
(
1984
).
16.
W. A. Harrison, Electronic Structure and the Properties of Solids (Freeman, San Francisco, 1980), Chap. 11.
17.
S. T.
Pantelides
and
W. A.
Harrison
,
Phys. Rev. B
13
,
2667
(
1976
).
18.
M. Z.
Xu
,
C. H.
Tan
, and
L. F.
Mao
,
Solid State Commun.
117
,
365
(
2001
).
19.
E. M.
Conwell
,
Phys. Rev.
103
,
51
(
1956
).
20.
R. Degraeve, G. Groeseneken, R. Bellens, M. Depas, and H. E. Maes, Tech. Dig. - Int. Electron Devices Meet. , 863 (1995).
21.
N. F.
Mott
and
W. D.
Twose
,
Adv. Phys.
10
,
107
(
1961
).
22.
C. S.
Hung
and
J. R.
Gliessman
,
Phys. Rev.
96
,
1226
(
1954
).
23.
N. F. Mott and R. W. Gurner, Electronic Processes in Ionic Crystals (Oxford University Press, London 1940), Chap. 2.
24.
R. C.
Hughes
,
Solid-State Electron.
21
,
251
(
1978
).
This content is only available via PDF.
You do not currently have access to this content.