The spectra of the isotropic and anisotropic contributions to second-harmonic generation from modified Si(001) surfaces are separated using polarization selection and rotational anisotropy. A bulk anisotropic resonance is observed at a two-photon energy of 3.42±0.01 eV. The isotropic surface contributions for native oxide Si and thermal oxide Si show peaks at 3.39±0.01 eV and 3.35±0.01 eV, respectively. Interference between these contributions and the bulk signal can shift the apparent resonance position if they are not separated. The surface produces a noninterfering contribution that is comparable to the interfering contribution for H-terminated Si but negligible for oxidized silicon.

1.
G.
Lüpke
,
Surf. Sci. Rep.
35
,
77
(
1999
);
Y. R.
Shen
,
Surf. Sci.
300
,
551
(
1994
).
2.
H. W. K.
Tom
,
T. F.
Heinz
, and
Y. R.
Shen
,
Phys. Rev. Lett.
51
,
1983
(
1983
).
3.
G.
Lüpke
,
D. J.
Bottomley
, and
H. M.
van Driel
,
Phys. Rev. B
47
,
10389
(
1993
).
4.
S. T.
Cundiff
,
W. H.
Knox
,
F. H.
Baumann
,
K. W.
Evans-Lutterodt
, and
M. L.
Green
,
J. Vac. Sci. Technol. A
16
,
1730
(
1998
).
5.
S. T.
Cundiff
,
W. H.
Knox
,
F. H.
Baumann
,
K. W.
EvansLutterodt
,
M. T.
Tang
,
M. L.
Green
, and
H. M.
van Driel
,
Appl. Phys. Lett.
70
,
1414
(
1997
);
J. I.
Dadap
,
B.
Doris
,
Q.
Deng
,
M. C.
Downer
,
J. K.
Lowell
, and
A. C.
Diebold
,
Appl. Phys. Lett.
64
,
2139
(
1994
).
6.
W.
Daum
,
H. J.
Krause
,
U.
Reichel
, and
H.
Ibach
,
Phys. Rev. Lett.
71
,
1234
(
1993
).
7.
G.
Erley
and
W.
Daum
,
Phys. Rev. B
58
,
R1734
(
1998
).
8.
J. I.
Dadap
,
Z.
Xu
,
X. F.
Hu
,
M. C.
Downer
,
N. M.
Russell
,
J. G.
Ekerdt
, and
O. A.
Aktsipetrov
,
Phys. Rev. B
56
,
13367
(
1997
).
9.
J. E.
Sipe
,
V.
Mizrahi
, and
G. I.
Stegeman
,
Phys. Rev. B
35
,
9091
(
1987
).
10.
J.
Chen
,
S.
Machida
, and
Y.
Yamamoto
,
Opt. Lett.
23
,
676
(
1998
).
11.
J. E.
Sipe
,
D. J.
Moss
, and
H. M.
van Driel
,
Phys. Rev. B
35
,
1129
(
1987
).
12.
J.
Bloch
,
J. G.
Mihaychuk
, and
H. M.
van Driel
,
Phys. Rev. Lett.
77
,
920
(
1996
).
13.
D. E. Aspnes, in Properties of Crystalline Silicon, edited by R. Hull (IEE, London, 1999), pp. 677–696.
14.
A.
Daunois
and
D. E.
Aspnes
,
Phys. Rev. B
18
,
1824
(
1978
).
15.
J. I.
Dadap
,
X. F.
Hu
,
M. H.
Anderson
,
M. C.
Downer
,
J. K.
Lowell
, and
O. A.
Aktsipetrov
,
Phys. Rev. B
53
,
R7607
(
1996
);
P.
Godefroy
,
W.
deJong
,
C. W.
van Hasselt
,
M. A. C.
Devillers
, and
T.
Rasing
,
Appl. Phys. Lett.
68
,
1981
(
1996
).
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