The ion temperature in a large-diameter electron cyclotron resonance plasma is measured using high-resolution optical emission spectroscopy, and the correlation between the ion temperature and fluctuations observed near the chamber wall is investigated. Furthermore, the effect of multicusped fields on the ion temperature is examined. The ion temperature and the amplitude of ion saturation current fluctuations are found to decrease when multicusped fields are applied. The ion temperature and fluctuations increase with increasing incident microwave powers from 2.0 to 2.5 kW, indicating that the ion temperature is correlated with the fluctuation amplitude. The measurement of the ion saturation current fluctuation and floating potential fluctuation suggests that the fluctuations are excited by flute instability.

1.
N.
Sakudo
,
K.
Tokiguchi
,
H.
Koike
, and
I.
Kanomata
,
Rev. Sci. Instrum.
48
,
762
(
1977
).
Google Scholar
 
2.
K.
Suzuku
,
S.
Okudaira
,
N.
Sakudo
, and
I.
Kanomata
,
Jpn. J. Appl. Phys.
16
,
1979
(
1977
).
Google Scholar
 
3.
S.
Matsuo
and
M.
Kiuchi
,
Jpn. J. Appl. Phys., Part 2
22
,
L210
(
1983
).
Google Scholar
 
4.
S. C.
Luckhardt
,
R. W.
Harvey
,
O. V.
Batishchev
,
A. A.
Batishcheva
,
J.
Cuthbertson
,
R.
Doerner
,
A.
Grossman
,
R.
Lehmer
,
L.
Blush
, and
D. G.
White
,
J. Nucl. Mater.
266–269
,
1285
(
1999
).
Google Scholar
 
5.
A. Yonesu, Y. Ueda, S. Shinohara, and Y. Kawai, Proceedings of the 4th International Conference on Reactive Plasmas and 16th Symposium on Plasma Processing, Maui, edited by T. Makabe and S. Miyake (Organizing Committee of ICRP-4/SPP-16, Nagoya University, Nagoya, 1998), p. 305.
6.
F. F. Chen, Introduction To Plasma Physics (Plenum, New York, 1974), Chap. 6, p. 215.
7.
M. A. Lieberman, Principle of Plasma Discharges And Material Processing (Wiley, New York, 1994), Chap. 5, p. 146.
8.
N.
Fujiwara
,
T.
Shibano
,
K.
Nishioka
, and
T.
Kato
,
Jpn. J. Appl. Phys., Part 1
28
,
2147
(
1989
).
Google Scholar
 
9.
J. S.
McKillop
,
J. C.
Forster
, and
W. M.
Holber
,
Appl. Phys. Lett.
55
,
30
(
1989
).
Google Scholar
 
10.
W. M.
Holber
and
J.
Forster
,
J. Vac. Sci. Technol. A
8
,
3720
(
1990
).
Google Scholar
 
11.
S.
Samukawa
,
Y.
Nakagawa
, and
K.
Ikeda
,
Jpn. J. Appl. Phys., Part 1
30
,
423
(
1991
).
Google Scholar
 
12.
J.
Forster
,
C. C.
Klepper
,
L. A.
Berry
, and
S. M.
Gorbatkin
,
J. Vac. Sci. Technol. A
10
,
3114
(
1992
).
Google Scholar
 
13.
Y.
Kawai
,
Y.
Ueda
,
M.
Morimoto
,
S.
Hiejima
, and
I.
Katsumata
,
J. Mater. Process. Technol.
92–93
,
230
(
1999
).
Google Scholar
 
14.
Y.
Ueda
,
H.
Teranishi
,
M.
Tanaka
,
S.
Shinohara
, and
Y.
Kawai
,
Surf. Coat. Technol.
74–75
,
503
(
1995
).
Google Scholar
 
15.
H.
Amemiya
and
S.
Ishii
,
Jpn. J. Appl. Phys., Part 1
28
,
2289
(
1989
).
Google Scholar
 
16.
M.
Matsukuma
,
K.
Kaimoto
, and
Y.
Kawai
,
J. Phys. Soc. Jpn.
69
,
303
(
2000
).
Google Scholar
 
17.
S.-I. Itoh, Y. Kawai, and M. Yagi, Abstracts of 11th International Toki Conference on Potential and Structure in Plasmas, Toki (National Institute for Fusion Science, Toki, 2000), p. 180.
18.
T.
Klinger
,
C.
Schrode
,
D.
Block
,
F.
Greiner
,
A.
Piel
,
G.
Bonhomme
, and
V.
Naulin
,
Phys. Plasmas
8
,
1961
(
2001
).
Google Scholar
 
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