We have heteroepitaxially deposited compositionally graded (BST) thin films with increasing x from 0.0 to 0.25 on (100)-oriented MgO substrates using pulsed-laser deposition. The compositional gradients along the depth in the graded films were characterized by Rutherford backscattering spectroscopy. By using surface interdigital electrodes, the planar dielectric response of epitaxial graded BST films was measured as a function of frequency, temperature, and dc applied voltage. At room temperature, the dielectric constant of the graded BST film was about 450 with a dielectric loss, of 0.007 at 100 kHz. Measurements varying the dc bias voltage showed hysteresis of the dielectric response and a tunability of 25% at an applied electric field of 80 kV/cm. The graded BST films undergo a diffuse phase transition with a broad and flat profile of the capacitance versus temperature. Such behavior of the dielectric response in graded BST films is attributed to the presence of the compositional and/or residual strain gradients in the epitaxial graded films. With such a graded structure, it is possible to a build a dielectric thin-film capacitor with a low-temperature dependence of the capacitor over a broad temperature regime.
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6 May 2002
Research Article|
May 06 2002
Epitaxial growth and planar dielectric properties of compositionally graded thin films prepared by pulsed-laser deposition Available to Purchase
Xinhua Zhu;
Xinhua Zhu
Department of Applied Physics and Materials Research Center, The Hong Kong Polytechnic University, Hung Hom, Kowloon, Hong Kong, People’s Republic of China
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Nui Chong;
Nui Chong
Department of Applied Physics and Materials Research Center, The Hong Kong Polytechnic University, Hung Hom, Kowloon, Hong Kong, People’s Republic of China
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Helen Lai-Wah Chan;
Helen Lai-Wah Chan
Department of Applied Physics and Materials Research Center, The Hong Kong Polytechnic University, Hung Hom, Kowloon, Hong Kong, People’s Republic of China
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Chung-Loong Choy;
Chung-Loong Choy
Department of Applied Physics and Materials Research Center, The Hong Kong Polytechnic University, Hung Hom, Kowloon, Hong Kong, People’s Republic of China
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Kin-Hung Wong;
Kin-Hung Wong
Department of Applied Physics and Materials Research Center, The Hong Kong Polytechnic University, Hung Hom, Kowloon, Hong Kong, People’s Republic of China
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Zhiguo Liu;
Zhiguo Liu
National Laboratory of Solid State Microstructures, Department of Physics, Nanjing University, Nanjing 210093, People’s Republic of China
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Naiben Ming
Naiben Ming
National Laboratory of Solid State Microstructures, Department of Physics, Nanjing University, Nanjing 210093, People’s Republic of China
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Xinhua Zhu
Department of Applied Physics and Materials Research Center, The Hong Kong Polytechnic University, Hung Hom, Kowloon, Hong Kong, People’s Republic of China
Nui Chong
Department of Applied Physics and Materials Research Center, The Hong Kong Polytechnic University, Hung Hom, Kowloon, Hong Kong, People’s Republic of China
Helen Lai-Wah Chan
Department of Applied Physics and Materials Research Center, The Hong Kong Polytechnic University, Hung Hom, Kowloon, Hong Kong, People’s Republic of China
Chung-Loong Choy
Department of Applied Physics and Materials Research Center, The Hong Kong Polytechnic University, Hung Hom, Kowloon, Hong Kong, People’s Republic of China
Kin-Hung Wong
Department of Applied Physics and Materials Research Center, The Hong Kong Polytechnic University, Hung Hom, Kowloon, Hong Kong, People’s Republic of China
Zhiguo Liu
National Laboratory of Solid State Microstructures, Department of Physics, Nanjing University, Nanjing 210093, People’s Republic of China
Naiben Ming
National Laboratory of Solid State Microstructures, Department of Physics, Nanjing University, Nanjing 210093, People’s Republic of China
Appl. Phys. Lett. 80, 3376–3378 (2002)
Article history
Received:
November 16 2001
Accepted:
March 02 2002
Citation
Xinhua Zhu, Nui Chong, Helen Lai-Wah Chan, Chung-Loong Choy, Kin-Hung Wong, Zhiguo Liu, Naiben Ming; Epitaxial growth and planar dielectric properties of compositionally graded thin films prepared by pulsed-laser deposition. Appl. Phys. Lett. 6 May 2002; 80 (18): 3376–3378. https://doi.org/10.1063/1.1475367
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