Direct hysteresis measurements on single submicron structure sizes were performed on epitaxial ferroelectric thin films grown on with (LSCO) electrodes. The samples were fabricated by focused-ion-beam milling resulting in pad sizes down to 200 nm×200 nm. The influence of parasitic capacitance of the measurement setup was eliminated by applying an enhanced compensation procedure. No size effects were observed in capacitors milled down to 400 nm×400 nm. Thus, a published increase of for decreasing pad size can be explained by the parasitic influence of the setup. Finally, the inaccuracy of increasing coercive voltage due to the coating of the cantilever of the atomic force microscope is discussed.
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