Synchrotron radiation scanning photoemission spectroscopy has been used to study thin platinum silicide layers produced by pulsed-laser annealing of vacuum deposited Pt films on Si(001). High-resolution photoemission measurements on the and core lines were used to evaluate morphological changes and interfacial reactions. Distinct regions were identified with varying PtSi thickness and mixed Pt-rich silicides. The lateral distribution and the chemical phases formed within the laser-irradiated spots indicate that the local laser-induced temperature rise controls the interfacial processes.
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