We report experimental evidence showing a direct correlation between the alignment of carbon nanofibers (CNFs) prepared by plasma-enhanced chemical-vapor deposition and the location of the catalyst particle during CNF growth. In particular, we find that CNFs that have a catalyst particle at the tip (i.e., growth proceeds from the tip) align along the electric-field lines, whereas CNFs with the particle at the base (i.e., growth proceeds from the base) grow in random orientations. We propose a model that explains the alignment process as a result of a feedback mechanism associated with a nonuniform stress (part tensile, part compressive) that is created across the interface of the catalyst particle with the CNF due to electrostatic forces. Furthermore, we propose that the alignment seen recently in some dense CNF films is due to a crowding effect and is not directly the result of electrostatic forces.
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29 October 2001
Research Article|
October 29 2001
Alignment mechanism of carbon nanofibers produced by plasma-enhanced chemical-vapor deposition
Vladimir I. Merkulov;
Vladimir I. Merkulov
Molecular-Scale Engineering and Nanoscale Technologies Research Group, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831
University of Tennessee, Knoxville, Tennessee 37996
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Anatoli V. Melechko;
Anatoli V. Melechko
Molecular-Scale Engineering and Nanoscale Technologies Research Group, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831
University of Tennessee, Knoxville, Tennessee 37996
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Michael A. Guillorn;
Michael A. Guillorn
Molecular-Scale Engineering and Nanoscale Technologies Research Group, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831
University of Tennessee, Knoxville, Tennessee 37996
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Douglas H. Lowndes;
Douglas H. Lowndes
Molecular-Scale Engineering and Nanoscale Technologies Research Group, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831
University of Tennessee, Knoxville, Tennessee 37996
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Michael L. Simpson
Michael L. Simpson
Molecular-Scale Engineering and Nanoscale Technologies Research Group, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831
University of Tennessee, Knoxville, Tennessee 37996
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Appl. Phys. Lett. 79, 2970–2972 (2001)
Article history
Received:
April 26 2001
Accepted:
August 20 2001
Citation
Vladimir I. Merkulov, Anatoli V. Melechko, Michael A. Guillorn, Douglas H. Lowndes, Michael L. Simpson; Alignment mechanism of carbon nanofibers produced by plasma-enhanced chemical-vapor deposition. Appl. Phys. Lett. 29 October 2001; 79 (18): 2970–2972. https://doi.org/10.1063/1.1415411
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